Results 211 to 220 of about 60,075 (261)

Automated Alignment Powered by Computer Vision Streamlines the Two‐Photon Polymerization‐Based Micro 3D Printing of Multiscale and Multimaterial Structures

open access: yesAdvanced Intelligent Discovery, EarlyView.
Two‐photon polymerization enables high‐resolution microfabrication, but performing alignment when printing multiple structures is difficult. Here, we present a fast, robust, and open‐source protocol for automated alignment on Nanoscribe systems. Achieving ≈0.4 μm accuracy in under 5 s, our protocol reduces time and error in multimaterial printing. This
Daniel Maher   +4 more
wiley   +1 more source

Methodology for Static Pressure Measurement Under Confined Spatial Conditions in the Low-Pressure Range. [PDF]

open access: yesSensors (Basel)
Šabacká P   +10 more
europepmc   +1 more source

A Polarization-Multiplexed Multifunctional Metalens for Triple-Focus Coplanar Imaging. [PDF]

open access: yesNanomaterials (Basel)
Lu H   +6 more
europepmc   +1 more source

Multiplexed back focal plane imaging with on-chip integrated microlens array. [PDF]

open access: yesNat Commun
Furman M   +9 more
europepmc   +1 more source
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High numerical aperture microwave metalens

Optics Letters, 2020
The numerical aperture (NA) of a lens determines its focusing resolution capability and the maximum light collection or emission angle. In this Letter, an ultrathin high NA metalens operating in the microwave band is designed and demonstrated both numerically and experimentally.
Yong-Qiang Liu   +5 more
openaire   +2 more sources

High-numerical-aperture optical designs

IBM Journal of Research and Development, 1997
This paper is an overview of the designs of high-numerical-aperture lenses for optical projection lithography at the IBM Thomas J. Watson Research Center.
Rama N. Singh   +3 more
openaire   +1 more source

High-numerical-aperture effects in photoresist

Applied Optics, 1997
Two-beam and three-beam vector interference in thin photoresist films is used to illustrate the striking differences between s -polarized and p-polarized high-numerical-aperture illumination. Both simulations and experiments are performed for several cases, including undyed photoresist on silicon, dyed photoresist on silicon, and the addition of an ...
D G, Flagello, T D, Milster
openaire   +2 more sources

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