Results 21 to 30 of about 22,849 (261)

Micro-texturing into DLC/diamond coated molds and dies via high density oxygen plasma etching

Manufacturing Review, 2015
Diamond-Like Carbon (DLC) and Chemical Vapor Deposition (CVD)-diamond films have been widely utilized not only as a hard protective coating for molds and dies but also as a functional substrate for bio-MEMS/NEMS.
Yunata Ersyzario Edo, Aizawa Tatsuhiko
doaj   +1 more source

RESEARCH PROCESS PLASMA ETCHING SIO2 MEMBRANE

Вестник Дагестанского государственного технического университета: Технические науки, 2016
The article discusses the results of plasma chemical etching of silicon dioxide in the fluorine-containing medium in the manufacture of semiconductor devices.
T. A. Ismailov, P. R. Zakharova, B. A. Shangereeva, A. R. Shakhmaeva   +3 more
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Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions

Micro and Nano Engineering, 2023
Ruthenium (Ru) is a noble metal and is known to be resistant to many common chemicals and mixtures. We report in this study a controlled etching/recessing of Ru via wet processing and a combination of dry and wet process using metal-free chemical ...
Q.T. Le, E. Gül Arslan, J. Rip, H. De Coster, P. Verdonck, D. Radisic, F. Schleicher, I. Vaesen, T. Conard, E. Altamirano-Sanchez   +9 more
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A Facile, Low-Cost Plasma Etching Method for Achieving Size Controlled Non-Close-Packed Monolayer Arrays of Polystyrene Nano-Spheres

Nanomaterials, 2019
Monolayer nano-sphere arrays attract great research interest as they can be used as templates to fabricate various nano-structures. Plasma etching, and in particular high-frequency plasma etching, is the most commonly used method to obtain non-close ...
Yun Chen, Dachuang Shi, Yanhui Chen, Xun Chen, Jian Gao, Ni Zhao, Ching-Ping Wong   +6 more
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Evolution of surface morphology and properties of diamond films by hydrogen plasma etching

Green Processing and Synthesis, 2023
The micron-scale diamond film was prepared using hydrogen and methane as the mixed gas supplies via self-developed 3 kW/2,450 MHz microwave plasma chemical vapor deposition (MPCVD) equipment.
Chu Genjie, Li Sijia, Gao Jiyun, Yang Li, Hou Ming, Guo Shenghui   +5 more
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Estimation of the Optimum Etching Time and Etching Parameters for CR-39 Nuclear Tracks Detector by Applying Plasma and Chemical Etching Techniques

Al-Mustansiriyah Journal of Science
Background: CR-39 nuclear track detectors are widely used in various fields, including science, technology, astronomy, and environmental preservation, to detect and register heavy ions, neutrons, and alpha particles.
Abdulkader Makki Dahham, Jamoliddin Razzokov, Eldor Karimbaev, Raghad S. Mohammed   +3 more
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High-density plasma etching characteristics of aluminum-doped zinc oxide thin films in Cl2/Ar plasma

Materials Research Express, 2020
We investigated the etching characteristics of aluminum-doped zinc oxide (AZO) thin films in an adaptively coupled plasma (ACP) system. The dry etching characteristics of AZO films were studied by changing the Cl _2 /Ar gas mixing ratio, RF power, DC ...
Liting Zhang, Young-Hee Joo, Doo-Seung Um, Chang-Il Kim   +3 more
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Peculiarity of plasmachemical etching of silicon plate edges of photoelectric converters [PDF]

Tekhnologiya i Konstruirovanie v Elektronnoi Apparature, 2009
Results of technological researches of plasmachemical reactor (PCR) for etching of silicon plate edges of photo-electric converters are described. Dependences of silicon etching speed on a discharge current, magnetic field intensity, quantity of the ...
Fedorovich O. A., Kruglenko M. P., Polozov B. P.   +2 more
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Evolution of defect formation during atomically precise desulfurization of monolayer MoS2

Communications Materials, 2021
Desulfurization of MoS2 alters its chemical and physical properties by breaking structural symmetry. Here, the atomic-scale mechanistic pathway by which this occurs is investigated during plasma etching, and changes in chemical structure and physical ...
Jong-Young Lee, Jong Hun Kim, Yeonjoon Jung, June Chul Shin, Yangjin Lee, Kwanpyo Kim, Namwon Kim, Arend M. van der Zande, Jangyup Son, Gwan-Hyoung Lee   +9 more
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Reactive Ion Etching of X-Cut LiNbO₃ in an ICP/TCP System for the Fabrication of an Optical Ridge Waveguide

Applied Sciences, 2023
In this study, the technology for producing ridge waveguides with a minimal roughness of the sidewalls and material surface in a near-waveguide region was developed with the purpose of fabricating miniature photonic integrated circuits on a LiNbO3 ...
Andrei Kozlov, Dmitrii Moskalev, Uliana Salgaeva, Anna Bulatova, Victor Krishtop, Anatolii Volyntsev, Alexander Syuy   +6 more
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