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Pumping chlorinated gases in plasma etching
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1983Plasma etching of aluminum, aluminum alloys, and some other materials involves the use of chlorine-based gases which are particularly corrosive to vacuum systems if precautions are not taken. Emphasizing safety concerns, we will demonstrate the proper use of cold traps, activated charcoal sorbent, and/or inert synthetic fluids to lubricate forepumps ...
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Collective Scattering in Gases and Plasmas
1994Plasmas are made of small size charged particles, that behave according to the reciprocal Lorentz-Maxwell electrodynamics: From Lorentz forces, particles are accelerated by electromagnetic field; and in turn, charged particle acceleration creates new e.m. waves. These new e.m.
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Investigations of the Decaying Plasma of Electronegative Gases
Journal of Engineering Physics and Thermophysics, 2002The influence of different processes on the decay of a low‐pressure plasma containing negative ions is discussed. Experimental results and calculations modeling the decay of a multicomponent plasma are given. The problems of creation of ion‐ion sources are considered.
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Electronegative plasmas diluted by rare gases
Journal of Physics D: Applied Physics, 2003This paper considers the case where an electronegative gas is diluted by an electropositive one, as is typical in plasma processing applications, and examines the way in which the relevant parameters vary.The impact of dilution is examined over a wide range of pressures (3 mTorr cm–300 Torr cm) and a wide range of degrees of ionization (10−6–10−2), for
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CONTINUOUS SPECTRA OF ATOMIC GASES AND PLASMA
Soviet Physics Uspekhi, 1967L.M. Biberman, G.E. Norman
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