The surface structure of polishing pads for polishing using composite abrasives
Nihon Kikai Gakkai ronbunshu, 2016 Cerium oxide (CeO2) abrasives are generally used in the glass polishing because high removal rate and smooth glass surface can be obtained. However, CeO2 abrasives have problems with dispersion of slurry and cleaning from glass surface.
Naoaki ICHINOHO +3 more
doaj +1 more source
Optimization of CMP processing parameters for Si based on response surface method
Jin'gangshi yu moliao moju gongcheng, 2022 To improve the polishing efficiency and precision, the optimum processing parameters of Si in the chemical mechanical polishing (CMP) process were analysed by CMP experiments and response surface methodology.
Da BIAN +4 more
doaj +1 more source
AISI 1045 Steel Flat Surfaces Machining Using the Magneto-Abrasive Method [PDF]
Журнал інженерних наук, 2020 The results of the study of using the end-type heads based on permanent magnets for polishing flat surfaces of ferromagnetic parts on standard metal-working equipment are presented in the work.
Maiboroda V. S. +3 more
doaj +1 more source
Study on electrochemical polishing of TC4 alloy
Materials Research Express, 2021 Using an environmentally friendly acid-alcohol system solution for electrochemical polishing of 3D printed titanium alloy, a typical U-I polarization curve was obtained, and explained the mechanism of electrochemical polishing.
Shan-Fei Wang +6 more
doaj +1 more source
Fabrication and Polishing Performance of Diamond Self-Sharpening Gel Polishing Disk
Micromachines, 2023 A diamond gel polishing disk with self-sharpening ability is proposed to solve the problem of glazing phenomenon in the gel polishing disks. Aluminum nitride (AlN) powder with silica sol film coating (A/S powder) is added to the polishing disk, and a ...
Lanxing Xu +3 more
doaj +1 more source
The application of Taguchi approach to optimise the processing conditions on bonnet polishing of CoCr [PDF]
, 2011 This paper applied the Taguchi approach to investigate the effects of each polishing parameter and obtain the optimal processing conditions for CoCr alloy polishing.
Blunt, Liam +4 more
core +1 more source
Corrective Abrasive Polishing Processes for Freeform Surface [PDF]
, 2009 Traditionally, abrasive finishing process only focused on producing excellent surface finish on regular form shapes. Ever increasing demands in freeform features in aerospace, energy and medicine applications require abrasive finishing technology not ...
Chen, Xun
core +1 more source
Analysis of material removal behavior and subsurface damage in linear polishing of silicon wafers with tangential vibration on rough surfaces [PDF]
AIP AdvancesThis research investigated the polishing treatment of silicon wafer rough surfaces using molecular dynamics simulations. The material removal behavior of tangential vibration polishing and linear polishing was analyzed in detail.
Shuilin Rao +5 more
doaj +1 more source
The Relationship between Polishing Method and ISE Effect
Crystals, 2023 The aim of the submitted work is to study the relationship between the method of polishing the metallurgical surface and the indentation size effect (ISE). The material of the sample was annealed 99.5% aluminum.
Jozef Petrík +6 more
doaj +1 more source
Advances in Mechanical Engineering, 2018 The optimum polishing traces are the double-circle polishing traces with zero-velocity deviation percentage ( V dp = 0%). In 1997, Buzzetti used the relatively high-cost programmable logic controller to control the polishing device having double-circle ...
Tzu-Hsia Chen
doaj +1 more source