Comparison of state-of-the-art error-correction coding for sequence-based DNA data storage. [PDF]
Nat CommunGimpel AL +4 more
europepmc +1 more source
Scalable and Sustainable Dry Microfabrication Enabled by High-Precision and Wafer-Scale Transfer Lithography of Commercial Photoresists. [PDF]
Nanomicro LettGuo Q +7 more
europepmc +1 more source
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Factors affecting pattern fidelity and performance of a patterned membrane
Journal of Membrane Science, 2014Membranes with a patterned surface have become attractive for the mitigation of biofouling in membrane processes for water and wastewater treatment. However, previous studies have paid little attention to factors affecting pattern fidelity in the preparation of patterned membranes.
Jun Hee Jang +2 more
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Mask pattern fidelity quantification
SPIE Proceedings, 2003In this paper, a quantitative evaluation of mask quality in the domain of 2D pattern fidelity and a method of assessing the OPC model effectiveness are investigated. The spirit of our algorithm is to characterize the wafer lithographic performances of both the real physical mask and the ideal OPCed layout mask that the physical mask is based on.
Hung-Chang Hsieh
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A Quantitative Metric for Pattern Fidelity of Bioprinted Cocultures
Artificial Organs, 2012AbstractThis article describes a quantitative metric for coculture pattern fidelity and its use in the assessment of bioprinting systems. Increasingly, bioprinting is used to create in vitro cell and tissue models for the purpose of studying cell behavior and cell–cell interaction. To create meaningful models, a bioprinting system must be able to place
Timothy Burg, Karen Burg
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Pattern fidelity enhancement with OPC pattern generation on laser lithography
SPIE Proceedings, 2006Laser pattern generators ALTA 3500 and 3700 are widely used for 0.18 micron and above technology nodes in photomask manufacturing. They have low butting, high throughput and high position accuracy, with some weaknesses such as, corner rounding, no proximity effect correction and poor CD linearity when compared to E-beam pattern generators.
Gaston Lee +7 more
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Photomask manufacturability and pattern fidelity for curvilinear structures
Photomask Technology 2018, 2018Microfabrication techniques, used widely for the construction of integrated circuits, are being used in an increasing variety of non-IC applications requiring features with curved shapes, such as the construction of photonics and microelectromechanical devices.
Kent H. Nakagawa, Richard Gladhill
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Robustness of interactive pattern fidelity error as a quality metric for integrated patterning
Advances in Patterning Materials and Processes XXXVI, 2019Multi-patterning, like LE and SAMP, has been in production for several years. It is expected to remain a standard in patterning, even in the case where industry adopts EUV photo lithography. As scaling continues, the precision of pattern placement remains challenging.
Soichiro Okada +2 more
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A Pattern Reconfigurable Dielectric Resonator Antenna for Wireless Fidelity Applications
2016 International Conference on Frontiers of Information Technology (FIT), 2016A pattern reconfigurable dielectric resonator antenna for wireless fidelity (2.4 GHz) band is presented in this communication. A rectangular dielectric resonator antenna which is fed by a microstrip line serves as the main radiating element. The pattern reconfigurability is achieved by the introduction of slots on the ground plane. The switch placement
Sajid Aqeel, Aftab Ahmad Khan
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