Results 11 to 20 of about 391,384 (337)
Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns
Nanomaterials, 2019 A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of ...
Cheng Zhang +7 more
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Nanoscale Research Letters, 2017 Biocompatible-sensing materials hold an important role in biomedical applications where there is a need to translate biological responses into electrical signals. Increasing the biocompatibility of these sensing devices generally causes a reduction in the overall conductivity due to the processing techniques.
Sarah Hamza +2 more
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The Impact of Laser Irradiation on Thin ZrN Films Deposited by Pulsed DC Magnetron Sputtering
NanomaterialsTransition metal nitrides have extensive applications, including magnetic storage devices, hardware resistance coatings, and low-temperature fuel cells. This study investigated the structural, electrical, and mechanical properties of thin zirconium nitride (ZrN) films by examining the effects of laser irradiation times. Thin ZrN films were deposited on
Ameena Nazneen, Penghui Lei, Di Yun
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Journal of Asian Ceramic Societies, 2023 Owing to its wide bandgap (3.4 eV) and high electron mobility, GaN has attracted significant attention for applications in solar cells, power transistors, and high-electron-mobility transistors.
Seoung-Hyoun Kim +4 more
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Methane Sensitivity of Pulsed Laser Treated SnO2(Ag) Nanocomposite Layers
Доклады Белорусского государственного университета информатики и радиоэлектроники, 2023 This paper reports on the gas sensitivity of SnO2(Ag) layers, consequently formed by magnetron sputtering of Sn + Ag target, oxidation of Sn0.65Ag0.35 layers at the temperature of 650 °С within 30 min and modified by laser radiation pulses at energy ...
S. L. Prakopyeu, P. I. Gaiduk
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AIP Advances, 2023 Anisotropic Nd-Fe-B film magnets are applied to miniaturized electronic devices and MEMS (Micro Electro Mechanical Systems) devices have been prepared by the sputtering method. However, the thickness of each film is mainly less than 20 μm.
A. Yamashita +4 more
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Nonlinear Effects of Pulsed Ion Beam in Ultra-High Resolution Material Removal
Micromachines, 2022 Ion beam sputtering is widely utilized in the area of ultra-high precision fabrication, coating, and discovering the microworld. A pulsed ion beam (PIB) can achieve higher material removal resolution while maintaining traditional ion beam removal ...
Lingbo Xie +7 more
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Crystallization of TiO2 polymorphs from RF-sputtered, amorphous thin-film precursors
AIP Advances, 2020 Crystalline TiO2 films of anatase, brookite, and rutile are reproducibly made from amorphous precursors deposited by RF magnetron sputtering, producing large-area, single phase films of uniform thickness.
O. Agirseven +12 more
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Laser-Based Selective Removal of EMI Shielding Layers in System-in-Package (SiP) Modules. [PDF]
Micromachines (Basel)With the increasing complexity and integration density of System-in-Package (SiP) technologies, the demand for selective electromagnetic interference (EMI) shielding is growing.
Le XB, Choi WY, Han K, Choa SH.
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Results in Optics, 2023 BFO possess high remnant polarization (∼100 μC/cm2) and low direct band gap (∼2.7 eV) having potential for photovoltaic (PV) applications. In the present work, WO3 insulating layer is utilized with BFO and BFO/WO3 bilayer thin film structure is ...
Shiva Lamichhane +3 more
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