Results 1 to 10 of about 37,188 (295)

Pulsed laser vaporization and deposition

Reviews of Modern Physics, 2000
Photons have many advantages for vaporizing condensed systems, and laser vaporization sources have a flexibility not available with other methods. These sources are applied to making thin films in the well-known technique of pulsed laser deposition (PLD). The vaporized material may be further processed through a pulsed secondary gas, lending the source
P. R. Willmott, J. R. Huber
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Pulsed laser deposition of BaGa2O4

Applied Physics A, 2008
This paper reports the first results obtained on monobarium gallate thin films grown on silicon and platinum coated substrates by pulsed laser deposition. The influence of oxygen background pressure and substrate (or post-annealing) temperature on the film properties was studied.
M. Kodu, T. Avarmaa, H. Mändar, R. Jaaniso   +3 more
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Pulsed laser deposition of CdWO4

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1997
Abstract Pulsed laser depositions of CdWO4 thin films are carried out in the presence of O2 using targets of CdWO4(010) single crystals and pressed CdO and WO3 powder mixtures. CdWO4(002) peaks are observed on Si(111), CaF2(111), mica(001) and glass substrates by ablating CdWO4(010) single crystals.
Katsumi Tanaka, Natsuki Shirai, Iichiro Sugiyama, Rhohei Nakata   +3 more
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Pulsed-laser deposition of polytetrafluoroethylene

Journal of Materials Research, 1995
Thin films of polytetrafluoroethylene have been deposited on amorphous substrates by the pulsed-laser deposition technique. By transmission electron microscopy, the polymer films were shown to consist of both amorphous and crystalline components. The data for the crystalline component are consistent with it being highly ordered with the long helical ...
Wenbiao Jiang, M. Grant Norton, Lancy Tsung, J. Thomas Dickinson   +3 more
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Pulsed-laser deposition of selenium

Journal of Materials Science, 1995
The preparation and characterization of amorphous selenium thin films grown by pulsed-laser deposition (PLD) is presented. Two laser excitation regimes at 1064 and 532 nm were studied. Interesting relations between the surface quality and the different experimental parameters were found. High-purity thin films were produced with surface quality similar
M. Fernández-Guasti, E. Haro-Poniatowski, R. Diamant, L. Ponce, E. Jiménez   +4 more
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Pulsed Laser Deposition: An Overview

1999
We present the historical background and the main development trends of a very rapidly growing research field: pulsed laser deposition for obtaining high-quality thin films for use in science and technology. We emphasize the main physical phenomena involved, such as the role of the plasma in the deposition process, the relation between the irradiation ...
I. N. Mihailescu, E. György
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Pulsed-Laser Deposition

1994
Abstract This article presents a general description of pulsed-laser deposition. It describes the components of pulsed-laser deposition equipment. The article also discusses the effects of angular distribution of materials. Finally, the article reviews the characteristics of high-temperature superconductors and ferroelectric materials.
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Nonequilibrium Interlayer Transport in Pulsed Laser Deposition

Physical Review Letters, 2006
We use time-resolved surface x-ray diffraction measurements with microsecond range resolution to study the growth kinetics of pulsed laser deposited . Time-dependent surface coverages corresponding to single laser shots were determined directly from crystal truncation rod intensity transients. Analysis of surface coverage evolution shows that extremely
J Z, Tischler, Gyula, Eres, B C, Larson, Christopher M, Rouleau, P, Zschack, Douglas H, Lowndes   +5 more
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Pulsed laser deposition of nasicon thin films

Applied Surface Science, 1996
Abstract We have deposited NASICON (Na SuperIonicCONductor) films of thicknesses ranging from 100 to 600 nm, by Pulsed Laser Deposition (PLD), onSiO2Si substrates. The deposition rates varied from6 × 10−3 to 0.08 nm/pulse depending on the conditions employed. XPS measurements show that all elements are transferred from the target to the substrate and
R. Izquierdo, F. Hanus, Th. Lang, D. Ivanov, M. Meunier, L. Laude, J.F. Currie, A. Yelon   +7 more
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Process control and pulsed laser deposition of materials

Integrated Ferroelectrics, 2000
Abstract Pulsed-laser deposition (PLD) is a very powerful and rapid deposition technique, which can produce exceptional-quality thin films. Although PLD has tremendous versatility and potential, PLD capabilities are still constrained by a lack of process control. At the Air Force Research Laboratory on-site at Wright-Patterson AFB, we are developing in-
Biggers, R., Kozlowski, Gregory, Jones, J., Dempsey, D., Kleismit, R., Maartense, I., Busbee, J., Peterson, T., Perrin, R.   +8 more
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