Results 1 to 10 of about 22,849 (261)

Plasma Chemical Etching of Gallium Arsenide in C2F5Cl-Based Inductively Coupled Plasma

Semiconductors, 2018
Pavel Yunin, M N Drozdov, Drozdov M N
exaly  

Plasma-Chemical Etching of Colloidal Photonic Crystal Polystyrene Films

2024 6th International Youth Conference on Radio Electronics, Electrical and Power Engineering (REEPE)
Artem R. Ibragimov, Vladislav S. Maltsev, Konstantin R. Min'ko, Cao V. Hoa, Ekaterina V. Panfilova   +4 more
openaire   +1 more source

The use of IR spectroscopy in studying the plasma chemical etching of silicon dioxide

Journal of Applied Spectroscopy, 1981
M. N. Bosyakov, A. A. Labuda, N. N. Nikiforenko   +2 more
openaire   +1 more source

Plasma-Chemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium

Russian Microelectronics
D. B. Murin, I. A. Chesnokov, I. A. Gogulev, A. L. Anokhin, A. E. Moloskin   +4 more
openaire   +1 more source

Chemical gases sensing properties of diamond nanocone arrays formed by plasma etching

Journal of Applied Physics, 2007
Fu S Y, Gu C Z, Li J J
exaly  

Design and development of medium-pressure plasma process for optical substrate finishing: A comparative study with wet chemical etching

Journal of Manufacturing Processes
Manas Das
exaly  

Evaluation of COF as etch gas for plasma-chemical 2 etching at atmospheric pressure for crystalline silicon wafer processing

2009
Lopez, Elena, Linaschke, Dorit, Mäder, Gerrit, Leistner, Matthias, Dani, Ines, Kaskel, Stefan, Beyer, Eckhard, Riva, Marcello   +7 more
openaire   +1 more source

Basis of macroscopic and microscopic surface shaping and smoothing by plasma assisted chemical etching

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1994
exaly  

Atmospheric pressure pecvd coating and plasma chemical etching for continuous processing

The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts., 2006
openaire   +1 more source

Plasma chemical etching of silicon in mems - technology

B K Bogomolov
exaly