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Nonlocality of the optical potential and the adiabatic approximation
Physical Review C, 1991The nonlocality property of the elastic channel optical potential is studied using a schematic coupled-channel system. It is explicitly shown that, consistent with the usual adiabatic approximation, the nonlocality is reduced as the scattering energy approaches the elastic threshold.
Luciano Canton +2 more
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On the theory of the optical potential
Nuclear Physics, 1962Abstract Nucleon scattering on nuclear density fluctuations inside the nucleus is considered. The scattering coeffecient determining the imaginary part of the optical potential is expressed through the nucleon-nucleon scattering amplitude and the spectral distribution of the space-time correlation function of nuclear density fluctuations.
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Bloch Oscillations of Atoms in an Optical Potential
Physical Review Letters, 1996The early quantum theory of electrical conductivity in crystal lattices by Bloch and Zener [1,2] led to the striking prediction that a homogeneous static electric field induces an oscillatory rather than uniform motion of the electrons. These so-called Bloch oscillations have never been observed in natural crystals because the scattering time of the ...
, Ben Dahan M +4 more
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A semiclassical study of optical potentials: Potential resonances
Nuclear Physics A, 1978Abstract The semiclassical method is used to analyze various optical potentials. Resonances in an optical potential appear as the interference between the ware reflected from the external barrier and the wave reflected from the interior part of the potential. The interference causes a dip in the amplitude of the total S -matrix and is related to the
S.Y. Lee, N. Takigawa, C. Marty
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Optical potential for the deuteron
Nuclear Physics A, 1968Abstract The optical potential of the deuteron is expressed in terms of neutron and proton optical potentials using the operator formalism of Feshbach. A fairly good description of the real and imaginary parts of the deuteron optical potential is obtained only when a few correction terms are taken into account.
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Potential Of Optical Lithography
Optical Engineering, 1987Practical resolution limits of submicrometer patterning by optical lithography are estimated by computer simulation. As a result, the optimum numerical aperture NA that gives the highest resolution is determined. Assuming that the permitted defocus value is ± 1 µm, a litho-graphic resolution of about 0.7 µm is obtained with 0.5 NA and near-UV exposure.
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The deuteron optical potential
AIP Conference Proceedings, 1981G. H. Rawitscher, S. N. Mukherjee
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