Results 111 to 120 of about 31,465 (305)

Wafer‐Scale Top‐Down Patterning of Metal Halide Perovskites

open access: yesAdvanced Materials Technologies, EarlyView.
Wafer‐scale patterning of metal halide perovskite films is demonstrated on 150 mm substrates using a chemically amplified resist, polymethyl methacrylate (CAR‐PMMA) and a single reactive ion etching step. The streamlined process preserves film luminescence while defining submicrometer features across the full wafer, enabling dense, scalable integration
Federico Fabrizi   +7 more
wiley   +1 more source

Recent Advances in Light‐Addressable Electrochemistry for Spatially Resolved Applications

open access: yesAdvanced Materials Technologies, EarlyView.
This comprehensive review highlights light‐addressable electrochemistry as a powerful tool that uses light to control localized chemical reactions on unstructured semiconductor surfaces. The work evaluates advanced strategies to optimize electrode materials for enhanced spatial resolution and stability. Furthermore, it showcases diverse applications in
Nhi Trang Vo   +2 more
wiley   +1 more source

CONSIDERATIONS REGARDING THE USE OF SU-8 PHOTORESIST IN MEMS TECHNIQUE

open access: yesNonconventional Technologies Review, 2018
Microelectromechanical systems (MEMS) represent the technology of microscopic devices. In this domain, photolithography is the most common method in order to obtain MEMS structures.
Maria Roxana Marinescu   +5 more
doaj  

Highly Conductive and Transparent Coatings via Low‐Temperature Hydroiodic Acid Vapor Treatment of Oxo‐Graphene Thin Films

open access: yesAdvanced Materials Technologies, EarlyView.
The double self‐assembly (DSA) method applied to oxo‐graphene (oxo‐G) flakes followed by hydroiodic acid (HI) vapor treatment and low‐temperature annealing yields highly conductive, optically transparent thin films with the potential for applications in electronic and optoelectronic devices.
Arindam Konar   +13 more
wiley   +1 more source

Conformal coating by photoresist of sharp corners of anisotropically etched through-holes in silicon [PDF]

open access: yes, 1997
The authors describe a photoresist treatment yielding conformal coating of three-dimensional silicon structures. This even includes the sharp corners of through-holes obtained by anisotropic etching in (100)-silicon.
Heschel, Matthias, Bouwstra, Siebe
core  

Parameter Investigation for Stamp Manufacturing of Complex 3D Geometries Using Nanoimprint Lithography

open access: yesAdvanced Materials Technologies, EarlyView.
Nanoimprint lithography can replicate complex 3D microstructures with undercuts using single‐layer polymer stamps of different elasticities. By combining experiments and simulations, T‐shaped geometries and suitable undercut radii were identified that minimize stress and defects during demolding.
Christos Julianos Karapatzakis   +3 more
wiley   +1 more source

Absorption‐coefficient calculation of short‐wavelength photoresist materials: From EUV to BEUV and water window X‐ray

open access: yesSmart Molecules
In photolithography, shortening the exposure wavelength from ultraviolet to extreme ultraviolet (EUV, 13.5 nm) and soft X‐ray region in terms of beyond EUV (BEUV, 6.X nm) and water window X‐ray (WWX, 2.2–4.4 nm) is expected to further miniaturize the ...
Yifeng Peng   +4 more
doaj   +1 more source

A Human Bone Defect‐on‐a‐Chip Model for Studying Bone Regeneration

open access: yesAdvanced Materials Technologies, EarlyView.
This study presents a novel human bone defect‐on‐a‐chip (BDOC) model, aiming to recapitulate key processes during early bone healing, incorporating bone graft substitutes. Over 21 days, human mesenchymal stem/stromal cells (HMSCs) and human primary macrophages are co‐cultured in the BDOC together with calcium phosphate microparticles.
Maria Gabriella Fois   +11 more
wiley   +1 more source

Single‐Step Fabrication of Smart 3D Microstructures Exploiting Naphthopyrans as Photoinitiators and Photochromic Molecules

open access: yesAdvanced Optical Materials, EarlyView.
Naphthopyran–benzophenone compounds can act simultaneously as photoinitiators and photochromic molecules for two‐photon polymerization. Using a single‐step process, liquid photoresist is encapsulated within polymerized 3D microstructures, preserving reversible UV–vis photochromism after fabrication.
João P. Leote   +5 more
wiley   +1 more source

Development of Water-Developable Negative Photoresist for i-Line Photolithography Using Cellulose Derivatives with Underlayer

open access: yesElectronic Materials
Water-developable photoresist was synthesized by introducing methacrylate groups into hydroxypropyl cellulose (HPC), a cellulose derivative, via substitution of hydroxyl groups.
Hiryu Hayashi   +5 more
doaj   +1 more source

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