Results 61 to 70 of about 22,849 (261)

Plasma and Gas‐based Semiconductor Technologies for 2D Materials with Computational Simulation & Electronic Applications

open access: yesAdvanced Electronic Materials
The technique of plasma processing is beneficial for wafer cleaning and precision etching of integrated circuits and essential in manufacture of advanced semiconductor devices with unmatched perfection. Research on two‐dimensional (2D) materials, such as
Changmin Kim   +5 more
doaj   +1 more source

Combined D-optimal design and generalized regression neural network for modeling of plasma etching rate

open access: yesInternational Journal of Metrology and Quality Engineering, 2014
Plasma etching process plays a critical role in semiconductor manufacturing. Because physical and chemical mechanisms involved in plasma etching are extremely complicated, models supporting process control are difficult to construct ...
You Hailong   +3 more
doaj   +1 more source

Multimode Oxide‐Based Optoelectronic Memtransistor for In‐Sensor Vision Processing

open access: yesAdvanced Functional Materials, EarlyView.
A multimode optoelectronic memtransistor (OEMT) is demonstrated for vision explainable artificial intelligence (VXAI) hardware. By integrating optical sensing, electrical masking, and non‐volatile memory, the device enables key operations required for generating saliency information.
Min Gu Lee   +10 more
wiley   +1 more source

Implementation plasma chemical etching in submicron technology wsi structure

open access: yesEastern-European Journal of Enterprise Technologies, 2015
При освоении диапазона суб– и наномикронных элементов интегральных схем возникает ряд проблем, которых либо вообще не было при разработке технологии изготовления с минимальными размерами элементов больше , или они не представлялись значительными.
openaire   +4 more sources

Influence of plasma-chemical etching on the surface structure of silicon wafers for photovoltaic converters

open access: yesТехнологія та конструювання в електронній апаратурі, 2006
The results of plasma-chemical etching (PCE) of the surface of photovoltaic converter (PVC) wafers, pre-structured by chemical etching, are presented. PCE was carried out in a plasma-chemical reactor using a mixture of sulfur hexafluoride (SF₆) and 10 ...
B. P. Polozov   +4 more
doaj  

Si‐Doped Nanocrystalline Diamond as Highly Sensitive Luminescence Thermometer for the Physiological Temperature Range

open access: yesAdvanced Functional Materials, EarlyView.
In this work, diamonds with negative charged silicon‐vacancy (SiV−) centers have been designed for use as thermometers in biomedical applications. Multiparametric analysis of the emission characteristics of the SiV− centers provides extraordinary sensitivity for temperature detection in the physiological temperature range.
María Gragera   +6 more
wiley   +1 more source

Silicone Phase Behavior Resolves the Softness–Surface Functionality Trade‐Off in Emerging Stretchable Electronics

open access: yesAdvanced Functional Materials, EarlyView.
Ultrasoft silicone elastomers often sacrifice surface functionality for mechanical compliance. In Mold Star, low‐molecular‐weight species form a dispersed phase that weakens the network and passivates the surface. Solvent extraction removes this phase, unexpectedly improving both extensibility and metallization performance, enabling conductive ...
Gloria M. D'Amaral   +7 more
wiley   +1 more source

Recent Progress of Black Silicon: From Fabrications to Applications

open access: yesNanomaterials, 2020
Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on.
Zheng Fan   +9 more
doaj   +1 more source

Polymer Substrates for Flexible Sensors: Advances and Contributions to Smart Agriculture

open access: yesAdvanced Functional Materials, EarlyView.
This review comprehensively summarizes recent advances in polymer‐based flexible sensors for smart agriculture, focusing on polymer substrate design, interface engineering, and applications in soil, plant, animal, aquaculture, and post‐harvest monitoring.
Yihui Li   +12 more
wiley   +1 more source

Simultaneous Enhancement of Performance and Stability in Dual‐Gate a‐IGZO Thin‐Film Transistors via Single‐Step Laser Annealing for Capacitor‐Less DRAM

open access: yesAdvanced Functional Materials, EarlyView.
A single‐step laser annealing strategy is presented for dual‐gate a‐IGZO TFTs. The steep thermal gradient induces graded oxygen doping in the channel and simultaneous WOx removal at the contacts, enabling concurrent interface and contact engineering.
Sihyeon Kwon   +9 more
wiley   +1 more source

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