Results 21 to 30 of about 22,802 (264)
This article presents a complete plasma etching process to etch high aspect ratio patterns on III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar cells with a through cell via contact architecture.
Mathieu de Lafontaine +11 more
doaj +1 more source
In this study, we have investigated the effects of SF6 plasma treatment on the isolation leakage current characteristics of AlGaN/GaN heterojunction field-effect transistors (HFETs).
Hyun-Seop Kim +3 more
doaj +1 more source
Geometry‐driven thermal behavior in wire‐arc additive manufacturing (WAAM) influences microstructural evolution during nonequilibrium solidification of a chemically complex Fe–Cr–Nb–W–Mo–C nanocomposite system. By comparing different deposits configurations, distinct entropy–cooling rate correlations, segregation, and carbide evolution are revealed ...
Blanca Palacios +5 more
wiley +1 more source
Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma
Cold atmospheric plasma has recently emerged as a simple, low-cost and efficient physical method for inducing significant biological responses in seeds and plants without the use of traditional, potentially environmentally-hazardous chemicals, fungicides
Xing-Quan Wang +5 more
doaj +1 more source
This study investigates the suitability of Piezoelectric Direct Discharge Plasma as a tool for wetting behaviour modification of PEEK and dentin, and compares the results of this method with low-pressure plasma treatment and phosphoric acid etching ...
Marius Behnecke +2 more
doaj +1 more source
Graphene nanoplatelet (0.1 wt.%) reinforcement significantly enhances the performance of β Ti‐28Nb‐35.4Zr alloy. Grain refinement, reduced water contact angle, and improved surface characteristics promote osteoblast adhesion and complete surface coverage after 7 days.
Khurram Munir +5 more
wiley +1 more source
Diode Circuit-based Glass Plasma-Chemical Etching Capabilities
The paper discusses technological capabilities to improve a plasma-chemical etching (PCE) rate of the silicate glasses through a chromium mask in the equipment with a planar inductor located outside, which forms a high-frequency diode system. Suggests a case when the inductor in the form of a planar spiral antenna is above the work-piece.The PCE ...
K. N. Bugorkov, H. R. Saghatelyan
openaire +1 more source
Numerical simulation of plasma etching process with AAO mask based on PIC/MCC model
This paper presents a Particle-in-Cell Monte Carlo Collision (PIC/MCC) numerical simulation to investigate plasma etching processes utilizing an anodic aluminum oxide (AAO) mask.
Zeping Li +4 more
doaj +1 more source
Effects of corona discharge plasma radiation on alfalfa seeds
Alfalfa seeds were directly treated with corona discharge plasma radiation and compared with the control group, which was covered by a Petri dish, blocking the etching effect of ionic wind and thus simulating the effect of a non-uniform electric field ...
XU Wenqian +5 more
doaj +1 more source
An Experimental High‐Throughput Approach for the Screening of Hard Magnet Materials
An entire workflow for the high‐throughput characterization and analysis of compositionally graded magnetic films is presented. Characterization protocols, data management tools and data analysis approaches are illustrated with test case Sm(Fe, V)12 based films.
William Rigaut +16 more
wiley +1 more source

