Results 251 to 260 of about 92,867 (295)

Crystalline boron produciton in plasma-chemical reactors

AIP Conference Proceedings, 1991
Based on the latest thermodynamic data on boron and 18 boron‐containing compounds computer‐based simulation of boron trichloride‐hydrogen system equilibration was made in 1000–6000 K temperature range, NH2/NBCl2=2−50 and 101Pa–1.01 MPa pressure range.The results made it possible to set applicable parameters of plasma‐chemical boron production process.A
A. B. Bakhtadze, I. A. Bairamashvili, V. I. Glazov, V. P. Korobtsev   +3 more
openaire   +1 more source

Numerical simulation of plasma-chemical reactors

2006
zbMATH Open Web Interface contents unavailable due to conflicting licenses.
Grigor'ev, Yu. N., Gorobchuk, A. G.
openaire   +2 more sources

Multiphysics Multi-Model Simulation of Large-Area Plasma Chemical Reactors

Volume 2: 29th Computers and Information in Engineering Conference, Parts A and B, 2009
Facing an ever-growing demand for large-area solar cells and flat-panel displays, the industry strives to produce larger, cheaper and better performing thin films. Computer simulation has proved to be a reliable and cost-efficient way to optimize existing technologies, to develop and test new ideas.
Krzhizhanovskaya, V., Ivanov, D., Gorbachev, Y., Smirnov, A.   +3 more
openaire   +2 more sources

Destruction of nonionic surfactants in a plasma-chemical reactor

Journal of Water Chemistry and Technology, 2017
A technology of wastewater treatment from nonionic surfactants by their destruction in a plasma-chemical reactor has been proposed. The effect of peculiarities of chemical structure of different surfactants and the treatment duration on the degree of their decomposition in plasma flame is investigated.
V. V. Goncharuk, R. E. Klishchenko, I. V. Kornienko   +2 more
openaire   +1 more source

Evolution of a droplet medium in a plasma-chemical reactor

Journal of Engineering Physics and Thermophysics, 2013
We modeled the plasma-chemical method of obtaining finely disperse powders by thermochemical decomposition of liquid pulverized reagents in a high-temperature heat-transfer agent in a column-type direct-flow cylindrical reactor. We consider the processes of working body motion in the reactor cavity and of thermochemical decomposition of the original ...
V. A. Arkhipov, S. S. Bondarchuk, A. S. Zhukov   +2 more
openaire   +1 more source

Plasma-chemical reactor with low ion energy for selective etching

2000 10th International Crimean Microwave Conference. "Microwave and Telecommunication Technology". Conference Proceedings (IEEE Cat. No.00EX415), 2000
The results of physical and technological tests of the modernized plasma-chemical reactor are presented. The chemically active ion's energy may be controlled by the magnetic field intensity in the range from 15 eV to 100 eV. (If it is necessary the ion energy may be increased up to 300 eV). The current density is /spl les/l5 mA/cm/sup -2/.
V.V. Ustalov, O.A. Fedorovich, A.A. Vdovenkov, S.K. Levitskaja   +3 more
openaire   +1 more source

Neutral gas flow velocity profiles in the jet plasma-chemical reactor

Vacuum, 1990
Abstract Radial and axial velocity profiles in the nitrogen flowing from the simple low pressure cylindrical jet were measured by the small size Prandtl probe. Guassian shapes of the radial velocity profiles were found. Supersonic values of the gas velocity up to M = 2 were measured at the jet axis, even at several centimeters from the nozzle mouth.
L Bárdoš, I Štěpánek, G Karwasz
openaire   +1 more source

Analysis of a Pulsed‐Plasma Chemical Vapor Deposition Reactor with Recycle

Journal of The Electrochemical Society, 1990
A simplified model for a time‐dependent plasma‐assisted chemical vapor deposition reactor was developed based on transport and reaction principles. The model equations were solved by the method of lines using collocation on finite elements for the spatial discretization. Emphasis was placed on the deposition rate and uniformity as a function of reactor
Sang‐Kyu Park, Demetre J. Economou
openaire   +1 more source

Characterization of a new reactor for remote plasma chemical vapor deposition

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1989
A remote plasma metalorganic chemical vapor deposition (CVD) system was designed, constructed, and characterized mathematically and experimentally. The system uses a new unique reactor geometry which is particularly well suited to remote plasma CVD. GaAs was grown in the system with and without a rf plasma and the results compared for various electrode
Alan D. Huelsman, R. Reif
openaire   +1 more source

Heat exchange in a plasma chemical reactor with multijet mixing chamber

Journal of Engineering Physics, 1985
The article presents the results of the investigation of the heat exchange in a multijet plasma chemical reactor in dependence on the hydrodynamic conditions and design dimensions of the conical mixing chamber.
B. A. Belov, N. S. Sal'nikova, A. L. Suris   +2 more
openaire   +1 more source