Results 61 to 70 of about 11,199 (255)
Sensors, 2009 A novel plastic packaging of a piezoresistive pressure sensor using a patterned ultra-thick photoresist is experimentally and theoretically investigated. Two pressure sensor packages of the sacrifice-replacement and dam-ring type were used in this study.
Wood-Hi Cheng +3 more
doaj +1 more source
Доклады Белорусского государственного университета информатики и радиоэлектроники, 2020 The study is devoted to the research of the dependence of the processing results of photoresistive films on the silicon wafers surface in an ozone environment on the conditions and parameters of the process.
O. I. Tsikhan +4 more
doaj +1 more source
Advanced Healthcare Materials, EarlyView.Application of a zwitterionic poly(sulfobetaine methacrylate) (PSB) coating to microelectrode arrays and Ag/AgCl reference electrodes effectively inhibits biofouling and structural degradation. This strategy successfully enables simultaneous, long‐term electrophysiological recording and dopamine sensing in freely behaving mice, facilitating ...
Bingchen Wu +5 more
wiley +1 more source
Conveyorized Photoresist Stripping Replacement for Flex Circuit Fabrication [PDF]
, 2009 A replacement conveyorized photoresist stripping system was characterized to replace the ASI photoresist stripping system. This system uses the qualified ADF-25c chemistry for the fabrication of flex circuits, while the ASI uses the qualified potassium ...
null Megan Donahue, Donahue, Megan
core +1 more source
Ion‐Reconfigurable “N”‐Shaped Antiambipolar Behavior in Organic Electrochemical Transistors
Advanced Materials, EarlyView.A unique N‐shaped negative differential transconductance (NDT) characteristics is demonstrated in single‐polymer organic electrochemical transistors through a sequential doping–redox–doping process driven by iodide ions. This redox‐driven mechanism enables low‐voltage, ion‐controlled reconfigurability and tunable current modulation, allowing seamless ...
Debdatta Panigrahi +11 more
wiley +1 more source
Understanding molecular scale effects during photoresist processing
, 2003 textThe dimensional tolerances of photoresist features are now at the nanometer scale, where effects of individual molecules are important. In recognition of the industrial need for a molecular-scale understanding of photoresist performance ...
Schmid, Gerard Michael
core +3 more sources
Advanced Materials, EarlyView.Vertical organic electrochemical transistors (vOECTs) are limited in speed by ion‐impermeable metal electrodes that slow ion injection. Using ion‐permeable PBFDO top electrodes allows direct vertical ion injection into BBL channels, achieving high current densities (>400 A cm−2), large on/off ratios (>106), and ultrafast switching in 28 µs. This sets a
Han‐Yan Wu +14 more
wiley +1 more source
, 2012 A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist ...
김진백
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MEASUREMENT OF MICROHARDNESS OF PHOTORESIST FILMS ON SILICON BY THE SCRATCHING METHOD
Приборы и методы измерений, 2016 In recent years new types of resist for nano and submicronic lithography are intensively developed. As perspective materials for resist various polymeric compositions on a basis thermally and mechanically resistant polymers are considered. The purpose of
D. I. Brinkevich +5 more
doaj +1 more source
Advanced Materials, EarlyView.Azobenzene photoswitches translate molecular‐scale E/Z photoisomerization into macroscopic material responses and device‐level photonic functions. This Review highlights how azobenzene research has evolved from molecular photochemistry to photoalignment, mass migration, photomechanics, and heat release, ultimately enabling holography, reconfigurable ...
Heeju Son +20 more
wiley +1 more source