Results 221 to 230 of about 110,417 (252)
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Simulation and Optimization of Inkjet-printed Outlines to Improve Pattern Fidelity
2021 22nd International Conference on Electronic Packaging Technology (ICEPT), 2021Inkjet-printing has become a effective method for fabricating flexible electronics. This paper aims to improve the form fidelity via a numerical method. The properties of ink fluid and parameters of printing process are taken into consideration, and some rules for improve pattern fidelity are found.
Mingyu Li, Wanchun Yang
exaly +2 more sources
Effect of absorber material and mask pattern correction on pattern fidelity in EUV lithography
SPIE Proceedings, 2004The printability of a dense line pattern and a model pattern using two configurations of absorber and buffer materials for the mask were examined through simulations. An absorber material with a small extinction coefficient of 0.025 must be thicker than one with a large extinction coefficient fo 0.040 to ensure sufficient reflectance contrast ...
Iwao Nishiyama, Minoru Sugawara
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Pattern fidelity verification for logic design in EUV lithography
Proceedings of SPIE, 2014We verify image fidelity after mask 3D aware-OPC (using Mentor Graphics Domain Decomposition Method) and quantify pattern placement error (PPE) on wafer. First we show experimental pattern fidelity improvement of DDM-OPCed 2D-images of logic devices in 10 nm technology node with the latest NXE3300B EUV exposure tool. We then compare pattern fidelity in
Eric Hendrickx +2 more
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Pattern fidelity in multiple-patterning process
SPIE Proceedings, 2014Pattern roughness is expected to be an important issue in semiconductor scaling going forward. We performed smoothing of ArF photoresists (PRs) by a PR hardening technique called direct current superposition (DCS) cure,1) and we showed that this technique can achieve a roughness smoothing effect for PRs having various line edge roughness (LER ...
Masatoshi Yamato +5 more
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Patterns of Communication in High-Fidelity Simulation
Journal of Nursing Education, 2015High-fidelity simulation is commonplace in nursing education. However, critical thinking, decision making, and psychomotor skills scenarios are emphasized. Scenarios involving communication occur in interprofessional or intraprofessional settings.
Judy K, Anderson, Kimberly, Nelson
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Pattern fidelity improvement by considering the underlying patterns at defocus
SPIE Proceedings, 2002The model-based OPC is considered in 0.13um and beyond generation. However, the accuracy of model-based OPC is based on the measurement of test patterns on bare silicon wafers using the optimized exposure condition. The through pitch patterns and systematic patterns should be contained in the test patterns design.
Karl Chiou +5 more
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Patterning in the era of atomic scale fidelity
SPIE Proceedings, 2015Relentless scaling of advanced integrated devices drives feature dimensions towards values which can be expressed in small multiples of the lattice spacing of silicon. One of the consequences of dealing with features on such an atomic scale is that surface properties start to play an increasingly important role. To encompass both dimensional as well as
Thorsten Lill +8 more
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Spherical Fidelity Patterns of UWB Antennas
IEEE Transactions on Antennas and Propagation, 2011The time domain radiation properties of UWB antennas are analyzed, especially the angular dependent impulse distortion, with respect to the signal transmitted in the main beam direction, is investigated. The correlation properties of the radiated pulses are determined by the so called fidelity F. The fidelity F is together with the peak pulse amplitude
Elena Pancera +2 more
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High-fidelity chemical patterning on oxide-free germanium
Journal of Physics: Condensed Matter, 2012Oxide-free germanium can be chemically patterned directly with self-assembled monolayers of n-alkanethiols via submerged microcontact printing. Native germanium dioxide is water soluble; immersion activates the germanium surface for self-assembly by stripping the oxide.
J Nathan, Hohman +4 more
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Evaluation of the impact of pattern fidelity on photomask inspectability
SPIE Proceedings, 1999In recent years a manufacturable inspection recipe has been limited by the number of nuisance defects instead of the true sensitivity capability of the inspection tool for the top of the line products. In general, the nuisance defects are a result from either sub-resolution mask design or non- uniformity issue of mask pattern fidelity. Pattern fidelity
Kevin S. Woolverton +3 more
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