Two‐photon polymerization enables high‐resolution microfabrication, but performing alignment when printing multiple structures is difficult. Here, we present a fast, robust, and open‐source protocol for automated alignment on Nanoscribe systems. Achieving ≈0.4 μm accuracy in under 5 s, our protocol reduces time and error in multimaterial printing. This
Daniel Maher +4 more
wiley +1 more source
Methodology for Static Pressure Measurement Under Confined Spatial Conditions in the Low-Pressure Range. [PDF]
Šabacká P +10 more
europepmc +1 more source
A Polarization-Multiplexed Multifunctional Metalens for Triple-Focus Coplanar Imaging. [PDF]
Lu H +6 more
europepmc +1 more source
Fourier Plane Tomographic Spectroscopy Reveals Orientation-Dependent Multipolar Plasmon Modes in Micrometer-Scale Janus Particles. [PDF]
Patzschke FH, Cichos F.
europepmc +1 more source
Continuous-Variable Quantum Secret Sharing Through Microwave-Enabled Turbulent Channels with Measurement-Device-Independent Scheme. [PDF]
Zhang W, Liang Z, Mao Y, Zhang H, Guo Y.
europepmc +1 more source
Transfer-Matrix Framework for Modeling Mid-Infrared Vibrational Circular Dichroism Spectra. [PDF]
Utyushev A, Rasskazov IL, Phal Y.
europepmc +1 more source
Multiplexed back focal plane imaging with on-chip integrated microlens array. [PDF]
Furman M +9 more
europepmc +1 more source
Related searches:
High numerical aperture microwave metalens
Optics Letters, 2020The numerical aperture (NA) of a lens determines its focusing resolution capability and the maximum light collection or emission angle. In this Letter, an ultrathin high NA metalens operating in the microwave band is designed and demonstrated both numerically and experimentally.
Yong-Qiang Liu +5 more
openaire +2 more sources
High-numerical-aperture optical designs
IBM Journal of Research and Development, 1997This paper is an overview of the designs of high-numerical-aperture lenses for optical projection lithography at the IBM Thomas J. Watson Research Center.
Rama N. Singh +3 more
openaire +1 more source
High-numerical-aperture effects in photoresist
Applied Optics, 1997Two-beam and three-beam vector interference in thin photoresist films is used to illustrate the striking differences between s -polarized and p-polarized high-numerical-aperture illumination. Both simulations and experiments are performed for several cases, including undyed photoresist on silicon, dyed photoresist on silicon, and the addition of an ...
D G, Flagello, T D, Milster
openaire +2 more sources

