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On plasma nitriding of steels

Surface and Coatings Technology, 2000
Abstract With the aim of optimizing the nitriding process, experimental studies of the plasma nitriding of four selected steels were carried out, using a d.c. glow discharge. The process parameters were varied systematically. By means of transmission and scanning electron microscopy and X-ray diffraction, the microstructures, including the ...
Berg, M.   +6 more
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Implantation-plasma nitriding

Radiation Effects and Defects in Solids, 2001
Abstract Martensite steel 0.5Cr12Ni2MoMgMn and titanium alloy TiMo1Zr4.5Sn3 were nitrided by high intensity nitrogen plasma bombardment (current densities were 3·1016 cm−2s−1 and 1.2·1017cm−2s−1 for martensite steel and titanium alloy correspondingly).
M. I. Guseva   +5 more
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Plasma nitriding of Sm2Fe17

Journal of Alloys and Compounds, 1993
Abstract An intermetallic compound Sm 2 Fe 17 N x was synthesized by plasma nitriding of Sm 2 Fe 17 in a stream of N 2 H 2 mixed gas. The reaction proceeded at a lower temperature (around 423 K) than that of the conventional thermal technique, but not at room temperature.
Ken-ichi Machida   +2 more
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Plasma source nitriding

Applied Surface Science, 1988
Abstract A new method of surface nitriding, called “plasma source nitriding”, has been developed. This method is different from “ion nitriding” in the following respects: (1) the function of nitrogen- and hydrogen-ion bombardment of a workpiece is independent of the function of plasma production, (2) a homogeneity of nitriding depth is obtainable ...
M. Nunogaki   +3 more
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Plasma Nitridation of Hydrogenated Silicon Nitride Film

Japanese Journal of Applied Physics, 2012
In this study, chemical-vapor-deposited silicon nitride films were subjected to a novel nitridation process by use of self-biased nitrogen plasma. The film structure and electrical properties such as chemical bonding, surface morphology, dielectric strength, and the capacitance–voltage hysteresis of a metal–insulator–semiconductor device were ...
Chiung-Wei Lin   +2 more
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Formation of Aluminum Nitrides by Precipitate-Accommodated Plasma Nitriding

MRS Proceedings, 2007
AbstractPrecipitate accommodated nitriding is proposed as a new, non-traditional surface treatment of aluminum alloys. In the case of nitriding the aluminum-copper alloys, Al2Cu plays an important role as a nucleation site to form AlN by the two step reactions of Al2Cu + 2N → 2AlN + Cu and Cu + 2Al → Al2Cu and as a helper to preserve the fast nitrogen ...
Tatsuhiko Aizawa, Patama Vissutipitukul
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Plasma Nitriding Potential and a New Modeling Approach for Plasma Nitriding Process Control

Heat Treating Conference, 2015
Abstract Plasma nitriding is a thermochemical surface heat treatment of steel components to produce nitride layers which increase wear-, corrosion- and fatigue resistance. Research into plasma nitriding lately showed that there is a significant and characteristic amount of ammonia formed off the process gases nitrogen and hydrogen.
Marian Georg Skalecki   +5 more
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The Influence of Plasma Nitriding Period on Nitrided Layers Thickness

Solid State Phenomena, 2016
The plasma nitriding as a technology for finishing of material surface layers was carried out on selected material. The effect of plasma nitriding conditions on the thickness and hardness of nitrided layer was investigated. The influence of plasma nitriding period on the thickness of the plasma nitrided layers was comprehensively assessed on the C55 ...
Ondrej Pilch, Vojtěch Hruby
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Mechanism of germanium plasma nitridation

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2006
The mechanisms of plasma nitridation of germanium (Ge) and silicon (Si) substrates are discussed based on plasma characteristics and oxynitride film properties. Optical emission spectroscopy (OES) study and x-ray photoelectron spectroscopy were utilized to characterize the plasma and film properties, respectively. In this study, high pressure (1.8Torr)
Takuya Sugawara   +2 more
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Formation of aluminum nitride by intensified plasma ion nitriding

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1991
Ion nitriding of pure Al with an intensified glow discharge was attempted in the present work. The results showed that formation of aluminum nitride is feasible under low pressure, enhanced plasma conditions. The nitride formed had a dense structure and an ultrafine nuclei size (less than 100 Å).
E. I. Meletis, S. Yan
openaire   +1 more source

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