Results 51 to 60 of about 6,644,773 (301)

Robust Superhydrophobic Cotton Fibers Prepared by Simple Dip-Coating Approach Using Chemical and Plasma-Etching Pretreatments

, 2019
The preparation of superhydrophobic textiles with high mechanical and chemical durability is challenging. Here, facile and fluorine-free methods, using alkali and plasma-etching treatments, followed by the addition of silica nanoparticles and tetraethyl ...
Funda Altiparmak (6648119), Robert E. Prud’homme (1560679), Tuduri, L, Phuong Nguyen-Tri (6648116), Claudiane M. Ouellet-Plamondon (6648122), Altiparmak, Funda, Funda Altiparmak, Ludovic Tuduri, Nam Nguyen (508502), Ludovic Tuduri (2424607), Tuduri, Ludovic, Phuong Nguyen-Tri, Nguyen-Tri, P, Nguyen-Tri, Phuong, Altiparmak, F, Prud\u27Homme, Robert E., Prud'homme, RE, Nguyen, Nam, Nguyen, N, Ouellet-Plamondon, CM, Ouellet-Plamondon, Claudiane M., Nam Nguyen, Claudiane M. Ouellet-Plamondon, Robert E. Prud’homme   +23 more
core   +1 more source

Implementation plasma chemical etching in submicron technology wsi structure

Eastern-European Journal of Enterprise Technologies, 2015
При освоении диапазона суб– и наномикронных элементов интегральных схем возникает ряд проблем, которых либо вообще не было при разработке технологии изготовления с минимальными размерами элементов больше , или они не представлялись значительными.
openaire   +4 more sources

The influence of surface modification processes on the airtightness of copper sheet inserts

AIP Advances
This study addresses the demand for improving the airtightness of copper sheet inserts in new energy vehicles by conducting surface treatments on copper sheets before injection molding.
Yiming Wen, Fei Hai, Bin Xia, Mengfu Zhao, Zhitong Zhang, Lu Yu, Hao Dai, Yanzhao Qiu, Ghulam Hussain, Borhen Louhichi, Hongyan Wu   +10 more
doaj   +1 more source

Long-term oxygen plasma etching of UDMA:TEGDMA methacrylate resin: Etching rate and physical property changes

Polymer Testing
The effect of low-pressure oxygen plasma etching on the physical properties of a dental photopolymer, namely UDMA:TEGDMA in 3:1 wt ratio, was investigated.
Alexandra Borók, Melinda Szalóki, Dávid Gál, Miklós Veres, Attila Bonyár   +4 more
doaj   +1 more source

SF6 Optimized O2 Plasma Etching of Parylene C

Micromachines, 2018
Parylene C is a widely used polymer material in microfabrication because of its excellent properties such as chemical inertness, biocompatibility and flexibility.
Lingqian Zhang, Yaoping Liu, Zhihong Li, Wei Wang   +3 more
doaj   +1 more source

Dirac‐Source Linear X‐Ray Detection Diode

Advanced Functional Materials, EarlyView.
Monolayer graphene imparts near linear current‐voltage behavior to a perovskite X‐ray detection diode, contrasting with conventional diode‐like responses. Exploiting graphene's Dirac dispersion and a Schottky‐like back‐to‐back junction, the device achieves six‐orders‐of‐magnitude dark current suppression while retaining linearity over 200 V, enabling ...
Babar Shabbir, Shoaib Masood, Jialu Li, R. A. W. Ayyubi, Naeimeh Mozaffari, Mosarof Hossain, Nasir Mahmood, Muhammad Nadeem, Jacek J. Jasieniak   +8 more
wiley   +1 more source

Role of Plasma Surface Treatments on Wetting and Adhesion

, 2009
There are many current and emerging wetting and adhesion issues which require an additional surface processing to enhance interfacial surface properties.
Sparavigna, Amelia Carolina, Wolf R., Rory Wolf, Wolf, R., Amelia Carolina Sparavigna   +4 more
core   +1 more source

A systematic approach to process selection in MEMS [PDF]

, 2006
A systematic approach is developed to select manufacturing Process Chains for the generic elements of a MEMS device. A database of MEMS Process Chains and their attendant process attributes is developed from an extensive review of the literature, and ...
Quinn, D.J., Ashby, M.F., Fleck, N.A., Spearing, S.M.   +3 more
core   +1 more source

Dry Phosphorus silicate glass etching and surface conditioning and cleaning for multi-crystalline silicon solar cell processing

Solar Energy and Sustainable Development, 2014
As an alternative to the wet chemical etching method, dry chemical etching processes for Phosphorus silicate glass [PSG} layer rel11ova] using Trifluormethane/Sulfur Hexafluoride (CHF3/ SF6) gas mixture in commercial silicon-nitride plasma enhanced ...
Ahmed S. Kagilik
doaj  

Digital Etching of Molybdenum Interconnects Using Plasma Oxidation

Advanced Materials Interfaces
Molybdenum (Mo) has a high potential of becoming the material of choice for sub‐10 nm scale metal structures in future integrated circuits (ICs). Manufacturing at this scale requires exceptional precision and consistency, so many metal processing ...
Ivan Erofeev, Antony Winata Hartanto, Muhaimin Mareum Khan, Kerong Deng, Krishna Kumar, Zainul Aabdin, Weng Weei Tjiu, Mingsheng Zhang, Antoine Pacco, Harold Philipsen, Angshuman Ray Chowdhuri, Han Vinh Huynh, Frank Holsteyns, Utkur Mirsaidov   +13 more
doaj   +1 more source