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Simulation of sub-wavelength 3D photomask induced polarization effect by RCWA

SPIE Proceedings, 2012
In 45nm technology node and beyond with hyper NA and Off-axis Illumination (OAI) lithography, mask induced polarization effect is remarkable. At this scale, traditional Kirchhoff approximation, in which the masks are considered to be infinitely thin objects, is no longer valid.
Liang Yang   +3 more
openaire   +1 more source

Modified RCWA method for studying the resonance diffraction phenomena on metal gratings

2017 IEEE 37th International Conference on Electronics and Nanotechnology (ELNANO), 2017
In this work, using the numerical analysis of the diffraction TM-polarized optical waves by metal gratings under resonance of the electromagnetic field was presented. Modified RCWA method has been proposed. Notably, Toeplitz matrices were modified in the system of differential equations.
Iryna Yaremchuk   +2 more
exaly   +2 more sources

Scatterometry simulator development with GPU, real-coded GA and RCWA

SPIE Proceedings, 2013
In this paper, we show the 2D and 3D scatterometry simulation software which has spectroscopy calculation and optimization algorithm systems. The scatterometry analysis for 3D-structure requires a lot of memory and along calculation time. The calculation is sped up by parallel computing using the GPU (Graphics Processor Unit).
openaire   +1 more source

Fisher-information-guided RCWA metrology with a dielectric binary nanograting

<p dir="ltr">We develop a full-wave Fisher-information framework for diffraction metrology in a dielec- tric binary nanograting using rigorous coupled-wave analysis (RCWA). The structure is a one- dimensional silicon-nitride grating on a silica substrate with two sub-bars per period, enabling simultaneous estimation of a common width perturbation,
openaire   +1 more source

No Title

2023
Myungjun Lee, Wookrae Kim
exaly  

Rigorous Coupled-Wave Analysis: RCWA

Kotaro Kajikawa, Takayuki Okamoto
openaire   +1 more source

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