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Influence of illumination non-uniformity on pattern fidelity
Optical Microlithography XVIII, 2005As projection optics have drastically improved over time, the effects of illumination non-uniformity have a more significant impact on the pattern fidelity. For instance elliptical uniformity results in a difference in sigma for horizontal and vertical features and radial non-uniformity results in a difference in through pitch patterning.
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Pattern fidelity improvement of DSA hole patterns
Novel Patterning Technologies 2023, 2023Makoto Muramatsu +6 more
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Understanding Pattern Formation and Improving Fidelity in Phototropic Growth
2021Phototropic growth of Se-Te yields highly anisotropic lamellar nanostructures and is achieved photoelectrochemically from an isotropic solution of oxidized Se and Te precursors deposited onto isotropic conductive substrates under conformal illumination.
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Impact of the antenna fidelity pattern on waveform design and spectrum sharing
2017 IEEE International Symposium on Electromagnetic Compatibility & Signal/Power Integrity (EMCSI), 2017There is an intense effort underway to mitigate the acute effects of spectral crowding. One such spectrum engineering effort seeks to apply waveform diversity to enable radars to avoid interference and adapt their spectral utilization. This approach hinges on waveform adaptation and optimization that requires accurate knowledge of hardware induced ...
Sarah A. Seguin, Brian D. Cordill
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Holistic lithography and metrology's importance in driving patterning fidelity
SPIE Proceedings, 2016There has been 43 years of overlay metrology in microlithography, and how did we get here? This presentation covered three areas: stepper metrology improvements, improved correction potential, and extended feedback loop outside stepper. The presenter went on to discuss where we are today In terms of holistic lithography, as well as where we are going ...
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Pattern fidelity enhancement with directional patterning technology
2020SHEN YU-TIEN +12 more
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