Advances in Morphology Control of Through-Glass via Wet Etching for High-Performance Glass-Based Packaging [PDF]
Through-glass vias (TGVs) are important high-aspect-ratio structures for glass-based advanced integration, and their wet-etching morphology significantly influences metallization quality, electrical performance, and reliability. This review establishes a
Qi Zhang, Houtong Liu
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Formation of near-vertical trenches and fins with flat {−201} sidewalls on (512) β-Ga2O3 via TMAH wet etching [PDF]
We achieved the formation of near-vertical trenches and fins with exceptionally flat {−201}-faceted sidewalls on (512) β-Ga2O3 substrates by crystallographic wet etching in 25-wt% tetramethylammonium hydroxide (TMAH).
Takayoshi Oshima
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Dicing of composite substrate for thin film AlGaInP power LEDs by wet etching [PDF]
In this paper, thin film AlGaInP LED chips with a 50 μm thick composite metal substrate (Copper-Invar-Copper; CIC) were obtained by the wet etching process. The pattern of the substrate was done by the backside of the AlGaInP LED/CIC.
Ray-Hua Horng +4 more
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Study on Electrical and Mechanical Properties of Double-End Supported Elastic Substrate Prepared by Wet Etching Process [PDF]
Preparing elastic substrates as a carrier for dual-end supported nickel chromium thin film strain sensors is crucial. Wet etching is a vital microfabrication process widely used in producing microelectronic components for various applications.
Ding Song, Wenge Wu
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Fabrication of wafer-scale nanoporous AlGaN-based deep ultraviolet distributed Bragg reflectors via one-step selective wet etching [PDF]
In this paper, we reported on wafer-scale nanoporous (NP) AlGaN-based deep ultraviolet (DUV) distributed Bragg reflectors (DBRs) with 95% reflectivity at 280 nm, using epitaxial periodically stacked n-Al0.62Ga0.38N/u-Al0.62Ga0.38N structures grown on AlN/
Yongming Zhao +8 more
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Research on Wet Etching Techniques for GaInAs/AlInAs/InP Superlattices in Quantum Cascade Laser Fabrication [PDF]
Wet etching is the mainstream fabrication method for single-bar quantum cascade lasers (QCLs). Different etching solutions result in varying etching effects on III-V semiconductor materials.
Shiya Zhang +6 more
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Quasi-anisotropic wet etching of glass creates inclined microstructures for advanced optical and MEMS devices [PDF]
Glass is one of the most widely used functional materials in various fields, thus developing high-precision, on-demand and low-cost glass microstructuring technologies is essential for both academic and industry.
Jiajia Yu +9 more
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Anisotropy in the wet-etching of semiconductors
The surface chemistry and electrochemistry of the anisotropic etching of semiconductors are reviewed. Recent insights into the anisotropic chemical etching of silicon in alkaline solution and of electrochemical etching of anisotropic pores in n-type semiconductors are described.
Harold Philipsen, John J Kelly
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Mechanistic insights into the acidic wet-chemical silicon etching in HF–HX–X2 solutions, X = Cl, Br, I [PDF]
Alkaline, wet-chemical silicon etching is an essential part in the manufacturing of silicon solar cells, because the anisotropy of the etching process enables texturization of the wafer surface.
Nils Schubert +3 more
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Advanced Etching Techniques of LiNbO3 Nanodevices
Single LiNbO3 (LNO) crystals are widely utilized in surface acoustic wave devices, optoelectronic devices, and novel ferroelectric memory devices due to their remarkable electro-optic and piezoelectric properties, and high saturation and remnant ...
Bowen Shen +7 more
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