Results 11 to 20 of about 490,111 (287)

Gate recess engineering of pseudomorphic In0.30GaAs/GaAs HEMTs [PDF]

open access: yes, 1996
The authors report how the performance of 0.12 μm GaAs pHEMTs is improved by controlling both the gate recess width, using selective dry etching, and the gate position in the source drain gap, using electron beam lithography.
Taylor, M.R.S.   +6 more
core   +9 more sources

Transmittance modulation by gold nanoparticle mediated wet chemical etching of silica [PDF]

open access: yes, 2023
Wet etching in hydrofluoric acid (HF) is one of the most common routes for the surface texturing of silica, leading to improved optical properties, which find applications in several fields.
Neethu, Thomas, Parasuraman, Swaminathan
core   +1 more source

Wet Chemical and Plasma Etching of Photosensitive Glass

open access: yesSolids, 2023
Photosensitive glasses for radiation-induced 3D microstructuring, due to their optical transparency and thermal, mechanical, and chemical resistance, enable the use of new strategies for numerous microscale applications, ranging from optics to biomedical
Ulrike Brokmann   +4 more
doaj   +1 more source

InGaN Laser Diodes with Etched Facets for Photonic Integrated Circuit Applications

open access: yesMicromachines, 2023
The main objective of this work is to demonstrate and validate the feasibility of fabricating (Al, In) GaN laser diodes with etched facets. The facets are fabricated using a two-step dry and wet etching process: inductively coupled plasma—reactive ion ...
Krzysztof Gibasiewicz   +6 more
doaj   +1 more source

Investigation of a Macromolecular Additive on the Decrease of the Aluminum Horizontal Etching Rate in the Wet Etching Process

open access: yesMetals, 2022
The effect of a macromolecular additive on the etching rate of aluminum (Al) horizontal etching in the wet process was investigated in this work. The horizontal etching in the Al wet etching process became more evident as the film Al becomes thicker. The
Jingxiu Ding   +4 more
doaj   +1 more source

Dry etching and sputtering [PDF]

open access: yes, 2003
Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W.   +3 more
core   +2 more sources

Stress analysis, dielectric, piezoelectric, and ferroelectric properties of PZT thick films. Fabrication of a 50MHz Tm-pMUT annular array [PDF]

open access: yes, 2007
PZT films up to 35 μm thick were fabricated, using a composite sol gel route combining a PZT powder and a PZT sol. The maximum temperature for the process was 710°C.
Dauchy, Florent
core   +7 more sources

Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions

open access: yesMicro and Nano Engineering, 2023
Ruthenium (Ru) is a noble metal and is known to be resistant to many common chemicals and mixtures. We report in this study a controlled etching/recessing of Ru via wet processing and a combination of dry and wet process using metal-free chemical ...
Q.T. Le   +9 more
doaj   +1 more source

Preparation of small silicon carbide quantum dots by wet chemical etching [PDF]

open access: yes, 2013
Fabrication of nanosized silicon carbide (SiC) crystals is a crucial step in many biomedical applications. Here we report an effective fabrication method of SiC nanocrystals based on simple electroless wet chemical etching of crystalline cubic SiC ...
Szekrényes, Zsolt   +5 more
core   +1 more source

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