Results 231 to 240 of about 110,417 (252)

Topographic and other effects on EUV pattern fidelity

SPIE Proceedings, 2014
The ability to incorporate topographic and other effects of previously patterned layers in ground rule formulation could potentially lead to significant cost savings and shortened time needed for technology ramp-up. The effect of topgraphy coupled with the diminishing depth of focus (DOF) associated with design node shrinks could become a significant ...
Chandra Sarma, Trey Graves, Mark Neisser, Stewart Robertson   +3 more
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Pattern fidelity control in Multi-patterning towards 7nm node

2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO), 2016
Multi-patterning technology using 193nm immersion lithography has been used since the 22nm logic node generation and it appears that it will continue to be used as far as the 14nm generation. At the same time, the industry trend is to simplify pattern design and reduce complexity in lithography though single directional (1D) layout[1].
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Decreased Fidelity in Replicating CpG Methylation Patterns in Cancer Cells

Cancer Research, 2005
Abstract The unmethylated or methylated status of individual CpG sites is faithfully copied into daughter cells. Here, we analyzed the fidelity in replicating their methylation statuses in cancer cells. A single cell was clonally expanded, and methylation statuses of individual CpG sites were determined for an average of 12.5 DNA ...
Toshikazu, Ushijima, Naoko, Watanabe, Kimiko, Shimizu, Kazuaki, Miyamoto, Takashi, Sugimura, Atsushi, Kaneda   +5 more
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Pattern‐Transfer Fidelity in Soft Lithography: The Role of Pattern Density and Aspect Ratio

Advanced Functional Materials, 2005
AbstractUsing high‐aspect‐ratio nanostructures fabricated via two‐photon laser‐scanning lithography, we examine the deformation of elastomeric stamps used in soft nanolithography and the fidelity of patterns and replicas made using these stamps. Two‐photon laser‐scanning lithography enables us to systematically regulate the aspect ratio and pattern ...
T.‐W. Lee, O. Mitrofanov, J. W. P. Hsu   +2 more
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Pattern Fidelity in Submicron Lithography with a Rectangular Electron Beam

Japanese Journal of Applied Physics, 1983
The energy density profiles deposited in a PMMA resist film by a 0.5 µm square electron beam are calculated by Monte Carlo simulation. The influence of a combination of beam accelerating voltages and beam edge widths on the pattern fidelity is studied by examining some characteristic parameters.
Tsuneo Okubo, Kiichi Takamoto
openaire   +1 more source

High Fidelity MMI Excitation Patterns for Optofluidic Multiplexing

Conference on Lasers and Electro-Optics, 2018
High fidelity interference patterns from multimode interference waveguides are needed for multiplexed optofluidic biosensors. Spot pattern fidelity can be optimized by careful design of the single-mode waveguides used to excite the multimode waveguides.
Matthew A. Stott, Vahid Ganjalizadeh, Maclain Olsen, Marcos Orfila, Johnny McMurray, Holger Schmidt, Aaron R. Hawkins   +6 more
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Patterns to Improve Fidelity for Model-Based Testing

2022 IEEE International Conference on Software Testing, Verification and Validation Workshops (ICSTW), 2022
Yasuaki Hiruta, Hidetoshi Suhara, Yasuharu Nishi   +2 more
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School fidelity in fishes: The yellow perch pattern

Animal Behaviour, 1984
School fidelity concerns the cohesiveness of social aggregations over time, as measured by the regularity or repeatability with which known individuals re-occur as members of a school. School fidelity was measured by divers who observed yellow perch (Perca flavescens) marked with individually recognizable tags in Cazenovia Lake, New York.
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Pattern fidelity improvement of DSA hole patterns

Novel Patterning Technologies 2023, 2023
Makoto Muramatsu, Takanori Nishi, Kiyohito Ito, Yoshihito Takahashi, Yasunori Hatamura, Takahiro Kitano, Tomohiro Iwaki   +6 more
openaire   +1 more source

Influence of illumination non-uniformity on pattern fidelity

Optical Microlithography XVIII, 2005
As projection optics have drastically improved over time, the effects of illumination non-uniformity have a more significant impact on the pattern fidelity. For instance elliptical uniformity results in a difference in sigma for horizontal and vertical features and radial non-uniformity results in a difference in through pitch patterning.
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