Results 31 to 40 of about 11,199 (255)
Integration of Low‐Voltage Nanoscale MoS2 Memristors on CMOS Microchips
Advanced Functional Materials, EarlyView.This article presents the first monolithic integration of nanoscale MoS2‐based memristors into the back‐end‐of‐line of foundry‐fabricated CMOS microchips in a one‐transistor‐one‐resistor (1T1R) architecture. The MoS2‐based 1T1R cells exhibit forming‐free, nonvolatile resistive switching with ultra‐low operating voltages, low cycle‐to‐cycle variability ...
Jimin Lee +16 more
wiley +1 more source
Analysis of Shipley Microposit Remover 1165 and AZ P4620 Photoresist waste disposal for Company XYZ [PDF]
, 2001 Plan BCompany XYZ is a company that processes semiconductor wafers. In their process, AZ® P4620 photoresist, an organic compound, is removed by Shipley Microposit Remover 1165, an organic solvent.
Barthen, Michael L.
core
Development of a virtual metrology method using plasma harmonics analysis
AIP Advances, 2017 A virtual metrology technique based on plasma harmonics is developed for predicting semiconductor processes. From a plasma process performed by 300 mm photoresist stripper equipment, a strong correlation is found between optical plasma harmonics ...
H. Jun, J. Shin, S. Kim, H. Choi
doaj +1 more source
Photoresist modification by silver colloid solution: the role of silver nanoparticles content; pp. 212–219 [PDF]
Proceedings of the Estonian Academy of Sciences, 2012 The aim of this work was to investigate the influence of silver nanoparticles deposited from a colloid solution into a photoresist composition on the morphology and optical properties of the grating. The Ag colloid was produced by chemical reducÂtion of
Jovita Pudlauskaitė +3 more
doaj +1 more source
Advanced Functional Materials, EarlyView.ABSTRACT Chitosan, a polysaccharide upcycled from biowaste, has long promised sustainable, biocompatible, and antimicrobial films and devices, an appeal reinforced by its recent regulatory recognition, with several chitosan‐based antibacterial dressings gaining clearance through the Food and Drug Administration's 510(k) pathway.
Jacopo Nicoletti +16 more
wiley +1 more source
Spatially Resolved Cross-Linking Characterization by Imaging Low-Coherence Interferometry
Sensors, 2019 A method to characterize cross-linking differences in polymers such as waveguide polymers has been developed. The method is based on the scan-free information acquisition utilizing a low-coherence interferometer in conjunction with an imaging ...
Christopher Taudt +5 more
doaj +1 more source
Advances in Sustainable and Wearable Textile Based Soft Robotics
Advanced Functional Materials, EarlyView.This Review examines advances in wearable textile‐based soft robotics, focusing on sustainable materials, integrated sensing, and scalable actuation. It discusses manufacturing and system integration across healthcare, assistive robotics, prosthetics, and human–machine interfaces, and highlights key challenges in circular design, including life‐cycle ...
Zahir Abbas +6 more
wiley +1 more source
The use of a supercritical carbon dioxide-based solvent as a cost effective and environmentally sound alternative to current photoresist stripping solvents [PDF]
, 2002 Plan BThe semiconductor industry is facing challenges that involve the use of photoresist stripping solvents. This literature review compares the current solvents used, namely sulfuric acid and hydrogen peroxide and N-methylpyrrolidine, to an alternative
Knutson, Brian
core
Simulation and optimization of holographically exposed photoresist gratings
, 2022 S.244-249Standard approaches of lithographic process simulation have been applied to the simulation of holographically exposed photoresist gratings.
Erdmann, A. +3 more
core +1 more source
In-Situ Monitoring of Photoresist Thickness Contour [PDF]
, 2006 In microelectronics processing, coating of photoresist is a common process. It is important to ensure the uniformity of the photoresist thickness across the wafer. In this paper, we propose an in-situ monitoring system.
Wu, X.D. +9 more
core +1 more source