Results 111 to 120 of about 11,199 (255)
CONSIDERATIONS REGARDING THE USE OF SU-8 PHOTORESIST IN MEMS TECHNIQUE
Nonconventional Technologies Review, 2018 Microelectromechanical systems (MEMS) represent the technology of microscopic devices. In this domain, photolithography is the most common method in order to obtain MEMS structures.
Maria Roxana Marinescu +5 more
doaj
Smart MoleculesIn photolithography, shortening the exposure wavelength from ultraviolet to extreme ultraviolet (EUV, 13.5 nm) and soft X‐ray region in terms of beyond EUV (BEUV, 6.X nm) and water window X‐ray (WWX, 2.2–4.4 nm) is expected to further miniaturize the ...
Yifeng Peng +4 more
doaj +1 more source
Advanced Materials Technologies, EarlyView.A collagen‐based gut‐on‐chip model replicates the intestinal extracellular matrix, supporting villi‐like structures, tight junctions, and mucin production. This biomimetic platform enables rapid epithelial differentiation and functional barrier formation.
Fernanda López García +4 more
wiley +1 more source
ARSENIC SULPHIDE AS EVAPORATED DRY PHOTORESIST
, 1981 Most amorphous substances change their physical and chemical properties on illumination. The photosensitive solubility permits the use of amorphous arsenic sulphide as evaporated photoresist.
A. Buroff
core +1 more source
, 2014 Citation: 'photoresist' in the IUPAC Compendium of Chemical Terminology, 3rd ed.; International Union of Pure and Applied Chemistry; 2006. Online version 3.0.1, 2019. 10.1351/goldbook.P04651 • License: The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International for individual terms.
openaire +1 more source
Wood‐Derived Nanocellulose‐Biocarbon Fresnel‐Zone Plate Lenses for Sub‐THz Frequency Applications
Advanced Materials Technologies, EarlyView.Wood‐derived nanocellulose and lignin‐based biocarbon were combined to fabricate fully bio‐based Fresnel zone plate (FZP) lenses for sub‐terahertz frequencies. These sustainable FZP lenses exhibit low dielectric loss and high directivity, achieving performance comparable to that of metallic references, and remain functional under environmental stress ...
Riikka Haataja +9 more
wiley +1 more source
Photoresist Stripping using Ozone/Deionized Water Chemistry
, 1997 The use of sulfuric acid to strip photoresist from silicon wafers is a widely employed technique in the semiconductor manufacturing community.
R. Novak +5 more
core +1 more source
Defect‐Engineered ZnO Nanowire Arrays for Flexible Room‐Temperature Hydrogen Sensors
Advanced Materials Technologies, EarlyView.Fabrication process of patterned ZnO nucleation sites on a flexible polyimide (PI) substrate. Top/tilted‐view SEM images of ordered ZnO nanoflower arrays confined within patterned circular regions. AFM topography map with height data revealing a disk‐array structure, where the patterned regions (marked by a red dot circle) are elevated by ∼2 µm ...
Jun‐Ting Wang +7 more
wiley +1 more source
, 1996 Combined thermal and mechanical analysis of spun-on photoresist, and silylated photoresist films after each lithographic step was done using Differential Scanning Calorimetry (DSC) and Thermomechanical Analysis (TMA). For reacting photoresist systems the
Beltsios, K. +4 more
core
Advanced Materials Technologies, EarlyView.We introduce a novel method combining microfluidics, optogenetics, and human induced pluripotent stem cell (iPSC) technology to encapsulate single iPSC‐derived cardiomyocytes (iPSC‐CMs) in an optimal environment for functional characterization. This method enables direct genotype‐phenotype correlation for genetic studies and high‐throughput screening ...
Xiao‐Ting Wang +7 more
wiley +1 more source