Results 91 to 100 of about 11,199 (255)
SU-8 Guiding Layer for Love Wave Devices [PDF]
SU-8 is a technologically important photoresist used extensively for the fabrication of microfluidics and MEMS, allowing high aspect ratio structures to be produced.
Nicola Doy +10 more
core +1 more source
Cryo-electron tomography reconstructs polymer in liquid film for fab-compatible lithography
Liquid film is ubiquitous in nature and serves as the critical medium for the dissolution of photoresist to create nanoscale circuit patterns in lithography, which is a core task since the birth of semiconductor industry.
Liming Zheng +15 more
doaj +1 more source
A microfluidic method is presented which enables parallelized fabrication of rod‐shaped microgels, based on step‐emulsification (SE) droplet generation and subsequent droplet distribution and confinement, combined in a single device. Microgel rods are fabricated in parallel at different flow rates based on two light‐mediated crosslinking chemistries ...
Matthias Mork +5 more
wiley +1 more source
Outgassing of Photoresist During Ion Implantation
Outgassing of HUNT HPR 204 photoresist during ion implantation has been characterized by means of quadrupole mass analysis. The influence of the various parameters (implantation eneray, beam current, ion species) has been studied in order to point out ...
J.F. Michaud, M. Bruel, D. Roche
core +1 more source
Inkjet-Printed Dielectric Layer for the Enhancement of Electrowetting Display Devices
Electrowetting with a dielectric layer is commonly preferred in practical applications. However, its potential is often limited by factors like the properties of the dielectric layer and its breakdown, along with the complexity of the deposition method ...
Hongwei Jiang +8 more
doaj +1 more source
The interfacial spin‐orbit interaction in single‐crystalline Fe1−xCox thin films grown on GaAs(001) can be continuously tuned via alloying. Using spin‐orbit ferromagnetic resonance, the authors find that the interfacial spin‐orbit fields exhibit a nonmonotonic dependence on Co concentration, with a minimum at 20% Co. ABSTRACT The discovery of intrinsic
Hongrui Lao +9 more
wiley +1 more source
Current‐Induced Domain Wall Dynamics in Pt/Co/Ni/Co Nanoribbons With Curvilinear Cross‐Sections
3D curvilinear magnetic racetrack nanoribbons are formed with concave and convex cross‐sections using an advanced multi‐photon 3D printer. The curvature is shown to strongly affect current‐induced domain wall motion along the nanoribbons. In nanoribbons with cross‐sections that have both concave and convex segments, the velocities of domain walls with ...
Tiange Dong +6 more
wiley +1 more source
Lithography‐Compatible Conductive Metal–Organic Frameworks for Scalable Electronics
Conductive MOF thin films are integrated as gate electrodes in semiconductor devices through a photolithography‐compatible patterning strategy. CVD‐grown 2D MOF thin films enable stable operation across bottom‐gate MoS2/MoTe2 field‐effect transistors and top‐gate IGZO arrays, highlighting the potential of conductive MOFs as functional electronic ...
Hyeonwoo Lee +9 more
wiley +1 more source
A chemically defined PEG‐based microgel platform enables scalable, reproducible production of three‐dimensional microgel‐iPSC constructs in multiple sizes. The system is compatible with high‐throughput automation and supports human iPSC expansion and differentiation within a single construct, including directed differentiation into cardiac organoids ...
Laura Klasen +8 more
wiley +1 more source
Photoresist application by roller coating
Roller coating of AZ1350J photoresist onto 3.75- by 4.5-inch (95 by 114 mm) substrates was investigated as an integral part of an overall, cost-effective hybrid microcircuit (HMC) photolithography process.
Schantz, L. E.
core +1 more source

