Results 251 to 260 of about 8,509 (311)

Electrochemical Behavior of Plasma-Nitrided Austenitic Stainless Steel in Chloride Solutions. [PDF]

open access: yesMaterials (Basel)
Zatkalíková V   +4 more
europepmc   +1 more source

Low-temperature plasma-assisted nitriding

Surface and Coatings Technology, 2000
Plasma-assisted nitriding is an attractive surface treatment for metallurgical surface modification to improve wear, hardness and fatigue resistance of ferrous and non-ferrous materials. For this purpose, ion nitriding by a d.c. glow discharge is generally efficient for numerous materials. However, for some metals and alloys, the processing temperature,
Thierry Czerwiec, Nathalie M Renevier
exaly   +2 more sources

Recent progress in plasma nitriding

Vacuum, 2000
Abstract The paper reports on a new system for plasma nitriding combined with a hollow cathode discharge sputtering at high pressures (about 1000 Pa), a new way of producing duplex coatings, and on a low-pressure (0.1–0.3 Pa) plasma nitriding using microwave discharges.
Jindrich Musil, Jaroslav Vlček
exaly   +2 more sources

Plasma source nitriding

Applied Surface Science, 1988
Abstract A new method of surface nitriding, called “plasma source nitriding”, has been developed. This method is different from “ion nitriding” in the following respects: (1) the function of nitrogen- and hydrogen-ion bombardment of a workpiece is independent of the function of plasma production, (2) a homogeneity of nitriding depth is obtainable ...
M. Nunogaki   +3 more
openaire   +1 more source

Implantation-plasma nitriding

Radiation Effects and Defects in Solids, 2001
Abstract Martensite steel 0.5Cr12Ni2MoMgMn and titanium alloy TiMo1Zr4.5Sn3 were nitrided by high intensity nitrogen plasma bombardment (current densities were 3·1016 cm−2s−1 and 1.2·1017cm−2s−1 for martensite steel and titanium alloy correspondingly).
M. I. Guseva   +5 more
openaire   +1 more source

Plasma Nitridation of Hydrogenated Silicon Nitride Film

Japanese Journal of Applied Physics, 2012
In this study, chemical-vapor-deposited silicon nitride films were subjected to a novel nitridation process by use of self-biased nitrogen plasma. The film structure and electrical properties such as chemical bonding, surface morphology, dielectric strength, and the capacitance–voltage hysteresis of a metal–insulator–semiconductor device were ...
Chiung-Wei Lin   +2 more
openaire   +1 more source

Decarburization during plasma nitriding

Surface and Coatings Technology, 1999
Abstract This work reports on the decarburization of steel surfaces nitrided in d.c. plasma discharges. Mass spectrometry was used to detect the presence of chemical species, such as C and CH 3 , in plasma atmospheres containing hydrogen, and CO 2 in those containing oxygen.
P. Egert   +3 more
openaire   +1 more source

Active Screen Plasma Nitriding

AM&P Technical Articles, 2013
Abstract Active screen plasma nitriding and nitrocarburizing are relatively new processes in which a plasma discharge is applied to a metal screen surrounding the workload, generating highly reactive gas species that flow to the component surface.
H.-J. Spies   +3 more
openaire   +1 more source

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