Results 211 to 220 of about 121,065 (257)
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Patterns of Communication in High-Fidelity Simulation
Journal of Nursing Education, 2015High-fidelity simulation is commonplace in nursing education. However, critical thinking, decision making, and psychomotor skills scenarios are emphasized. Scenarios involving communication occur in interprofessional or intraprofessional settings.
Judy K, Anderson, Kimberly, Nelson
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Pattern fidelity improvement by considering the underlying patterns at defocus
SPIE Proceedings, 2002The model-based OPC is considered in 0.13um and beyond generation. However, the accuracy of model-based OPC is based on the measurement of test patterns on bare silicon wafers using the optimized exposure condition. The through pitch patterns and systematic patterns should be contained in the test patterns design.
Karl Chiou +5 more
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Mask pattern fidelity quantification
SPIE Proceedings, 2003In this paper, a quantitative evaluation of mask quality in the domain of 2D pattern fidelity and a method of assessing the OPC model effectiveness are investigated. The spirit of our algorithm is to characterize the wafer lithographic performances of both the real physical mask and the ideal OPCed layout mask that the physical mask is based on.
Wen-Chuan Wang +6 more
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Patterning in the era of atomic scale fidelity
SPIE Proceedings, 2015Relentless scaling of advanced integrated devices drives feature dimensions towards values which can be expressed in small multiples of the lattice spacing of silicon. One of the consequences of dealing with features on such an atomic scale is that surface properties start to play an increasingly important role. To encompass both dimensional as well as
Thorsten Lill +8 more
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Spherical Fidelity Patterns of UWB Antennas
IEEE Transactions on Antennas and Propagation, 2011The time domain radiation properties of UWB antennas are analyzed, especially the angular dependent impulse distortion, with respect to the signal transmitted in the main beam direction, is investigated. The correlation properties of the radiated pulses are determined by the so called fidelity F. The fidelity F is together with the peak pulse amplitude
Elena Pancera +2 more
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Pattern fidelity enhancement with OPC pattern generation on laser lithography
SPIE Proceedings, 2006Laser pattern generators ALTA 3500 and 3700 are widely used for 0.18 micron and above technology nodes in photomask manufacturing. They have low butting, high throughput and high position accuracy, with some weaknesses such as, corner rounding, no proximity effect correction and poor CD linearity when compared to E-beam pattern generators.
Gaston Lee +7 more
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High-fidelity chemical patterning on oxide-free germanium
Journal of Physics: Condensed Matter, 2012Oxide-free germanium can be chemically patterned directly with self-assembled monolayers of n-alkanethiols via submerged microcontact printing. Native germanium dioxide is water soluble; immersion activates the germanium surface for self-assembly by stripping the oxide.
J Nathan, Hohman +4 more
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Topographic and other effects on EUV pattern fidelity
SPIE Proceedings, 2014The ability to incorporate topographic and other effects of previously patterned layers in ground rule formulation could potentially lead to significant cost savings and shortened time needed for technology ramp-up. The effect of topgraphy coupled with the diminishing depth of focus (DOF) associated with design node shrinks could become a significant ...
Chandra Sarma +3 more
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Evaluation of the impact of pattern fidelity on photomask inspectability
SPIE Proceedings, 1999In recent years a manufacturable inspection recipe has been limited by the number of nuisance defects instead of the true sensitivity capability of the inspection tool for the top of the line products. In general, the nuisance defects are a result from either sub-resolution mask design or non- uniformity issue of mask pattern fidelity. Pattern fidelity
Kevin S. Woolverton +3 more
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Robustness of interactive pattern fidelity error as a quality metric for integrated patterning
Advances in Patterning Materials and Processes XXXVI, 2019Multi-patterning, like LE and SAMP, has been in production for several years. It is expected to remain a standard in patterning, even in the case where industry adopts EUV photo lithography. As scaling continues, the precision of pattern placement remains challenging.
Soichiro Okada +6 more
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