Results 11 to 20 of about 46,039,222 (155)

Determinação das constantes K e alfa da equação de Mark-Houwink de poli(p-acetóxiestireno) Determination of K and alpha constants of the Mark-Houwink equation of poly(p-acetoxystyrene)

open access: yesPolímeros, 2004
O conceito de volume hidrodinâmico pode ser utilizado efetivamente com cromatografia de permeação em gel (GPC) e dados de viscosidade para calcular a massa molar de uma variedade de polímeros. Neste trabalho, as constantes da equação de Mark-Houwink para
José C. Moreira   +3 more
doaj   +8 more sources

Kinetic investigation of the RAFT polymerization of p‐acetoxystyrene [PDF]

open access: yesJournal of Polymer Science Part A: Polymer Chemistry, 2010
AbstractThe kinetics of the RAFT polymerization of p‐acetoxystyrene using a trithiocarbonate chain transfer agent, S‐1‐dodecyl‐S′‐(α,α′‐dimethyl‐α″‐acetic acid)trithiocarbonate, DDMAT, was investigated. Parameters including temperature, percentage initiator, concentration, monomer‐to‐chain transfer agent ratio, and solvent were varied and their impact ...
Solène I, Cauët, Karen L, Wooley
openaire   +3 more sources

Synthesis and Self-Assembly of Poly(4-acetoxystyrene) Cubosomes. [PDF]

open access: yesMacromol Rapid Commun
Polymer cubosomes (PCs) are a recent class of self‐assembled nanostructures with great application potential due to their high porosity and surface area. Currently, most reported PCs consist of polystyrene block copolymers (BCPs), for which self‐assembly
Schumacher M   +6 more
europepmc   +3 more sources

Síntese de copolímeros em bloco de p-acetoxiestireno com isopreno através de polimerização "viva" via radical livre Synthesis of block copolymers from p-acetoxystyrene and isoprene by "living" free radical polymerization

open access: yesPolímeros, 2004
Neste trabalho, é mostrada a síntese de homopolímeros de p-acetoxiestireno e copolímeros diblocos de p-acetoxiestireno com isopreno, utilizando um iniciador TEMPO-modificado, por um processo de polimerização "viva" via radical livre.
José Carlos Moreira, Shu Hui Wang
doaj   +2 more sources

Synthesis of Narrow Molecular Weight Distribution Norbornene-Lactone Functionalized Polymers by Nitroxide-Mediated Polymerization: Candidates for 193-nm Photoresist Materials

open access: yes, 2014
One hundred ninety three-nanometer candidate photoresist materials were synthesized by nitroxide-mediated polymerization (NMP). Statistical copolymerizations of 5-methacryloyloxy-2,6-norboranecarbolactone (NLAM) with 5–10 mol% of controlling co-monomers (
Zi-Jun Wang, M. Mari'c
semanticscholar   +2 more sources

Tg Confinement Effect of Random Copolymers of 4-tert-Butylstyrene and 4-Acetoxystyrene with Different Compositions.

open access: yesACS Macro Letters, 2019
We observe that the Tg confinement effect of polymer films can saturate with polymer-substrate interaction. Thickness dependences of the glass transition temperature, Tg(h0), of random copolymer films of 4-tert-butylstyrene (TBS) and 4-acetoxystyrene (AS)
Tong Wang   +8 more
semanticscholar   +2 more sources

Novel Star Polymers as Chemically Amplified Positive-Tone Photoresists for KrF Lithography Applications

open access: yes, 2018
Xanthate-mediated reversible addition–fragmentation chain transfer (RAFT) methodologies have been applicable to preparation of branched or star polymers.
Xiang-Fei Zheng   +5 more
semanticscholar   +2 more sources

Synthesis by ATRP of poly(ethylene‐co‐butylene)‐block‐polystyrene, poly(ethylene‐co‐butylene)‐block‐poly(4‐acetoxystyrene) and its hydrolysis product poly(ethylene‐co‐butylene)‐block‐poly(hydroxystyrene)

open access: yes, 1999
Diblock copolymers of poly(ethylene-co-butylene) and polystyrene or poly(4-acetoxystyrene) are synthesized by atom transfer radical polymerization (ATRP) using a 2-bromopropionic ester macroinitiator prepared from commercial monohydroxyl functional ...
K. Jankova   +3 more
semanticscholar   +2 more sources

Data-driven elemental descriptors for rational design of high-sensitivity extreme ultraviolet photoresists. [PDF]

open access: yesSmart Mol
Data‐driven descriptors indicate that elements such as I, Te, In, Sn, Sb, Cs and Bi have positive impact on EUV sensitivity in photoresists, whereas elements like C and H exhibit negative contributions. Abstract The rational design of high‐sensitivity photoresists for extreme ultraviolet (EUV) lithography is hindered by the lack of quantitative ...
Liu J, Wei J, Zhu H, Peng X.
europepmc   +2 more sources

Absorption-coefficient calculation of short-wavelength photoresist materials: From EUV to BEUV and water window X-ray. [PDF]

open access: yesSmart Mol
In photolithography, shortening the exposure wavelength from ultraviolet to extreme ultraviolet (EUV, 13.5 nm) and soft X‐ray region in terms of beyond EUV (BEUV, 6.X nm) and water window X‐ray (WWX, 2.2–4.4 nm) is expected to further miniaturize the technology node down to sub‐5 nm level.
Peng Y, Chen P, Chen H, Si Y, Peng X.
europepmc   +2 more sources

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