Results 121 to 130 of about 11,199 (255)

Photoresist as a sacrificial layer by dissolution in acetone [PDF]

, 2001
We report here a detailed study of sacrificial layer dissolution of photoresist by acetone in microchannels. The effects of channel geometry as well as photoresist characteristics such as thermal cycles and UV exposure are considered and tested.
Tai, Yu-Chong, Walsh, Ken, Norville, Julie   +2 more
core  

Photoresist Absorption Effect In Holographic Recording

, 2015
In this paper we compare the photoresist profile of holographic gratings recorded using two different wavelengths λ =458 nm and λ = 407nm. We show that the use of the wavelength λ = 458nm allows the recording of very deep structures (aspect ratios of > 3)
Avila L.F., Gutierrez-Rivera L.E., Cescato L., Menezes J.W., Araujo W.R.   +4 more
core   +1 more source

Development of Water-Developable Negative Photoresist for i-Line Photolithography Using Cellulose Derivatives with Underlayer

Electronic Materials
Water-developable photoresist was synthesized by introducing methacrylate groups into hydroxypropyl cellulose (HPC), a cellulose derivative, via substitution of hydroxyl groups.
Hiryu Hayashi, Yuna Hachikubo, Mano Ando, Misaki Oshima, Mayu Morita, Satoshi Takei   +5 more
doaj   +1 more source

Characterized Ecoflex Polydimethylsiloxane (PDMS) Hybrids for Advanced Flexible Devices

Advanced Materials Technologies, EarlyView.
Ecoflex–PDMS hybrids are systematically characterized to identify an optimal composition that balances stretchability, optical transparency, and plasma bonding, enabling multifunctional applications in stretchable microfluidics, flexible sensing, and soft robotics.
Xiaoyue Kang, Zhefan Chen, Zhiyang Hong, Wanting Chen, Qingtian Zhang, Amith Mudugamuwa, Tuan‐Khoa Nguyen, Lingxi Ouyang, Nam‐Trung Nguyen, Jun Zhang, Dan Yuan   +10 more
wiley   +1 more source

Dissolution Rate Monitor Tool to Measure EUV Photoresist Dissolution

, 2017
The resist development step in photolithography is a complex process involving selective dissolution between exposed and unexposed photoresist. This phenomenon is commonly described by a one-to-one relation between dissolution rate and deprotection level
De Simone, Danilo, Danilo De Simone, Vesters, Yannick, De Gendt, Stefan, Stefan De Gendt, Yannick Vesters   +5 more
core   +1 more source

Liquid Crystal Elastomer Actuator Matrix for Large Area Applications

Advanced Materials Technologies, EarlyView.
A scalable approach is used to manufacture a digitally‐controllable, 2D 5 × 5 actuator matrix. The elements of the matrix are produced by direct ink writing of a liquid crystal elastomer ‘artificial muscle’ on large‐area flexible thin‐film heaters. In optimizing the low‐power actuators, multiple heater designs and substrate materials are investigated ...
Giulia Spallanzani, Bart Peeters, Danqing Liu, Peter Zalar, Hylke B. Akkerman, Jeroen A. H. P. Sol   +5 more
wiley   +1 more source

Recent Advances in Transparent Microelectrode Device Architecture and Fabrication Strategies for Biomedical Applications

Advanced Materials Technologies, EarlyView.
Transparent microelectrode arrays enable simultaneous optical and electrical electrophysiology with high spatiotemporal resolution, allowing multimodal observations of dynamic biological systems. Advances in materials and device architectures improve device performance by addressing key trade‐offs between optical transparency, impedance, and ...
Michael Abraham Listyawan, Tran Bach Dang, Chi Cong Nguyen, Yee Lap Pong, Tianruo Guo, Thanh Nho Do, Hoang‐Phuong Phan   +6 more
wiley   +1 more source

Liquid Metal Resistive Sensing Architectures for Measuring Diaphragm Strain Responses on Obstructed Surfaces

Advanced Materials Technologies, EarlyView.
A liquid metal‐based strain‐sensing architecture to measure the deformation of a circular diaphragm against obstructed surfaces is formulated using finite element modeling and confocal imaging to establish the mechanical framework and is utilized to control diaphragm‐induced confinement on a bead array, as validated by biomolecular loading level ...
Abdullah‐Bin Siddique, Jui‐Hong Weng, Deng‐Kai Yang, Chia‐Fu Chou, Nathan S. Swami   +4 more
wiley   +1 more source

Improved Photoresist Coating for Making CNT Field Emitters [PDF]

, 2009
An improved photoresist-coating technique has been developed for use in the fabrication of carbon-nanotube- (CNT) based field emitters is described. The improved photoresist coating technique overcomes what, heretofore, has been a major difficulty in the
Toda, Risaku, Manohara, Harish
core  

Wafer‐Scale Top‐Down Patterning of Metal Halide Perovskites

Advanced Materials Technologies, EarlyView.
Wafer‐scale patterning of metal halide perovskite films is demonstrated on 150 mm substrates using a chemically amplified resist, polymethyl methacrylate (CAR‐PMMA) and a single reactive ion etching step. The streamlined process preserves film luminescence while defining submicrometer features across the full wafer, enabling dense, scalable integration
Federico Fabrizi, Ardeshir Esteki, Holger Lerch, Saeed Goudarzi, Liudmila Starodubtceva, Gerhard Müller‐Newen, Maryam Mohammadi, Max C. Lemme   +7 more
wiley   +1 more source