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Plasma‐Sequence‐Engineered Atomic Layer Deposition of Ultra‐Thin SiNx for Enhanced Etching Resistance in Extreme Ultraviolet Pellicles

open access: yesAdvanced Materials Interfaces, EarlyView.
Plasma‐sequence‐engineered ALD (PSE‐ALD), based on sequential NH3 and N2 plasma pulses, enables ultrathin, dense SiNx films. ToF‐MS analysis confirms ligand removal via HCl evolution, while increased film density indicates network densification. The resulting SiNx coating provides robust protection of graphite under H2 plasma exposure.
Hye‐Young Kim   +7 more
wiley   +1 more source

Floquet optical selection rules in black phosphorus. [PDF]

open access: yesSci Adv
Fan B   +6 more
europepmc   +1 more source
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Optical pumping of ions

Physics Reports, 1977
Abstract Radiofrequency spectroscopy has been extended to positive ions with S ground states by means of optical pumping. The ions are stored in buffer gases or ion traps and are polarized directly by optical pumping or indirectly by spin exchange, change exchange, or Penning ionization with optically pumped atoms.
openaire   +3 more sources

Optical Pumping

Reviews of Modern Physics, 1972
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