Results 101 to 110 of about 31,465 (305)

In-Situ Monitoring of Photoresist Thickness Contour [PDF]

, 2006
In microelectronics processing, coating of photoresist is a common process. It is important to ensure the uniformity of the photoresist thickness across the wafer. In this paper, we propose an in-situ monitoring system.
Wu, X.D., Tay, A., Wu, X., Arthur Tay, Weng Ho, Chen, X.Z., Xiaodong Wu, Chen, X., Xiaoqi Chen, Ho, W.K.   +9 more
core   +1 more source

Characterized Ecoflex Polydimethylsiloxane (PDMS) Hybrids for Advanced Flexible Devices

Advanced Materials Technologies, EarlyView.
Ecoflex–PDMS hybrids are systematically characterized to identify an optimal composition that balances stretchability, optical transparency, and plasma bonding, enabling multifunctional applications in stretchable microfluidics, flexible sensing, and soft robotics.
Xiaoyue Kang, Zhefan Chen, Zhiyang Hong, Wanting Chen, Qingtian Zhang, Amith Mudugamuwa, Tuan‐Khoa Nguyen, Lingxi Ouyang, Nam‐Trung Nguyen, Jun Zhang, Dan Yuan   +10 more
wiley   +1 more source

Liquid Crystal Elastomer Actuator Matrix for Large Area Applications

Advanced Materials Technologies, EarlyView.
A scalable approach is used to manufacture a digitally‐controllable, 2D 5 × 5 actuator matrix. The elements of the matrix are produced by direct ink writing of a liquid crystal elastomer ‘artificial muscle’ on large‐area flexible thin‐film heaters. In optimizing the low‐power actuators, multiple heater designs and substrate materials are investigated ...
Giulia Spallanzani, Bart Peeters, Danqing Liu, Peter Zalar, Hylke B. Akkerman, Jeroen A. H. P. Sol   +5 more
wiley   +1 more source

Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

International Journal of Polymer Science, 2017
We examined an environmentally friendly photoresist removal method using H radicals produced by decomposing hydrogen on a hot iridium catalyst. We examined the relationship between photoresist removal rate and its surface temperature using thin film ...
Masashi Yamamoto, Shiro Nagaoka, Hironobu Umemoto, Keisuke Ohdaira, Takashi Nishiyama, Hideo Horibe   +5 more
doaj   +1 more source

Recent Advances in Transparent Microelectrode Device Architecture and Fabrication Strategies for Biomedical Applications

Advanced Materials Technologies, EarlyView.
Transparent microelectrode arrays enable simultaneous optical and electrical electrophysiology with high spatiotemporal resolution, allowing multimodal observations of dynamic biological systems. Advances in materials and device architectures improve device performance by addressing key trade‐offs between optical transparency, impedance, and ...
Michael Abraham Listyawan, Tran Bach Dang, Chi Cong Nguyen, Yee Lap Pong, Tianruo Guo, Thanh Nho Do, Hoang‐Phuong Phan   +6 more
wiley   +1 more source

In situ SU-8 silver nanocomposites

Beilstein Journal of Nanotechnology, 2015
Nanocomposite materials containing metal nanoparticles are of considerable interest in photonics and optoelectronics applications. However, device fabrication of such materials always encounters the challenge of incorporation of preformed nanoparticles ...
Søren V. Fischer, Basil Uthuppu, Mogens H. Jakobsen   +2 more
doaj   +1 more source

Photoresist application by roller coating

, 1976
Roller coating of AZ1350J photoresist onto 3.75- by 4.5-inch (95 by 114 mm) substrates was investigated as an integral part of an overall, cost-effective hybrid microcircuit (HMC) photolithography process.
Schantz, L. E.
core   +1 more source

Liquid Metal Resistive Sensing Architectures for Measuring Diaphragm Strain Responses on Obstructed Surfaces

Advanced Materials Technologies, EarlyView.
A liquid metal‐based strain‐sensing architecture to measure the deformation of a circular diaphragm against obstructed surfaces is formulated using finite element modeling and confocal imaging to establish the mechanical framework and is utilized to control diaphragm‐induced confinement on a bead array, as validated by biomolecular loading level ...
Abdullah‐Bin Siddique, Jui‐Hong Weng, Deng‐Kai Yang, Chia‐Fu Chou, Nathan S. Swami   +4 more
wiley   +1 more source

Acoustic resonant imaging technique for characterization ofphotoresist properties depending on hard bake temperature

e-Journal of Nondestructive Testing
Photoresists are essential materials in semiconductor fabrication, specifically in lithography, where their physical and chemical properties influence pattern generation. However, their light-reactive make property measurements challenging.
Hyelin Kim, Hironori Tohmyoh
doaj   +1 more source

photoresist

, 2014
Citation: 'photoresist' in the IUPAC Compendium of Chemical Terminology, 3rd ed.; International Union of Pure and Applied Chemistry; 2006. Online version 3.0.1, 2019. 10.1351/goldbook.P04651 • License: The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International for individual terms.
openaire   +1 more source