Results 41 to 50 of about 31,465 (305)
Advanced Functional Materials, EarlyView.A scalable, solution‐processed WSe2/ZrO2‐x van der Waals heterostructure realizes a light‐induced field‐tunneling synapse (LIFTS) that activates exclusively under bright illumination, emulating the photopic adaptation of the human retina at the device level.
Kijeong Nam +10 more
wiley +1 more source
BiomimeticsIn nature, engineering technology and daily life, wetting phenomena are widespread and have essential roles and significance. Bionics is becoming increasingly important nowadays and exploring the mechanism that influences biomimetic surface ...
Zhihao Zhang, Yuying Yan
doaj +1 more source
New method for photoresist stripping [PDF]
, 1970 Vacuum dehydration of negatively working photoresist eliminates trace contamination of conventional stripping methods. The semiconductor substrate is coated with photoresist, exposed, developed, cured, and etched, and then placed in a vacuum.
Tobin, L. S., Davern, W. E.
core
Memristive‐Gated RC‐Delay Synaptic Transistors for Time‐Encoded Analog in‐Memory Computing
Advanced Functional Materials, EarlyView.A Memristive‐Gated Transistor for Time‐Encoded Analog In‐Memory Computing — By exploiting the RC delay of a self‐rectifying interface‐type memristor, nonlinear I–V distortion is structurally bypassed, enabling 3‐bit nonvolatile memory, spike‐timing‐based analog encoding, and hardware‐calibrated reservoir‐computing validation within a unified device ...
Yun‐Seo Shin +7 more
wiley +1 more source
Bio‐Inspired Artificial Ionic Mechanoreceptor
Advanced Functional Materials, EarlyView.A skin‐inspired artificial mechanoreceptor based on ionic interactions is presented for biomimetic tactile sensing. Pressure‐driven ionic redistribution within microfluidic channels generates a self‐powered electrical signal without external bias. The generated waveform exhibits mechanoreceptor‐like temporal features, including overshoot and undershoot,
Mohammad Akbari +4 more
wiley +1 more source
Pyrolyzed Photoresist as a Continuous-Tone Mask for Grayscale Lithography. [PDF]
Adv Sci (Weinh)True grayscale contact photolithography masks are created by pyrolysis of 3D multiphoton resist patterns. The resulting carbon masks retain micrometer‐scale patterned features while providing continuous‐tone optical transmission. This approach provides access to high‐quality grayscale lithography without requiring exotic materials or commercial mask ...
Creason TD +9 more
europepmc +2 more sources
Decisive factors affecting plasma resistance and roughness formation in ArF photoresist
, 2010 Low plasma resistance and roughness formation in an ArF photoresist are serious issues in plasma processes. To resolve these issues, we investigated several factors that affect the roughness formation and plasma resistance in an ArF photoresist.
Takuji Uesugi +7 more
core +1 more source
Advanced Functional Materials, EarlyView.This study reports a self‐powered InGaAs nanowire photodetector achieving single‐photon‐level sensitivity in the shortwave infrared at non‐cryogenic temperatures. The device demonstrates high‐speed imaging capabilities even under extremely low‐flux conditions.
Kosala Dhanawansha +10 more
wiley +1 more source
Improved Photoresist Coating for Making CNT Field Emitters [PDF]
, 2009 An improved photoresist-coating technique has been developed for use in the fabrication of carbon-nanotube- (CNT) based field emitters is described. The improved photoresist coating technique overcomes what, heretofore, has been a major difficulty in the
Toda, Risaku, Manohara, Harish
core
A Study on the Resolution and Depth of Focus of ArF Immersion Photolithography
Micromachines, 2022 In this study, the resolution and depth of focus (DOF) of the ArF immersion scanner are measured experimentally according to numerical aperture (NA).
Jungchul Song, Chae-Hwan Kim, Ga-Won Lee
doaj +1 more source