Results 11 to 20 of about 31,465 (305)

Establishment and experimental verification of the photoresist model considering interface slip between photoresist and concave spherical substrate

AIP Advances, 2015
A thickness distribution model of photoresist spin-coating on concave spherical substrate (CSS) has been developed via both theoretical studies and experimental verification.
S. Yang, Bayanheshig, X. L. Zhao, S. Xing, Y. X. Jiang, N. Wu, Q. B. Jiao, W. H. Li, X. Tan   +8 more
doaj   +2 more sources

Physical model-based ArF photoresist formulation development

AIP Advances
Since the logic 28 nm technology and beyond, ArF immersion lithography has been widely used in manufacturing. To fully utilize the potential of the lithographic resolution, process simulation has been used since the lithography process setup step.
Liwan Yue, Zhibiao Mao, Qiang Wu, Yanli Li, Yanqiu Li   +4 more
doaj   +2 more sources

Electroplating moulds using dry film thick negative photoresist [PDF]

, 2003
This paper reports on progress on the feasibility of fabricating moulds for electroplating using Ordyl P-50100 (negative) acrylate polymer based dry film photoresist, commercially available from Elga Europe (http://www.elgaeurope.it).
Kukharenka, A., Hollinshead, N, Grigore, L., Farooqui, M.M., Kukharenka, Elena, Hollinshead, N., Grigore, Luminita, Kukharenka, A, Kraft, Michael, Farooqui, M, Farooqui, Mateen M.   +10 more
core   +1 more source

Photoresist Modulation Curves [PDF]

, 2004
Photoresist modulation curves are introduced as a quantitative way to characterize the photoresist process performance when used as a detector in a microlithographic system.
Yongfa Fan, Smith, Bruce W., Bruce W. Smith, Anatoly Bourov, Bourov, Anatoly, Frank C. Cropanese, Cropanese, Frank C., Fan, Yongfa   +7 more
core   +1 more source

Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope

Nanomaterials, 2019
Patterning of lines of holes on a layer of positive photoresist SX AR-P 3500/6 (Allresist GmbH, Strausberg, Germany) spin-coated on a quartz substrate is carried out by using scanning near-field optical lithography.
Agata Roszkiewicz, Amrita Jain, Marian Teodorczyk, Wojciech Nasalski   +3 more
doaj   +1 more source

Fabrication of Low Loss Lithium Niobate Rib Waveguides Through Photoresist Reflow

IEEE Photonics Journal, 2022
We present lithography and argon plasma etching of lithium niobate on insulator (LNOI) rib waveguides using reflowed photoresist etch masks and 405 nm photolithography.
Karan Prabhakar, Ronald M. Reano
doaj   +1 more source

Electrowetting on superhydrophobic SU-8 patterned surfaces [PDF]

, 2006
Electrowetting on micro-patterned layers of SU-8 photoresist with an amorphous Teflon (R) coating has been observed. The cosine of the contact angle is shown to be proportional to the square of the applied voltage for increasing bias.
Evans, Carl, Newton, Michael, Shirtcliffe, Neil, Herbertson, Dale, McHale, Glen, Newton, MI, Herbertson, DL, McHale, G, Shirtcliffe, NJ, Evans, CR   +9 more
core   +1 more source

Using the Taguchi-Genetic Algorithm to Improve Lithographic Photoresist Operating Conditions of Touch Panels to Upgrade After-Develop Inspection

Applied Sciences, 2018
In order to use touch control products more conveniently, a general objective is to develop lighter and smaller touch panels. A touch panel using the one glass solution (OGS) is an important development.
Meng-Hua Li, Shen-Tsu Wang
doaj   +1 more source

Hierarchically Porous, Laser-Pyrolyzed Carbon Electrode from Black Photoresist for On-Chip Microsupercapacitors

Nanomaterials, 2021
We report a laser-pyrolyzed carbon (LPC) electrode prepared from a black photoresist for an on-chip microsupercapacitor (MSC). An interdigitated LPC electrode was fabricated by direct laser writing using a high-power carbon dioxide (CO2) laser to ...
Soongeun Kwon, Hak-Jong Choi, Hyung Cheoul Shim, Yeoheung Yoon, Junhyoung Ahn, Hyungjun Lim, Geehong Kim, Kee-Bong Choi, JaeJong Lee   +8 more
doaj   +1 more source

Conveyorized Photoresist Stripping Replacement for Flex Circuit Fabrication [PDF]

, 2009
A replacement conveyorized photoresist stripping system was characterized to replace the ASI photoresist stripping system. This system uses the qualified ADF-25c chemistry for the fabrication of flex circuits, while the ASI uses the qualified potassium ...
null Megan Donahue, Donahue, Megan
core   +1 more source