Results 31 to 40 of about 80,250 (296)
Ultra high molecular weight fibre cannot be dyed using conventional dyeing techniques as they are extremely hydrophobic and do not possess any polar groups. Wet etching of the surface was used as the pre-treatment process to improve the dyeability of the
Salma Farooq +3 more
doaj +1 more source
Surface recombination measurements on III–V candidate materials for nanostructure light-emitting diodes [PDF]
Surface recombination is an important characteristic of an optoelectronic material. Although surface recombination is a limiting factor for very small devices it has not been studied intensively. We have investigated surface recombination velocity on the
Bhat, R. +9 more
core +1 more source
Wet anisotropic etching for fluidic 1D nanochannels [PDF]
In this paper a method is proposed to fabricate channels for fluidic applications with a depth in the nanometer range. The channels with smooth and straight sidewalls are constructed with the help of micromachining technology by etching shallow trenches into <100> silicon using native oxide as a mask material and OPD ressist developer as the ...
Haneveld, J. +4 more
openaire +3 more sources
Wet etching offers an advantage as a soft, damage-less method to remove sacrificial material with close to nanometer precision which has become critical for the fabrication of nanoscale structures.
Antoine Pacco +5 more
doaj +1 more source
An Investigation of Processes for Glass Micromachining
This paper presents processes for glass micromachining, including sandblast, wet etching, reactive ion etching (RIE), and glass reflow techniques.
Nguyen Van Toan +2 more
doaj +1 more source
Preparation of Nickel Nanoparticles Using Nickel Raffinate Separated by Solvent Extraction from The Spent FECL3 Etching Solution [PDF]
FeCl3 bearing etching solution is mainly used for etching of metals used in shadow masks, PCBs and so on. Due course of Invar alloy etching process the FeCl3 bearing etching solution get contaminated with Ni2+ which affect adversely the etching ...
Il-Jeong Park +5 more
doaj +1 more source
Si(100) surfaces were prepared by wet-chemical etching followed by 0.3-1.5keV Ar ion sputtering, either at elevated or room temperature. After a brief anneal under ultrahigh vacuum conditions, the resulting surfaces were examined by scanning tunneling ...
Al-Bayati +25 more
core +1 more source
Ultra-thin silicon based piezoelectric capacitive tactile sensor [PDF]
This paper presents an ultra-thin bendable silicon based tactile sensor, in a piezoelectric capacitor configuration, realized by wet anisotropic etching as post-processing steps.
Dahiya, Ravinder +4 more
core +1 more source
This paper describes performance enhancement developments to a closed-loop pump-driven wire-guided flow jet (WGJ) for ultrafast X-ray spectroscopy of liquid samples.
Alessandra Picchiotti +13 more
doaj +1 more source
A Two-Step Etching Method to Fabricate Nanopores in Silicon [PDF]
A cost effectively method to fabricate nanopores in silicon by only using the conventional wet-etching technique is developed in this research. The main concept of the proposed method is a two-step etching process, including a premier double-sided wet ...
Chang, K. J., Chen, W. -Z., Wang, G. -J.
core +2 more sources

