Results 11 to 20 of about 80,250 (296)
Micro and Nano Engineering, 2023 Ruthenium (Ru) is a noble metal and is known to be resistant to many common chemicals and mixtures. We report in this study a controlled etching/recessing of Ru via wet processing and a combination of dry and wet process using metal-free chemical ...
Q.T. Le +9 more
doaj +1 more source
Results in Physics, 2019 A simple and low-cost method using the combination of metal-assisted chemical etching (MacEtch) and anisotropic wet etching was performed to fabricate anti-reflection inverted pyramidal cavities on dendrite-like textured silicon substrates.
Yu-Keng Lin +2 more
doaj +1 more source
Double heterostructure lasers with facets formed by a hybrid wet and reactive-ion-etching technique [PDF]
, 1985 Double heterostructure lasers were fabricated in which one of the laser facets was produced by a hybrid wet and reactive-ion-etching technique. This technique is suitable for GaAs/GaAlAs heterostructure lasers and utilizes the selectivity of the plasma ...
Margalit, S. +3 more
core +1 more source
Investigation of the Integration of Strained Ge Channel with Si-Based FinFETs
Nanomaterials, 2022 In this manuscript, the integration of a strained Ge channel with Si-based FinFETs was investigated. The main focus was the preparation of high-aspect-ratio (AR) fin structures, appropriate etching topography and the growth of germanium (Ge) as a channel
Buqing Xu +9 more
doaj +1 more source
Wet etching of gold on graphene for high-quality resist-free graphene surfaces
Nano Express, 2023 Wet etching of gold on graphene is challenging due to the weak adhesion of the resist mask to graphene. We report an operating procedure for alkali ion-free wet etching of gold on graphene using a mixture of hydrochloric and nitric acids (aqua regia ...
J Kunc, M Shestopalov, J Jo, K Park
doaj +1 more source
Plasma Processing of Large Curved Surfaces for SRF Cavity Modification [PDF]
, 2014 Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which ...
Im, Do +5 more
core +4 more sources
Preparation of small silicon carbide quantum dots by wet chemical etching [PDF]
, 2013 Fabrication of nanosized silicon carbide (SiC) crystals is a crucial step in many biomedical applications. Here we report an effective fabrication method of SiC nanocrystals based on simple electroless wet chemical etching of crystalline cubic SiC ...
Adam Gali +9 more
core +1 more source
Reactive Ion Etching Process of Micro Mechanical Pendulum
MATEC Web of Conferences, 2017 This paper describes the reactive ion etching (RIE) technique of micro mechanical pendulum chip. Micro mechanical pendulum chip processed by the RIE has excellent performances and surface of the chip is smoother than the chip by wet etching.
Zhang Wei +3 more
doaj +1 more source
New Advances in Forming Functional Ceramics for Micro Devices [PDF]
, 2006 Micro electromechanical systems (MEMS) are finding uses in an increasing number of diverse applications. Currently the fabrication techniques used to produce such MEMS devices are primarily based on 2-D processing of thin films.
Dauchy, Florent +3 more
core +1 more source
Beilstein Journal of Nanotechnology, 2016 The optimization of etchant parameters in wet etching plays an important role in the fabrication of semiconductor devices. Wet etching of tetramethylammonium hydroxide (TMAH)/isopropyl alcohol (IPA) on silicon nanowires fabricated by AFM lithography is ...
Siti Noorhaniah Yusoh +1 more
doaj +1 more source