Results 71 to 80 of about 31,465 (305)
Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography [PDF]
, 2021 SPR 220-3 photoresist was spin-coated onto a silicon wafer, exposed using a Heidelberg DWL66+ laserwriter at different laser powers, and developed at different temperatures.
Farnan, Dale, Watson, George Patrick
core
, 2023 Photoresist stripping is the final step in the photolithography process that forms fine patterns for electronic devices. Recently, a mixture of ethylene carbonate (EC) and propylene carbonate (PC) has attracted attention as a new stripper based on its ...
Masaaki Akamatsu (1604932) +5 more
core +1 more source
Advanced Materials, EarlyView.Vertical organic electrochemical transistors (vOECTs) are limited in speed by ion‐impermeable metal electrodes that slow ion injection. Using ion‐permeable PBFDO top electrodes allows direct vertical ion injection into BBL channels, achieving high current densities (>400 A cm−2), large on/off ratios (>106), and ultrafast switching in 28 µs. This sets a
Han‐Yan Wu +14 more
wiley +1 more source
Dissolution Rate Monitor Tool to Measure EUV Photoresist Dissolution
, 2017 The resist development step in photolithography is a complex process involving selective dissolution between exposed and unexposed photoresist. This phenomenon is commonly described by a one-to-one relation between dissolution rate and deprotection level
De Simone, Danilo +5 more
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n‐Type Polymer Radio Frequency Rectifiers Operating at 18.5 GHz
Advanced Materials, EarlyView.Combining an n‐doped polymer semiconductor with wafer‐scale asymmetric planar electrodes featuring work function‐engineered contacts yields radio‐frequency diodes and rectifying circuits operating at up to 18.5 GHz. The devices combine scalable manufacturing with an operating frequency previously unattainable by large‐area organic electronics ...
Lazaros Panagiotidis +19 more
wiley +1 more source
Numerical Modeling of Photoresist Profiles in Laser Interference Lithography
, 2021 Photolithography (or optical lithography) is a technique that produces structures in the lateral direction by performing a series of light-induced chemical changes in the photoresist.
Gongxu, Bai
core +1 more source
Organic Materials of Tomorrow: Horizons of Artificial Intelligence
Advanced Materials, EarlyView.This review examines machine learning techniques accelerating the discovery of organic semiconductors by linking molecular structure to properties. Key methods include graph neural networks, generative models, and active learning. Applications to organic photovoltaics demonstrate practical impact.
Harold Mena +3 more
wiley +1 more source
Advanced Materials, EarlyView.Path‐decoupled III–V van der Waals memtransistors spatially separate ionic and electronic transport to overcome the conventional trade‐off between accuracy and energy in neuromorphic hardware. Mobile K+ ions in the vdW gaps set a wide conductance window, Gmax/Gmin, while gate‐tunable hole conduction lowers programming energy, enabling reliable ...
Jihong Bae +13 more
wiley +1 more source
Photoresist Derived Carbon as a Substratum For Neuron Cell Culture
, 2009 Photoresist derived carbon films offer a unique set of properties that may prove useful as substratum for neuron cell growth. At this early stage in realizing the material's potential as a platform for neuron culture, it is necessary to examine surface ...
Pampuro, Richard Paul
core +3 more sources
, 2012 A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist ...
김진백
core +1 more source