Results 21 to 30 of about 6,134 (297)
Integrated Ferroelectrics, 2003 Ferroelectric Na0.5K0.5NbO3 (NKN) thin films were grown on the Pt80Ir20 polycrystalline substrates by pulsed laser deposition (PLD) and radio frequency-magnetron sputtering (RF) technique using the same stoichiometric Na0.5K 0.5NbO3 ceramic target. X-ray
S I Khartsev +2 more
exaly +2 more sources
Comparison Of Aln Films Synthesized By Pulsed Laser Ablation And Magnetron Sputtering Techniques
MRS Proceedings, 1997 A comparative study is reported on the aluminum nitride (AIN) films on Si (111) substrate deposited by pulsed laser deposition and reactive magnetron sputtering.
A. K. Sharma +4 more
core +2 more sources
Journal of Asian Ceramic Societies, 2023 Owing to its wide bandgap (3.4 eV) and high electron mobility, GaN has attracted significant attention for applications in solar cells, power transistors, and high-electron-mobility transistors.
Seoung-Hyoun Kim +4 more
doaj +1 more source
Preparation of SrCo0.8Nb0.1Ta0.1O3-δ as a Cathode for Solid Oxide Fuel Cells by Pulsed Laser Deposition [PDF]
한국정밀공학회지, 2020 Recently, new perovskite cathode material, SrCo0.8Nb0.1Ta0.1O3-δ (SCNT) was reported, showing high oxygen reduction reaction (ORR) activity. This study demonstrates thin film deposition of SCNT by pulsed laser deposition technique applied to anodic ...
Sangbong Ryu +7 more
doaj +1 more source
Methane Sensitivity of Pulsed Laser Treated SnO2(Ag) Nanocomposite Layers
Доклады Белорусского государственного университета информатики и радиоэлектроники, 2023 This paper reports on the gas sensitivity of SnO2(Ag) layers, consequently formed by magnetron sputtering of Sn + Ag target, oxidation of Sn0.65Ag0.35 layers at the temperature of 650 °С within 30 min and modified by laser radiation pulses at energy ...
S. L. Prakopyeu, P. I. Gaiduk
doaj +1 more source
AIP Advances, 2023 Anisotropic Nd-Fe-B film magnets are applied to miniaturized electronic devices and MEMS (Micro Electro Mechanical Systems) devices have been prepared by the sputtering method. However, the thickness of each film is mainly less than 20 μm.
A. Yamashita +4 more
doaj +1 more source
Nonlinear Effects of Pulsed Ion Beam in Ultra-High Resolution Material Removal
Micromachines, 2022 Ion beam sputtering is widely utilized in the area of ultra-high precision fabrication, coating, and discovering the microworld. A pulsed ion beam (PIB) can achieve higher material removal resolution while maintaining traditional ion beam removal ...
Lingbo Xie +7 more
doaj +1 more source
Crystallization of TiO2 polymorphs from RF-sputtered, amorphous thin-film precursors
AIP Advances, 2020 Crystalline TiO2 films of anatase, brookite, and rutile are reproducibly made from amorphous precursors deposited by RF magnetron sputtering, producing large-area, single phase films of uniform thickness.
O. Agirseven +12 more
doaj +1 more source
Differences in Sb2Te3 growth by pulsed laser and sputter deposition
Acta Materialia, 2020 24 pages, 8 ...
Jing Ning +11 more
openaire +4 more sources
Results in Optics, 2023 BFO possess high remnant polarization (∼100 μC/cm2) and low direct band gap (∼2.7 eV) having potential for photovoltaic (PV) applications. In the present work, WO3 insulating layer is utilized with BFO and BFO/WO3 bilayer thin film structure is ...
Shiva Lamichhane +3 more
doaj +1 more source