Results 31 to 40 of about 22,849 (261)

Diode Circuit-based Glass Plasma-Chemical Etching Capabilities

Mechanical Engineering and Computer Science, 2017
The paper discusses technological capabilities to improve a plasma-chemical etching (PCE) rate of the silicate glasses through a chromium mask in the equipment with a planar inductor located outside, which forms a high-frequency diode system. Suggests a case when the inductor in the form of a planar spiral antenna is above the work-piece.The PCE ...
K. N. Bugorkov, H. R. Saghatelyan
openaire   +1 more source

SF6 plasma treatment for leakage current reduction of AlGaN/GaN heterojunction field-effect transistors

Results in Physics, 2018
In this study, we have investigated the effects of SF6 plasma treatment on the isolation leakage current characteristics of AlGaN/GaN heterojunction field-effect transistors (HFETs).
Hyun-Seop Kim, Kwang-Seok Seo, Jungwoo Oh, Ho-Young Cha   +3 more
doaj   +1 more source

Anisotropic and low damage III-V/Ge heterostructure etching for multijunction solar cell fabrication with passivated sidewalls

Micro and Nano Engineering, 2021
This article presents a complete plasma etching process to etch high aspect ratio patterns on III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar cells with a through cell via contact architecture.
Mathieu de Lafontaine, Erwine Pargon, Guillaume Gay, Camille Petit-Etienne, Sylvain David, Jean-Paul Barnes, Névine Rochat, Abdelatif Jaouad, Maïté Volatier, Simon Fafard, Vincent Aimez, Maxime Darnon   +11 more
doaj   +1 more source

Thermodynamic Pathways of Nonequilibrium Solidification in Wire‐Arc Additive Manufacturing Fe‐Based Multicomponent Alloy Structures

Advanced Engineering Materials, EarlyView.
Geometry‐driven thermal behavior in wire‐arc additive manufacturing (WAAM) influences microstructural evolution during nonequilibrium solidification of a chemically complex Fe–Cr–Nb–W–Mo–C nanocomposite system. By comparing different deposits configurations, distinct entropy–cooling rate correlations, segregation, and carbide evolution are revealed ...
Blanca Palacios, Anthony Gonzalez, Aleksander Aleman, Tyler Dolmetsch, Tanaji Paul, Arvind Agarwal   +5 more
wiley   +1 more source

Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma

Scientific Reports, 2017
Cold atmospheric plasma has recently emerged as a simple, low-cost and efficient physical method for inducing significant biological responses in seeds and plants without the use of traditional, potentially environmentally-hazardous chemicals, fungicides
Xing-Quan Wang, Ren-Wu Zhou, Gerard de Groot, Kateryna Bazaka, Anthony B. Murphy, Kostya (Ken) Ostrikov   +5 more
doaj   +1 more source

Surface Characterisation of PEEK and Dentin, Treated with Atmospheric Non-Thermal PDD Plasma, Applicable for Dental Chair-Side Procedures

Plasma, 2021
This study investigates the suitability of Piezoelectric Direct Discharge Plasma as a tool for wetting behaviour modification of PEEK and dentin, and compares the results of this method with low-pressure plasma treatment and phosphoric acid etching ...
Marius Behnecke, Vincent Steinert, Svea Petersen   +2 more
doaj   +1 more source

Low‐Temperature Imidization of Polyimides (PI) for Scalable Manufacturing of Flexible Wearable Electronics

Advanced Engineering Materials, EarlyView.
Low‐temperature imidization of PEG‐modified polyimide enables fully screen‐printed, roll‐to‐roll fabrication of flexible electrodes on PET substrates, delivering robust mechanical durability and reliable ECG/EMG signal performance for wearable electronics.
Akib Abdullah Khan, Jong‐Hoon Kim
wiley   +1 more source

Numerical simulation of plasma etching process with AAO mask based on PIC/MCC model

ChemPhysMater
This paper presents a Particle-in-Cell Monte Carlo Collision (PIC/MCC) numerical simulation to investigate plasma etching processes utilizing an anodic aluminum oxide (AAO) mask.
Zeping Li, Ran An, Mingyan Yang, Dongjing Li, Hao Wu   +4 more
doaj   +1 more source

Effects of corona discharge plasma radiation on alfalfa seeds

Fushe yanjiu yu fushe gongyi xuebao, 2021
Alfalfa seeds were directly treated with corona discharge plasma radiation and compared with the control group, which was covered by a Petri dish, blocking the etching effect of ionic wind and thus simulating the effect of a non-uniform electric field ...
XU Wenqian, LUAN Xinyu, LI Yibing, CHEN Hao, DING Changjiang, SONG Zhiqing   +5 more
doaj   +1 more source

Uniform Amorphization of Crystalline Silicon Surfaces Enabled by Deep Ultraviolet Femtosecond Laser Pulses

Advanced Engineering Materials, EarlyView.
Deep‐UV (258 nm) femtosecond pulses enable uniform amorphous silicon writing on Si(100)/(111) with a six‐fold larger fluence amorphization window than NIR methods. Optimized fluence and overlap yield 20–45 nm uniform and continuous amorphous layers. Microscopy shows sharp interfaces, and real‐time reflectivity reveals nanosecond melt–resolidification ...
Wissal Benali, Magali Gregoire, Matys Guyard, Tatiana Itina, David Grojo, Pol Sopeña   +5 more
wiley   +1 more source