Results 101 to 110 of about 11,199 (255)

Development of Biocompatible Parylene Neurocages for Action Potential Stimulation and Recording [PDF]

open access: yes, 2007
Neurons, and the neural networks they form, are at the heart of our biological and cognitive functions. Traditional in vitro techniques for studying neural networks use two-dimensional multi-electrode arrays.
Tooker, Angela Colleen
core   +1 more source

Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

open access: yesInternational Journal of Polymer Science, 2017
We examined an environmentally friendly photoresist removal method using H radicals produced by decomposing hydrogen on a hot iridium catalyst. We examined the relationship between photoresist removal rate and its surface temperature using thin film ...
Masashi Yamamoto   +5 more
doaj   +1 more source

UCST‐Responsive PMEGA: From Solution Behavior to Functional Hydrogel Surfaces

open access: yesAdvanced Materials Interfaces, EarlyView.
PMEGA is used as a versatile water‐based UCST‐responsive platform for engineering microstructured hydrogel coatings via a thiol–ene CLAG approach. From PMEGAs of well‐defined UCST properties, the UV‐based CLAG method provides precise control over film thickness, ranging from nanometers to micrometers, and enables high‐resolution patterning.
Thi Phuong Thu Nguyen   +4 more
wiley   +1 more source

Simple Localization of Nanofiber Scaffolds via SU-8 Photoresist and Their Use for Parallel 3D Cellular Assays

open access: yes, 2012
A simple, new approach to localizing electrospun nanofiber scaffolds simply by direct writing of SU-8 photoresist followed by UV polymerization is presented.
Wen, Weijia   +10 more
core   +1 more source

In situ SU-8 silver nanocomposites

open access: yesBeilstein Journal of Nanotechnology, 2015
Nanocomposite materials containing metal nanoparticles are of considerable interest in photonics and optoelectronics applications. However, device fabrication of such materials always encounters the challenge of incorporation of preformed nanoparticles ...
Søren V. Fischer   +2 more
doaj   +1 more source

Surface Functionalization Modulates Collective Cell Behavior Near Topological Defects Induced by Topographical Patterning

open access: yesAdvanced Materials Interfaces, EarlyView.
Strongly adhered cells align with concentric circular ridges and exhibit predominantly tangential motion, whereas weakly adhered cells fail to follow topographical guidance and display enhanced radial inward motion. ABSTRACT Living cells establish long‐range orientational order through collective alignment, giving rise to topological defects whose ...
Prasoon Awasthi   +4 more
wiley   +1 more source

Acoustic resonant imaging technique for characterization ofphotoresist properties depending on hard bake temperature

open access: yese-Journal of Nondestructive Testing
Photoresists are essential materials in semiconductor fabrication, specifically in lithography, where their physical and chemical properties influence pattern generation. However, their light-reactive make property measurements challenging.
Hyelin Kim, Hironori Tohmyoh
doaj   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

open access: yesAdvanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source

Micropillar‐Engineered Hybrid Adhesive Patch for Surface‐Conformable and Directional Adhesion

open access: yesAdvanced Materials Technologies, EarlyView.
This work presents a surface‐conformable hybrid adhesive integrating height‐optimized hexagonal micropillars with open‐rectangular cuts. The micropillars enhance rough‐surface contact and microscale crack arrest, while the cuts guide and reverse interfacial cracks for strong and directional adhesion. The multiscale architecture achieves robust pull‐off
Seongjin Park   +4 more
wiley   +1 more source

Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist [PDF]

open access: yes, 1977
The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the ...
Shellan, J. B.   +3 more
core  

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