Results 21 to 30 of about 86,621 (303)

Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions

open access: yesMicro and Nano Engineering, 2023
Ruthenium (Ru) is a noble metal and is known to be resistant to many common chemicals and mixtures. We report in this study a controlled etching/recessing of Ru via wet processing and a combination of dry and wet process using metal-free chemical ...
Q.T. Le   +9 more
doaj   +1 more source

Exploring Vacuum Casting Techniques for Micron and Submicron Features [PDF]

open access: yes, 2004
A study of resolution limits in standard rapid prototyping vacuum cast molding processes and adaptation of this technique to reach submicron accuracy is proposed.
Denoual, M., Lepioufle, B., Mognol, P.
core   +1 more source

A Facile, Low-Cost Plasma Etching Method for Achieving Size Controlled Non-Close-Packed Monolayer Arrays of Polystyrene Nano-Spheres

open access: yesNanomaterials, 2019
Monolayer nano-sphere arrays attract great research interest as they can be used as templates to fabricate various nano-structures. Plasma etching, and in particular high-frequency plasma etching, is the most commonly used method to obtain non-close ...
Yun Chen   +6 more
doaj   +1 more source

Functionalisation of Ti6Al4V and hydroxyapatite surfaces with combined peptides based on KKLPDA and EEEEEEEE peptides [PDF]

open access: yes, 2017
Surface modifications are usually performed on titanium alloys to improve osteo-integration and surface bioactivity. Modifications such as alkaline and acid etching, or coating with bioactive materials such as hydroxyapatite, have previously been ...
Ben-Nissan, Besim   +4 more
core   +6 more sources

Evolution of surface morphology and properties of diamond films by hydrogen plasma etching

open access: yesGreen Processing and Synthesis, 2023
The micron-scale diamond film was prepared using hydrogen and methane as the mixed gas supplies via self-developed 3 kW/2,450 MHz microwave plasma chemical vapor deposition (MPCVD) equipment.
Chu Genjie   +5 more
doaj   +1 more source

Plasma Processing of Large Curved Surfaces for SRF Cavity Modification [PDF]

open access: yes, 2014
Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which ...
Im, Do   +5 more
core   +4 more sources

Estimation of the Optimum Etching Time and Etching Parameters for CR-39 Nuclear Tracks Detector by Applying Plasma and Chemical Etching Techniques

open access: yesAl-Mustansiriyah Journal of Science
Background: CR-39 nuclear track detectors are widely used in various fields, including science, technology, astronomy, and environmental preservation, to detect and register heavy ions, neutrons, and alpha particles.
Abdulkader Makki Dahham   +3 more
doaj   +1 more source

Micromachining of electret materials, advantages and possibilities [PDF]

open access: yes, 1988
A process is described for the micromachining of organic electret materials like Teflon FEP (fluorinated ethylene propylene). The authors have used photolithography and plasma etching, by which electrets can be etched selectively.
Bergveld, P., Voorthuyzen, J.A.
core   +3 more sources

High-density plasma etching characteristics of aluminum-doped zinc oxide thin films in Cl2/Ar plasma

open access: yesMaterials Research Express, 2020
We investigated the etching characteristics of aluminum-doped zinc oxide (AZO) thin films in an adaptively coupled plasma (ACP) system. The dry etching characteristics of AZO films were studied by changing the Cl _2 /Ar gas mixing ratio, RF power, DC ...
Liting Zhang   +3 more
doaj   +1 more source

Evolution of defect formation during atomically precise desulfurization of monolayer MoS2

open access: yesCommunications Materials, 2021
Desulfurization of MoS2 alters its chemical and physical properties by breaking structural symmetry. Here, the atomic-scale mechanistic pathway by which this occurs is investigated during plasma etching, and changes in chemical structure and physical ...
Jong-Young Lee   +9 more
doaj   +1 more source

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