Results 231 to 240 of about 30,996 (260)

Quasi-steady carbon plasma source for neutral beam injector

Review of Scientific Instruments, 2013
Carbon plasma is successfully sustained during 1000 s without any carrier gas in the bucket type ionization chamber with cusp magnetic field. Every several seconds, seed plasmas having ∼3 ms duration time are injected into the ionization chamber by a shunting arch plasma gun.
H, Koguchi, H, Sakakita, S, Kiyama, T, Shimada, Y, Sato, Y, Hirano   +5 more
openaire   +2 more sources

Development of Neutral Beam Source Using Electron Beam Excited Plasma

Japanese Journal of Applied Physics, 2011
A low-energy neutral beam (NB) source, which consists of an electron-beam-excited plasma (EBEP) source and two carbon electrodes, has been developed for damageless etching of ultra-large-scale integrated (ULSI) devices. It has been confirmed that the Ar ion beam energy was controlled by the acceleration voltage and the beam profile had good ...
Yasuhiro Hara, Manabu Hamagaki, Takaya Mise, Tamio Hara   +3 more
openaire   +1 more source

Long pulse beam extraction with a prototype ion source for the KSTAR neutral beam system

Review of Scientific Instruments, 2008
Long pulse operational characteristics of the high current ion source for the KSTAR neutral beam system are described. The beam pulse length of 300s was successfully operated at a beam power of 1.6MW with a beam energy of 70keV. Beam energy, beam current, beam divergence, arc power, and several other operational parameters were measured during a pulse ...
Byung-Hoon, Oh, Doo-Hee, Chang, Seung Ho, Jeong, Kwang-Won, Lee, Sang-Ryul, In, Byung-Joo, Yoon, Min-Seok, Seo, Jung-Tae, Jin, Bum-Ryul, Kim, Dae-Sik, Chang, Ki-Sok, Jung, Jinchoon, Kim, Tae-Seong, Kim, Young Soon, Bae   +13 more
openaire   +2 more sources

Hyperthermal neutral beam sources for material processing.

The Review of scientific instruments, 2008
Hyperthermal neutral beams have a great potential for material processes, especially for etching and thin film deposition for semiconductor and display fabrication as well as deposition for various thin film applications. Plasma-induced damage during plasma etching is a serious problem for manufacturing deep submicron semiconductor devices and is ...
S J, Yoo, D C, Kim, M, Joung, J S, Kim, B J, Lee, K S, Oh, K U, Kim, Y H, Kim, Y W, Kim, S W, Choi, H J, Son, Y C, Park, J-N, Jang, M P, Hong   +13 more
openaire   +1 more source

Beam source for moderately fast neutral alkali atoms

Review of Scientific Instruments, 1981
In certain applications the linear arrangement of ion source and charge exchange chamber in standard charge exchange sources for neutral atomic beams leads to undesirable stray light. To avoid this problem a new design has been developed and tested. The maximum beam flux emerging from this source is 2.0 ⋅ 1010 atoms/s ⋅ mm2 at the energy E = 100 eV ...
S. Kita, H. Hübner, W. Kracht, R. Düren   +3 more
openaire   +1 more source

H- Ion Source And High Flux Neutral Beams

SPIE Proceedings, 1988
Conventional dc sources of H- are limited to current densities of the order of 50 mA/cm2 for sources with area larger than a few cm2. Early work at UCI and more recent work at the Lebedev Institute have shown that pulsed magnetical)sy insulated ion diodes can produce current densities larger by factors of the order 10 - 10'±.
A Fisher, H Lindenbaum, N Rostoker, C E. Wiswall, S L. Cartier, J C. Leader   +5 more
openaire   +1 more source

Ion Source for 10 sec Diagnostic Neutral Beam

Fusion Science and Technology, 2013
The ion source for along pulse operating diagnostic neutral beam injector has been developed. The ion source has to form an 8 A, 60 keV hydrogen ion beam.
I. A. Prokhorov, G. F. Abdrashitov, I. I. Averbukh, V. P. Belov, I. V. Davydenko, A. A Ivanov, V. A. Kapitonov, V. V. Kolmogorov, A. A. Kondakov, I. V. Shikhovtsev, A. V. Sorokin, A. A. Tkachev   +11 more
openaire   +1 more source

Large negative ions source for energetic neutral beams

AIP Conference Proceedings, 1984
A negative ion source using the double electron capture can be extrapolated to a 10 A H− ion source in d.c. state. Examined designs can handle 5 A/m of H−. These designs associate an electron cyclotron positive ion source with a monogrid to extract the beam and a magnetic compression to increase the positive current density in the cesium exchanger ...
M. Delaunay, R. Geller, C. Jacquot, P. Ludwig, P. Sermet, J. C. Rocco, F. Zadworny, J. B. Bergström, G. Hellblom, R. Pauli, H. Wilhelmsson   +10 more
openaire   +1 more source

OPTIMIZATION OF D− SOURCES FOR NEUTRAL BEAMS

1989
K.N. LEUNG, S.R. WALTHER, W.B. KUNKEL
openaire   +1 more source

Source and detector of neutral potassium beam. (USSR)

Vacuum, 1977
openaire   +1 more source