Results 221 to 230 of about 121,065 (257)

Pattern fidelity control in Multi-patterning towards 7nm node

2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO), 2016
Multi-patterning technology using 193nm immersion lithography has been used since the 22nm logic node generation and it appears that it will continue to be used as far as the 14nm generation. At the same time, the industry trend is to simplify pattern design and reduce complexity in lithography though single directional (1D) layout[1].
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Decreased Fidelity in Replicating CpG Methylation Patterns in Cancer Cells

Cancer Research, 2005
Abstract The unmethylated or methylated status of individual CpG sites is faithfully copied into daughter cells. Here, we analyzed the fidelity in replicating their methylation statuses in cancer cells. A single cell was clonally expanded, and methylation statuses of individual CpG sites were determined for an average of 12.5 DNA ...
Toshikazu, Ushijima, Naoko, Watanabe, Kimiko, Shimizu, Kazuaki, Miyamoto, Takashi, Sugimura, Atsushi, Kaneda   +5 more
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Effect of absorber material and mask pattern correction on pattern fidelity in EUV lithography

SPIE Proceedings, 2004
The printability of a dense line pattern and a model pattern using two configurations of absorber and buffer materials for the mask were examined through simulations. An absorber material with a small extinction coefficient of 0.025 must be thicker than one with a large extinction coefficient fo 0.040 to ensure sufficient reflectance contrast ...
Minoru Sugawara, Takeo Hashimoto, Iwao Nishiyama   +2 more
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Pattern‐Transfer Fidelity in Soft Lithography: The Role of Pattern Density and Aspect Ratio

Advanced Functional Materials, 2005
AbstractUsing high‐aspect‐ratio nanostructures fabricated via two‐photon laser‐scanning lithography, we examine the deformation of elastomeric stamps used in soft nanolithography and the fidelity of patterns and replicas made using these stamps. Two‐photon laser‐scanning lithography enables us to systematically regulate the aspect ratio and pattern ...
T.‐W. Lee, O. Mitrofanov, J. W. P. Hsu   +2 more
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High Fidelity MMI Excitation Patterns for Optofluidic Multiplexing

Conference on Lasers and Electro-Optics, 2018
High fidelity interference patterns from multimode interference waveguides are needed for multiplexed optofluidic biosensors. Spot pattern fidelity can be optimized by careful design of the single-mode waveguides used to excite the multimode waveguides.
Matthew A. Stott, Vahid Ganjalizadeh, Maclain Olsen, Marcos Orfila, Johnny McMurray, Holger Schmidt, Aaron R. Hawkins   +6 more
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School fidelity in fishes: The yellow perch pattern

Animal Behaviour, 1984
School fidelity concerns the cohesiveness of social aggregations over time, as measured by the regularity or repeatability with which known individuals re-occur as members of a school. School fidelity was measured by divers who observed yellow perch (Perca flavescens) marked with individually recognizable tags in Cazenovia Lake, New York.
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Pattern fidelity in nanoimprinted films using CD-SAXS

SPIE Proceedings, 2005
The primary measure of process quality in nanoimprint lithography (NIL) is the fidelity of pattern transfer, comparing the dimensions of the imprinted pattern to those of the mold. As a potential next generation lithography, NIL is capable of true nanofabrication, producing patterns of sub-10 nm dimensions. Routine production of nanoscale patterns will
Ronald L. Jones, Christopher L. Soles, Eric K. Lin, Walter Hu, Ronald M. Reano, Stella W. Pang, Steven J. Weigand, Denis T. Keane, John P. Quintana   +8 more
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Optimized UV Nanoimprinting Processes for Fabrication of High Fidelity Patterns

2020 International Semiconductor Conference (CAS), 2020
UV Nanoimprint Lithography as a flexible and lowcost nonconventional lithographic method has been investigated with focus on resolution, shape and substrate size. Resolution in the range of 12.5 nm and up to several micrometers line width and space has been demonstrated. Flexibility in terms of pattern shape has been shown with gratings, pillars, wells,
Christine Thanner, Robert Breyer, Juri Litterscheidt   +2 more
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Patterns to Improve Fidelity for Model-Based Testing

2022 IEEE International Conference on Software Testing, Verification and Validation Workshops (ICSTW), 2022
Yasuaki Hiruta, Hidetoshi Suhara, Yasuharu Nishi   +2 more
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Pattern Fidelity in Submicron Lithography with a Rectangular Electron Beam

Japanese Journal of Applied Physics, 1983
The energy density profiles deposited in a PMMA resist film by a 0.5 µm square electron beam are calculated by Monte Carlo simulation. The influence of a combination of beam accelerating voltages and beam edge widths on the pattern fidelity is studied by examining some characteristic parameters.
Tsuneo Okubo, Kiichi Takamoto
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