Results 31 to 40 of about 86,621 (303)

Reactive Ion Etching of X-Cut LiNbO₃ in an ICP/TCP System for the Fabrication of an Optical Ridge Waveguide

Applied Sciences, 2023
In this study, the technology for producing ridge waveguides with a minimal roughness of the sidewalls and material surface in a near-waveguide region was developed with the purpose of fabricating miniature photonic integrated circuits on a LiNbO3 ...
Andrei Kozlov, Dmitrii Moskalev, Uliana Salgaeva, Anna Bulatova, Victor Krishtop, Anatolii Volyntsev, Alexander Syuy   +6 more
doaj   +1 more source

Recrystallized parylene as a mask for silicon chemical etching [PDF]

, 2008
This paper presents the first use of recrystallized parylene as masking material for silicon chemical etch. Recrystallized parylene was obtained by melting parylene C at 350°C for 2 hours.
Kuo, Wen-Cheng, Lo, Hsi-wen, Tai, Yu-Chong, Yang, Yao-Joe   +3 more
core   +2 more sources

Peculiarity of plasmachemical etching of silicon plate edges of photoelectric converters [PDF]

Tekhnologiya i Konstruirovanie v Elektronnoi Apparature, 2009
Results of technological researches of plasmachemical reactor (PCR) for etching of silicon plate edges of photo-electric converters are described. Dependences of silicon etching speed on a discharge current, magnetic field intensity, quantity of the ...
Fedorovich O. A., Kruglenko M. P., Polozov B. P.   +2 more
doaj   +2 more sources

Anisotropic and low damage III-V/Ge heterostructure etching for multijunction solar cell fabrication with passivated sidewalls

Micro and Nano Engineering, 2021
This article presents a complete plasma etching process to etch high aspect ratio patterns on III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar cells with a through cell via contact architecture.
Mathieu de Lafontaine, Erwine Pargon, Guillaume Gay, Camille Petit-Etienne, Sylvain David, Jean-Paul Barnes, Névine Rochat, Abdelatif Jaouad, Maïté Volatier, Simon Fafard, Vincent Aimez, Maxime Darnon   +11 more
doaj   +1 more source

Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology [PDF]

, 2016
The effect of treatment by reactive ion etching in an argon atmosphere, and hydrogen plasma etching in a glow discharge plasma on the surface of the diamond films was investigated.
Gaydaychuk, Alexander Valerievich, Linnik, Stepan Andreevich, Okhotnikov, Vitaly Vladimirovich   +2 more
core   +1 more source

Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma

Scientific Reports, 2017
Cold atmospheric plasma has recently emerged as a simple, low-cost and efficient physical method for inducing significant biological responses in seeds and plants without the use of traditional, potentially environmentally-hazardous chemicals, fungicides
Xing-Quan Wang, Ren-Wu Zhou, Gerard de Groot, Kateryna Bazaka, Anthony B. Murphy, Kostya (Ken) Ostrikov   +5 more
doaj   +1 more source

SF6 plasma treatment for leakage current reduction of AlGaN/GaN heterojunction field-effect transistors

Results in Physics, 2018
In this study, we have investigated the effects of SF6 plasma treatment on the isolation leakage current characteristics of AlGaN/GaN heterojunction field-effect transistors (HFETs).
Hyun-Seop Kim, Kwang-Seok Seo, Jungwoo Oh, Ho-Young Cha   +3 more
doaj   +1 more source

Surface Characterisation of PEEK and Dentin, Treated with Atmospheric Non-Thermal PDD Plasma, Applicable for Dental Chair-Side Procedures

Plasma, 2021
This study investigates the suitability of Piezoelectric Direct Discharge Plasma as a tool for wetting behaviour modification of PEEK and dentin, and compares the results of this method with low-pressure plasma treatment and phosphoric acid etching ...
Marius Behnecke, Vincent Steinert, Svea Petersen   +2 more
doaj   +1 more source

Thermodynamic Pathways of Nonequilibrium Solidification in Wire‐Arc Additive Manufacturing Fe‐Based Multicomponent Alloy Structures

Advanced Engineering Materials, EarlyView.
Geometry‐driven thermal behavior in wire‐arc additive manufacturing (WAAM) influences microstructural evolution during nonequilibrium solidification of a chemically complex Fe–Cr–Nb–W–Mo–C nanocomposite system. By comparing different deposits configurations, distinct entropy–cooling rate correlations, segregation, and carbide evolution are revealed ...
Blanca Palacios, Anthony Gonzalez, Aleksander Aleman, Tyler Dolmetsch, Tanaji Paul, Arvind Agarwal   +5 more
wiley   +1 more source

Effects of corona discharge plasma radiation on alfalfa seeds

Fushe yanjiu yu fushe gongyi xuebao, 2021
Alfalfa seeds were directly treated with corona discharge plasma radiation and compared with the control group, which was covered by a Petri dish, blocking the etching effect of ionic wind and thus simulating the effect of a non-uniform electric field ...
XU Wenqian, LUAN Xinyu, LI Yibing, CHEN Hao, DING Changjiang, SONG Zhiqing   +5 more
doaj   +1 more source