Results 11 to 20 of about 6,644,773 (301)
Heat transfer properties of laser assisted plasma processing [PDF]
, 2012 Laser assisted plasma processing (LAPP) is a novel extension to already established Reactive Atom Plasma (RAP) processing for atmospheric pressure dry chemical etching of silicon based materials; this is mainly applied for optical uses.
Parkins, Jonathon
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Dry etching and sputtering [PDF]
, 2004 Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W., Rahman, M.
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FEATURES OF PLASMA CHEMICAL ETCHING OF LITHIUM TANTALATE SUBSTRATE (LiTaO3)
Problems of Atomic Science and Technology, 2021 The results of researches of plasma chemical treatment of lithium monocrystalline tantalate (LiTaO3) from gas type, bias voltage (energy of chemically active ions) and from current of additional bias generator are given. A closed-loop electron drift plasma chemical reactor and gas mixtures containing Ar, Ar + ClС4, and Ar + SF6 were used for the ...
O.A. Fedorovich +3 more
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ICP Etching of Silicon for Micro and Nanoscale Devices [PDF]
, 2010 The physical structuring of silicon is one of the cornerstones of modern microelectronics and integrated circuits. Typical structuring of silicon requires generating a plasma to chemically or physically etch silicon.
Henry, Michael David
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In-line plasma-chemical etching of crystalline silicon solar wafers at atmospheric pressure
, 2022 S.979-984Atmospheric pressure plasma technologies are a potential substitution for wet chemical and vacuum processes in the production of crystalline silicon solar cells, leading to a simplified in-line processing chain.
Linaschke, D. +7 more
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RESEARCH PROCESS PLASMA ETCHING SIO2 MEMBRANE
Вестник Дагестанского государственного технического университета: Технические науки, 2016 The article discusses the results of plasma chemical etching of silicon dioxide in the fluorine-containing medium in the manufacture of semiconductor devices.
T. A. Ismailov +3 more
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A New Reactive Atom Plasma Technology (RAPT) for Precision Machining: the Etching of ULE® Surface [PDF]
, 2006 Results on reactive atom plasma etching performed on ULE® (Corning Ultra Low Expansion) glass samples at atmospheric pressure are presented for the first time.
Lyford, N. +6 more
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Micro and Nano Engineering, 2023 Ruthenium (Ru) is a noble metal and is known to be resistant to many common chemicals and mixtures. We report in this study a controlled etching/recessing of Ru via wet processing and a combination of dry and wet process using metal-free chemical ...
Q.T. Le +9 more
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Preparation of small silicon carbide quantum dots by wet chemical etching [PDF]
, 2013 Fabrication of nanosized silicon carbide (SiC) crystals is a crucial step in many biomedical applications. Here we report an effective fabrication method of SiC nanocrystals based on simple electroless wet chemical etching of crystalline cubic SiC ...
Szekrényes, Zsolt +5 more
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Nanomaterials, 2019 Monolayer nano-sphere arrays attract great research interest as they can be used as templates to fabricate various nano-structures. Plasma etching, and in particular high-frequency plasma etching, is the most commonly used method to obtain non-close ...
Yun Chen +6 more
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