Results 201 to 210 of about 121,065 (257)
OSI Stack Redesign for Quantum Networks: Requirements, Technologies, Challenges, and Future Directions. [PDF]
Sensors (Basel)Ahmed S +6 more
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Factors affecting pattern fidelity and performance of a patterned membrane
Journal of Membrane Science, 2014Membranes with a patterned surface have become attractive for the mitigation of biofouling in membrane processes for water and wastewater treatment. However, previous studies have paid little attention to factors affecting pattern fidelity in the preparation of patterned membranes.
Jaewoo Lee, Jun Hee Jang, Kyung Hyun Ahn
exaly +3 more sources
A Quantitative Metric for Pattern Fidelity of Bioprinted Cocultures
Artificial Organs, 2012AbstractThis article describes a quantitative metric for coculture pattern fidelity and its use in the assessment of bioprinting systems. Increasingly, bioprinting is used to create in vitro cell and tissue models for the purpose of studying cell behavior and cell–cell interaction. To create meaningful models, a bioprinting system must be able to place
Richard Groff +2 more
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Photomask manufacturability and pattern fidelity for curvilinear structures
Photomask Technology 2018, 2018Microfabrication techniques, used widely for the construction of integrated circuits, are being used in an increasing variety of non-IC applications requiring features with curved shapes, such as the construction of photonics and microelectromechanical devices.
Kent H. Nakagawa, Richard Gladhill
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A Pattern Reconfigurable Dielectric Resonator Antenna for Wireless Fidelity Applications
2016 International Conference on Frontiers of Information Technology (FIT), 2016A pattern reconfigurable dielectric resonator antenna for wireless fidelity (2.4 GHz) band is presented in this communication. A rectangular dielectric resonator antenna which is fed by a microstrip line serves as the main radiating element. The pattern reconfigurability is achieved by the introduction of slots on the ground plane. The switch placement
Sajid Aqeel, Aftab Ahmad Khan
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Pattern fidelity verification for logic design in EUV lithography
Proceedings of SPIE, 2014We verify image fidelity after mask 3D aware-OPC (using Mentor Graphics Domain Decomposition Method) and quantify pattern placement error (PPE) on wafer. First we show experimental pattern fidelity improvement of DDM-OPCed 2D-images of logic devices in 10 nm technology node with the latest NXE3300B EUV exposure tool. We then compare pattern fidelity in
Eric Hendrickx +2 more
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Fidelity of rectangular patterns printed with 0.3-NA MET optics
SPIE Proceedings, 2007Arrays of rectangular patterns of various sizes were printed with the EUV micro-exposure tool (MET) at the Lawrence Berkeley National Laboratory (LBNL) using the chemically-amplified resist MET-1K; and their fidelity to the mask patterns was evaluated. The experimental results showed that the shortening of resist patterns in the lengthwise direction
Iwao Nishiyama +2 more
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Pattern fidelity in multiple-patterning process
SPIE Proceedings, 2014Pattern roughness is expected to be an important issue in semiconductor scaling going forward. We performed smoothing of ArF photoresists (PRs) by a PR hardening technique called direct current superposition (DCS) cure,1) and we showed that this technique can achieve a roughness smoothing effect for PRs having various line edge roughness (LER ...
Masatoshi Yamato +5 more
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