Results 11 to 20 of about 252,562 (307)
Optimization of CMP processing parameters for Si based on response surface method
Jin'gangshi yu moliao moju gongcheng, 2022 To improve the polishing efficiency and precision, the optimum processing parameters of Si in the chemical mechanical polishing (CMP) process were analysed by CMP experiments and response surface methodology.
Da BIAN +4 more
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Formalized Mathematics, 2015 Abstract This article is the first in a series formalizing some results in my joint work with Prof. Joanna Golinska-Pilarek ([12] and [13]) concerning a logic proposed by Prof. Andrzej Grzegorczyk ([14]). We present some mathematical folklore about representing formulas in “Polish notation”, that is, with operators of ...
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The surface structure of polishing pads for polishing using composite abrasives
Nihon Kikai Gakkai ronbunshu, 2016 Cerium oxide (CeO2) abrasives are generally used in the glass polishing because high removal rate and smooth glass surface can be obtained. However, CeO2 abrasives have problems with dispersion of slurry and cleaning from glass surface.
Naoaki ICHINOHO +3 more
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Study on electrochemical polishing of TC4 alloy
Materials Research Express, 2021 Using an environmentally friendly acid-alcohol system solution for electrochemical polishing of 3D printed titanium alloy, a typical U-I polarization curve was obtained, and explained the mechanism of electrochemical polishing.
Shan-Fei Wang +6 more
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Fabrication and Polishing Performance of Diamond Self-Sharpening Gel Polishing Disk
Micromachines, 2023 A diamond gel polishing disk with self-sharpening ability is proposed to solve the problem of glazing phenomenon in the gel polishing disks. Aluminum nitride (AlN) powder with silica sol film coating (A/S powder) is added to the polishing disk, and a ...
Lanxing Xu +3 more
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Analysis of material removal behavior and subsurface damage in linear polishing of silicon wafers with tangential vibration on rough surfaces [PDF]
AIP AdvancesThis research investigated the polishing treatment of silicon wafer rough surfaces using molecular dynamics simulations. The material removal behavior of tangential vibration polishing and linear polishing was analyzed in detail.
Shuilin Rao +5 more
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Additive Manufacturing Letters, 2023 Microstructural characterization has a key role in analyzing the properties of additive manufactured materials. Electron backscatter diffraction (EBSD) can offer a unique set of information on the microstructural state of these materials.
Erfan Maleki +5 more
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AISI 1045 Steel Flat Surfaces Machining Using the Magneto-Abrasive Method [PDF]
Журнал інженерних наук, 2020 The results of the study of using the end-type heads based on permanent magnets for polishing flat surfaces of ferromagnetic parts on standard metal-working equipment are presented in the work.
Maiboroda V. S. +3 more
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Material removal simulation for steel mould polishing [PDF]
, 2017 The surface finish of an injection mould influences the quality of the moulded polymer optic parts. In order to improve and control the surface finish of the mould it is important to be able to predict the material removal during the polishing process of
Almeida, Rui +4 more
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Roughness evolution of previously milled samples along a polishing test [PDF]
, 2016 In the present work results about roughness evolution along a polishing operation with corundum disks of size Norton 400 are presented. Hardened steel and hardened stainless steel samples were previously subjected to ball-end milling or side milling with
Buj Corral, Irene, Vivancos Calvet, Joan
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