Results 51 to 60 of about 22,802 (264)

Plasma and Gas‐based Semiconductor Technologies for 2D Materials with Computational Simulation & Electronic Applications

Advanced Electronic Materials
The technique of plasma processing is beneficial for wafer cleaning and precision etching of integrated circuits and essential in manufacture of advanced semiconductor devices with unmatched perfection. Research on two‐dimensional (2D) materials, such as
Changmin Kim, Muyoung Kim, Seongho Kim, Minji Kang, Min Sup Choi, Hyeong‐U Kim   +5 more
doaj   +1 more source

Combined D-optimal design and generalized regression neural network for modeling of plasma etching rate

International Journal of Metrology and Quality Engineering, 2014
Plasma etching process plays a critical role in semiconductor manufacturing. Because physical and chemical mechanisms involved in plasma etching are extremely complicated, models supporting process control are difficult to construct ...
You Hailong, Chen Yong, Liu Peng, Jia Xinzhang   +3 more
doaj   +1 more source

Memristor‐Driven Active‐Matrix Organic Light‐Emitting Diode for Energy Efficient and High‐Resolution Displays

Advanced Functional Materials, EarlyView.
This study demonstrates that memristors can replace conventional 2T–1C driving circuits with simplified 1T–1 m architectures by exploiting resistance switching. With ultra‐low switching voltages (< ±0.2 V) and multi‐level resistance states, the memristors precisely control the current injected into organic light‐emitting diodes (OLEDs).
Dong Hyun Kim, Nahyun Kim, Seok Hee Hong, Ho Jin Lee, Jin Suk Oh, Jae Seong Park, Tae Geun Kim   +6 more
wiley   +1 more source

Implementation plasma chemical etching in submicron technology wsi structure

Eastern-European Journal of Enterprise Technologies, 2015
With the development of a range of sub–micron devices elements inthralnyh large schemes, a number of problems, which either did not exist in the development of technology of integrated circuits with minimum dimensions of elements, or they did not identify significant.
openaire   +4 more sources

Influence of plasma-chemical etching on the surface structure of silicon wafers for photovoltaic converters

Технологія та конструювання в електронній апаратурі, 2006
The results of plasma-chemical etching (PCE) of the surface of photovoltaic converter (PVC) wafers, pre-structured by chemical etching, are presented. PCE was carried out in a plasma-chemical reactor using a mixture of sulfur hexafluoride (SF₆) and 10 ...
B. P. Polozov, O. A. Fedorovich, V. N. Golotyuk, A. A. Marinenko, D. V. Lukomsky   +4 more
doaj  

Transfer Printing and Reconfiguration of Soft Electronics Using Digital Microfluidics and Laser Machining

Advanced Functional Materials, EarlyView.
This paper presents a digital microfluidics‐based technique for transferring and reconfiguring soft nanomembranes. Laser‐machined nanothin membranes are picked up, transported, and aligned via tailored surface tension and the actuation of water droplets, enabling the development of flexible electronics, the integration of functional materials on 3D ...
Quang Anh Nguyen, Chi Cong Nguyen, Tran Bach Dang, Phuoc Thien Phan, Jordan Thorpe, Michael Listyawan, Nhat Minh Doan, Sinuo Zhao, Hongru Chen, Trung Thien Hoang, Mingsheng Xu, Jisheng Han, Thanh Nho Do, Adam Hill, Timothée Mouterde, Hoang‐Phuong Phan   +15 more
wiley   +1 more source

MXene Wrapped Magnetic Mesocrystals for Durable Redox Catalytic Cancer Therapy and Responsive MRI

Advanced Functional Materials, EarlyView.
Conformal wrapping of ultrathin Ti3C2Tx MXene nanosheets on Fe3O4 mesocrystals creates topology‐stabilized Schottky junctions that direct photoinduced electron transfer under NIR irradiation. The unique architecture sustains Fenton catalysis, promotes continuous hydroxyl radical production, and provides photo‐responsive MRI contrast.
Min Jun Ko, Seongchan Kim, Jun‐Hyeok Han, Sanghee Lee, Minji Ahn, Hong En Fu, Young Jun Jang, Yoo Sang Jeon, Weiguo Li, Young Keun Kim, Dong‐Hyun Kim   +10 more
wiley   +1 more source

Recent Progress of Black Silicon: From Fabrications to Applications

Nanomaterials, 2020
Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on.
Zheng Fan, Danfeng Cui, Zengxing Zhang, Zhou Zhao, Hongmei Chen, Yanyun Fan, Penglu Li, Zhidong Zhang, Chenyang Xue, Shubin Yan   +9 more
doaj   +1 more source

Vorticity‐Driven µ‐Platelet Rotation and Selective Packing for Vertical Thermal–Electrical Interconnects

Advanced Functional Materials, EarlyView.
We introduce a capillary‐filtering‐based particle‐filling (CFPF) process that simultaneously forms vertical thermal pathways and electrical vias within µ‐pores. In situ microfluidic analysis reveals that capillary‐driven velocity gradients generate vorticity that governs µ‐platelet rotation and vertical alignment.
Yujin Mun, Sang Gil Lee, Un‐seong Baik, Taeyoon Kwon, Jungyeon Kim, Joo Hwan Shin, Chanho Jeong, Jae‐seung Shim, Yeji Kim, Hyein Jung, Jin‐Tae Kim, Tae‐il Kim   +11 more
wiley   +1 more source

Oxidized MoS2‐Based Multifunctional Memristive Hardware for Energy‐Efficient mmWave Signal Processing and In‐Memory Matrix Multiplication

Advanced Functional Materials, EarlyView.
Thermally oxidized MoS2‐based radio‐frequency switches enable a multifunctional platform that unifies broadband RF switching and in‐memory computation. The device achieves a cutoff frequency of 33.2 THz with high energy efficiency and supports hardware‐aware signal processing.
Juho Son, Changwoo Pyo, Sungmoon Park, Yoongi Cho, Seungchan Lee, Myungsoo Kim   +5 more
wiley   +1 more source