Results 261 to 270 of about 23,841 (308)
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A nanosecond laser fluorimeter
Instruments and Experimental Techniques, 2006A method for determining the fluorescence decay times in the range 1–10 ns using a nanosecond laser fluorimeter is described. The fluorimeter has the following performance characteristics: a width of exciting pulses of 10 ns, a width of gate pulses of 10 ns, and a step of gate-pulse displacement of 2.5 ns.
A. A. Banishev +2 more
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Nanosecond pulse lasers for retinal applications
Lasers in Surgery and Medicine, 2011AbstractBackground and ObjectivesThermal lasers are routinely used to treat certain retinal disorders although they cause collateral damage to photoreceptors. The current study evaluated a confined, non‐conductive thermal, 3‐nanosecond pulse laser in order to determine how to produce the greatest therapeutic range without causing collateral damage ...
Wood, J. +4 more
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NANOSECOND LASER PHOTOLYSIS OF RHODOPSIN AND ISORHODOPSIN
Photochemistry and Photobiology, 1983AbstractKinetic and spectral measurements have been carried out on the primary intermediate in the photolysis of rhodopsin and isorhodopsin, initiated by a 457 nm, 6 ns (FWHM) laser pulse. In rhodopsin the kinetic decay of bathorhodopsin was found to be 140 ± 15 ns at 20°C. The decay of bathorhodopsin to lumirhodopsin has an activation energy of 51 ± 4
J S, Horwitz +3 more
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Nanosecond Laser Photolysis of Rhodopsin in Solution
Nature, 1972LIGHT absorption by the rhodopsin molecule initiates the visual process1–3. The absorption of light starts a series of consecutive reactions in which the system passes through a number of intermediates leading to the final products, opsin and all-trans retinal.
T, Rosenfeld, A, Alchalal, M, Ottolenghi
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Nanosecond laser fluorometry using a dye laser
Soviet Journal of Quantum Electronics, 1980A new technique is described for quantitative investigations of the kinetics of spontaneous and stimulated emission from dyes using a tunable dye laser and an analog computer. The proposed method can be used to study the evolution of all the main emission characteristics in the nanosecond range ("instantaneous" emission and excitation spectra ...
N A Nemkovich, V I Matseĭko, V I Tomin
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Nanosecond laser silicon micromachining
SPIE Proceedings, 2004We present theoretical calculations and experimental measurements of silicon micromachining rates, efficiency of laser pulse utilization, and morphology changes under UV nanosecond pulses with intensities ranging from 0.5 GW/cm2 to 150 GW/cm2. Three distinct irradiance regimes are identified based on laser intensity.
Jun Ren +4 more
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IEEE Transactions on Aerospace and Electronic Systems, 1966
Selective imaging of objects in range is demonstrated using a giant pulse ruby laser illuminator synchronized with a high speed Kerr cell camera. Elimination of film exposure due to backscatter in a turbid atmosphere is accomplished. Analytic expressions for film exposure due to gated target returns and backscatter luminance are derived.
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Selective imaging of objects in range is demonstrated using a giant pulse ruby laser illuminator synchronized with a high speed Kerr cell camera. Elimination of film exposure due to backscatter in a turbid atmosphere is accomplished. Analytic expressions for film exposure due to gated target returns and backscatter luminance are derived.
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Measurements of sub-nanosecond lifetimes by means of nanosecond laser pulses
Chemical Physics Letters, 1973Abstract It is shown that the lifetimes of excited states of molecules which give a reasonably strong absorption (molar decadic extinction coefficient ∈ > 10 4 M −1 cm −1 ) at the frequency of the ruby laser can be determined from the saturation of the optical transitions.
K. Razi Naqvi, D.K. Sharma, G.J. Hoytink
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Laser Markings on Transparent Materials Using Nanosecond-Pulse Laser
2018 IEEE 13th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS), 2018The precise manipulation on the transparent glass substrates using the pulse lasers has attracted much attention because of the advanced developments in the optical components used for the applications in the microelectromechanical system, biomedical devices and modern communications.
Donyau Chiang +3 more
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2000
Material removal caused by short high-intensity laser pulses is often termed pulsedlaser ablation (PLA). Throughout the literature, the terms laser-assisted evaporation, laser sputtering and, wrongly, laser etching, are also used. Within the regime under consideration, material removal takes place far from equilibrium and may be based on thermal or non-
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Material removal caused by short high-intensity laser pulses is often termed pulsedlaser ablation (PLA). Throughout the literature, the terms laser-assisted evaporation, laser sputtering and, wrongly, laser etching, are also used. Within the regime under consideration, material removal takes place far from equilibrium and may be based on thermal or non-
openaire +1 more source

