Results 11 to 20 of about 11,199 (255)
AIP Advances, 2015 A thickness distribution model of photoresist spin-coating on concave spherical substrate (CSS) has been developed via both theoretical studies and experimental verification.
S. Yang +8 more
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Effect of Photolithographic Biomimetic Surface Microstructure on Wettability and Droplet Evaporation Process [PDF]
BiomimeticsIn nature, engineering technology and daily life, wetting phenomena are widespread and have essential roles and significance. Bionics is becoming increasingly important nowadays and exploring the mechanism that influences biomimetic surface ...
Zhihao Zhang, Yuying Yan
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Physical model-based ArF photoresist formulation development
AIP AdvancesSince the logic 28 nm technology and beyond, ArF immersion lithography has been widely used in manufacturing. To fully utilize the potential of the lithographic resolution, process simulation has been used since the lithography process setup step.
Liwan Yue +4 more
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Photoresist Modulation Curves [PDF]
, 2004 Photoresist modulation curves are introduced as a quantitative way to characterize the photoresist process performance when used as a detector in a microlithographic system.
Smith, Bruce W. +3 more
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Electroplating moulds using dry film thick negative photoresist [PDF]
, 2003 This paper reports on progress on the feasibility of fabricating moulds for electroplating using Ordyl P-50100 (negative) acrylate polymer based dry film photoresist, commercially available from Elga Europe (http://www.elgaeurope.it).
Kukharenka, A. +10 more
core +1 more source
Electrowetting on superhydrophobic SU-8 patterned surfaces [PDF]
, 2006 Electrowetting on micro-patterned layers of SU-8 photoresist with an amorphous Teflon (R) coating has been observed. The cosine of the contact angle is shown to be proportional to the square of the applied voltage for increasing bias.
Evans, Carl +4 more
core +1 more source
The effect of SU-8 patterned surfaces on the response of the quartz crystal microbalance [PDF]
, 2005 In this work we present data showing the effect of patterning layers of SU-8 photoresist on a quartz crystal microbalance (QCM) and subsequent chemical treatment to increase their hydrophobicity. Patterns with 5 mu m diameter pillars spaced every 10 mu m
Evans, Carl +4 more
core +1 more source
Fabrication of Low Loss Lithium Niobate Rib Waveguides Through Photoresist Reflow
IEEE Photonics Journal, 2022 We present lithography and argon plasma etching of lithium niobate on insulator (LNOI) rib waveguides using reflowed photoresist etch masks and 405 nm photolithography.
Karan Prabhakar, Ronald M. Reano
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Applied Sciences, 2018 In order to use touch control products more conveniently, a general objective is to develop lighter and smaller touch panels. A touch panel using the one glass solution (OGS) is an important development.
Meng-Hua Li, Shen-Tsu Wang
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Nanomaterials, 2021 We report a laser-pyrolyzed carbon (LPC) electrode prepared from a black photoresist for an on-chip microsupercapacitor (MSC). An interdigitated LPC electrode was fabricated by direct laser writing using a high-power carbon dioxide (CO2) laser to ...
Soongeun Kwon +8 more
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