Results 121 to 130 of about 807 (172)
Breaking the in-coupling efficiency limit in waveguide-based AR displays with polarization volume gratings. [PDF]
Light Sci ApplDing Y +7 more
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Computing shape parameter sensitivity of the reflected field by using RCWA
, 2007 Aa, van der, N.P., Mattheij, R.M.M.
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Isolation mounts scatterometry with RCWA and PML
Proceedings of SPIE, 2014In this paper, we examine the sensitivity of scatterometry for the 3D isolation mounts on the substrate by applying PML in RCWA. We analyze the reflectance from the silicon and resist single mount and the silicon double mounts on the silicon substrate. First, we investigate the beam width dependences of reflectance.
Hirokimi Shirasaki
exaly +2 more sources
Applications of RCWA on EUV mask optics
International Conference on Extreme Ultraviolet Lithography 2017, 2017The oblique illumination in EUVL system combined with relative thick absorber layer of EUV mask introduces many new challenges for mask simulation, like asymmetric phase deformation, shadowing effects , secondary scattering. Besides, these effects result in the ineffectiveness of the Hopkins approach and require new method for mask diffraction ...
Yayi Wei, Taian Fan
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Application RCWA for studying plasmon resonance under diffraction by metal gratings
2017 IEEE First Ukraine Conference on Electrical and Computer Engineering (UKRCON), 2017A results of numerical analysis RCWA diffraction by metal gratings under plasmon resonance are presented. Numerical experiments show low convergence of traditional RCWA for such types of the resonances of electromagnetic field. Modified RCWA for studying resonance diffraction phenomena on metal gratings was proposed.
Iryna Yaremchuk, V Fitio
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Phase calculation of diffraction grating based on RCWA
Holography, Diffractive Optics, and Applications XIII, 2023Shihao Kang
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Simulation of sub-wavelength 3D photomask induced polarization effect by RCWA
Proceedings of SPIE, 2012In 45nm technology node and beyond with hyper NA and Off-axis Illumination (OAI) lithography, mask induced polarization effect is remarkable. At this scale, traditional Kirchhoff approximation, in which the masks are considered to be infinitely thin objects, is no longer valid.
Liang Yang +3 more
exaly +2 more sources
Scatterometry simulator development with GPU, real-coded GA and RCWA
Proceedings of SPIE, 2013In this paper, we show the 2D and 3D scatterometry simulation software which has spectroscopy calculation and optimization algorithm systems. The scatterometry analysis for 3D-structure requires a lot of memory and along calculation time. The calculation is sped up by parallel computing using the GPU (Graphics Processor Unit).
Hirokimi Shirasaki
exaly +2 more sources
Oblique incidence scatterometry for 2D/3D isolation mounts with RCWA and PML
Proceedings of SPIE, 2016In this paper, we examine the sensitivity of scatterometry for the 2D and 3D isolation mounts on the substrate by applying the PML in the RCWA method. We analyze the reflectance from the silicon and resist single mount on the silicon substrates by changing the incident beam angles. First, we show the propagation properties of the electromagnetic fields
Hirokimi Shirasaki
exaly +2 more sources
RCWA acceleration for channel-hole structures with a neural network
Modeling Aspects in Optical Metrology IX, 2023Myungjun Lee +2 more
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