Results 261 to 270 of about 4,019 (310)
Some of the next articles are maybe not open access.
Localized Deposition of Polysilicon for MEMS Post-Fabrication Processing
Micro-Electro-Mechanical Systems (MEMS), 1999Abstract In this paper, the localized deposition of polysilicon is demonstrated on suspended and attached microbeams. The microbeams are 1, 2 and 5μm wide; 0.5, 1.5 and 2μm thick; and 50 and 100 μm long. Polysilicon is deposited by thermal decomposition of silane gas on the electrically-heated structures.
Daphne Joachim, Liwei Lin
openaire +1 more source
Post-Processing of Cold-Spray Deposits of Copper and Iron
International Thermal Spray Conference, 2000Abstract Layers of high-purity copper and iron produced by cold gas-dynamic spraying have been thermally processed to induce recrystallization and grain growth. In the case of copper deposits, the as-sprayed structure could be "pinned" by arrays of Cu2O particles present on the surfaces of the feedstock powder, however copper powders of ...
R.C. McCune, R.P. Cooper, O.O. Popoola
openaire +1 more source
Post processing of the layer deposited by electric discharge coating
Materials and Manufacturing Processes, 2016ABSTRACTElectric discharge coating is a deposition process that can deposit thin and thick films using electric discharge machine. In the present experimental investigation, W–Cu powder metallurgical electrodes of 325 mesh size have been used as electrodes for the deposition process.
Eswara Krishna Mussada, P. K. Patowari
openaire +1 more source
The effects of post-deposition processes on polysilicon Young's modulus
Journal of Micromechanics and Microengineering, 1998Polysilicon films deposited by low pressure chemical deposition (LPCVD) are the most widely used structural material for microelectromechanical systems (MEMS). However, the properties of LPCVD polysilicon are known to vary significantly, depending on deposition conditions as well as post-deposition processes.
Sangwoo Lee +6 more
openaire +1 more source
Applied Surface Science, 2002
Abstract The surface roughness and topography of low-pressure chemical vapor deposited (LPCVD) silicon films have been investigated by atomic force microscopy (AFM) in the non-contact mode. Deposition parameters were varied and various post-deposition treatments tested.
R Edrei, E.N Shauly, Y Roizin, A Hoffman
openaire +1 more source
Abstract The surface roughness and topography of low-pressure chemical vapor deposited (LPCVD) silicon films have been investigated by atomic force microscopy (AFM) in the non-contact mode. Deposition parameters were varied and various post-deposition treatments tested.
R Edrei, E.N Shauly, Y Roizin, A Hoffman
openaire +1 more source
Deposition and post-processing of polycrystalline diamond for freestanding films and substrates
The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts., 2006Summary form only given. In this paper, we report on the synthesis of high quality diamond and the fabrication of optical quality windows and uniform thickness ion beam stripping foils. Both of these applications require the deposition of high quality diamond, the laser cutting of the diamond to a desired shape, the post processing of the diamond by ...
S. Zuo +4 more
openaire +1 more source
Effect of Post-Deposition Thermal Processing
2016The quality of surface passivation provided by Al\(_2\)O\(_3\) depends not only on the deposition conditions, but also on subsequent thermal processing. Indeed for Al\(_2\)O\(_3\) films deposited at lower temperatures, some thermal treatment is generally required to “activate” the passivation.
openaire +1 more source
Direct laser deposition within post process machining characterization
ICALEO 2009: 28th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing, 2009Industry applications of Direct Laser Deposition (DLD) technique grows from year to year. However, progress is limited by applications area, because most of the deposited layer still requires a post machining process (2-step). Machining can be done at the same laser workstation saving machining time. However, the laser optics are very sensitive to dust,
Konrad Bartkowiak, Paweł Twardowski
openaire +1 more source
1989
Since the recent discovery of materials that exhibit superconductivity above 90K, there has been much interest in the preparation of thin films and coatings of these materials for numerous electronic applications. To date, most of the effort in thin film preparation has centered on physical vapor deposition techniques.
J. Zhao +5 more
openaire +1 more source
Since the recent discovery of materials that exhibit superconductivity above 90K, there has been much interest in the preparation of thin films and coatings of these materials for numerous electronic applications. To date, most of the effort in thin film preparation has centered on physical vapor deposition techniques.
J. Zhao +5 more
openaire +1 more source
Post-deposition processing and oxygen content of TiO2-based capacitors
Microelectronic Engineering, 2011Properties of TiO"2-based capacitors with RuO"2 bottom electrode were examined. It is shown that post-deposition room temperature plasma treatment and oxygen annealing at 300^oC significantly reduces amount of impurities in the TiO"2 layer. Leakage current density of the capacitors is suppressed due to improvement of oxygen stoichiometry and increase ...
K. Fröhlich +7 more
openaire +1 more source