Results 71 to 80 of about 11,199 (255)

New method for photoresist stripping [PDF]

, 1970
Vacuum dehydration of negatively working photoresist eliminates trace contamination of conventional stripping methods. The semiconductor substrate is coated with photoresist, exposed, developed, cured, and etched, and then placed in a vacuum.
Tobin, L. S., Davern, W. E.
core  

n‐Type Polymer Radio Frequency Rectifiers Operating at 18.5 GHz

Advanced Materials, EarlyView.
Combining an n‐doped polymer semiconductor with wafer‐scale asymmetric planar electrodes featuring work function‐engineered contacts yields radio‐frequency diodes and rectifying circuits operating at up to 18.5 GHz. The devices combine scalable manufacturing with an operating frequency previously unattainable by large‐area organic electronics ...
Lazaros Panagiotidis, Filip Aniés, Yiyang Yu, Mohammed Ghadiyali, Hendrik Faber, Zhanibek Bizak, Youssef Kabri, Pavlos Tzourmpakis, Suman Mandal, Linqu Luo, Temur Maksudov, Mohamad Insan Nugraha, Harold F. Mazo‐Mantilla, Patrice Vanelle, Julie Broggi, Khaled N. Salama, Udo Schwingenschlögl, Martin Heeney, Atif Shamim, Thomas D. Anthopoulos   +19 more
wiley   +1 more source

Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography [PDF]

, 2021
SPR 220-3 photoresist was spin-coated onto a silicon wafer, exposed using a Heidelberg DWL66+ laserwriter at different laser powers, and developed at different temperatures.
Farnan, Dale, Watson, George Patrick
core  

Organic Materials of Tomorrow: Horizons of Artificial Intelligence

Advanced Materials, EarlyView.
This review examines machine learning techniques accelerating the discovery of organic semiconductors by linking molecular structure to properties. Key methods include graph neural networks, generative models, and active learning. Applications to organic photovoltaics demonstrate practical impact.
Harold Mena, J. Terence Blaskovits, Kun‐Han Lin, Denis Andrienko   +3 more
wiley   +1 more source

Salty development of an optical photoresist [PDF]

, 2008
Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Physics, 2008.Includes bibliographical references (leaf 26).In this series of experiments, we add salt to a photoresist developer and observe the effect on photoresist contrast.
Chao, Adam (Adam C.)
core  

Effect of Ultrasonic Treatment of Dispersed Carbon Nanocomposite Media on the Formation, Electrical Conductivity, and Degradation of a Hydrogel for Metallic Stimulation Electrodes

Gels
This study investigates the impact of ultrasonic treatment on the deagglomeration of aggregates of single-walled carbon nanotubes (SWCNTs) and reduced graphene oxide (rGO). The aim of the research is to enhance the electrical conductivity of a biopolymer
Mikhail Savelyev, Artem Kuksin, Denis Murashko, Ekaterina Otsupko, Victoria Suchkova, Kristina Efremova, Pavel Vasilevsky, Ulyana Kurilova, Sergey Selishchev, Alexander Gerasimenko   +9 more
doaj   +1 more source

UV-LIGA: From Development to Commercialization

Micromachines, 2014
A major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung) started with the use of epoxy-based EPON® SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures without
Grégoire Genolet, Hubert Lorenz
doaj   +1 more source

Path‐Decoupled Cation‐Eutaxy III–V van der Waals Memristive Semiconductors for Mitigating the Neuromorphic Accuracy‐Energy Trade‐off

Advanced Materials, EarlyView.
Path‐decoupled III–V van der Waals memtransistors spatially separate ionic and electronic transport to overcome the conventional trade‐off between accuracy and energy in neuromorphic hardware. Mobile K+ ions in the vdW gaps set a wide conductance window, Gmax/Gmin, while gate‐tunable hole conduction lowers programming energy, enabling reliable ...
Jihong Bae, Ji Hoon Han, Taeyoung Kim, Jongbum Won, Seokmin Park, Gyu Won Kim, Sungsoon Kim, Hong Choi, Taehoon Kim, Hong‐Sub Lee, Jae‐Hyun Lee, Young Jin Choi, Jinwoo Cheon, Wooyoung Shim   +13 more
wiley   +1 more source

Magnetic Nanocrystals Modified Epoxy Photoresist for Microfabrication of AFM probes [PDF]

, 2009
A novel magnetic nanocomposite based on a negative tone epoxy photoresist and magnetic colloidal Fe2O3 nanocrystals (NCs) has been manufactured. The magnetic properties and the UV-photostructurability of the nanocomposite have been investigated.
Ingrosso, C., Gruetzner, G., Agostiano, A., Perez Murano, F., Innocenti, C., Sangregorio, C., Voigt, A., Martin, C., Brugger, J., Llobera, A., Curri, M.L., Striccoli, M.   +11 more
core   +1 more source

Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer

Sensors, 2012
There are two critical parameters for microbolometers: the temperature coefficient of resistance (TCR) of the sensing material, and the thermal conductance of the insulation structure.
Guo-Dung John Su, Chien-Jen Liao, Jian-Lun Lai   +2 more
doaj   +1 more source