Results 91 to 100 of about 156,728 (358)
Electronic cooling of a submicron-sized metallic beam [PDF]
, 2008 We demonstrate electronic cooling of a suspended AuPd island using superconductor-insulator-normal metal tunnel junctions. This was achieved by developing a simple fabrication method for reliably releasing narrow submicron sized metal beams.
A. O. Niskanen +8 more
core +2 more sources
, 2013 Motivated by the need for obtaining low reflectivity silicon surfaces, we report on (sub-) micro-texturing of silicon using a high throughput fabrication process involving SF6/O2 reactive ion etching at cryogenic temperatures, leading to Black Silicon ...
K. Nguyen +4 more
semanticscholar +1 more source
Advanced Functional Materials, EarlyView.This paper introduces a flexible neural probe with integrated micro‐OLEDs on a flexible substrate for the first time, featuring 8 micro‐OLEDs and recording electrodes for optogenetics. It uses advanced encapsulation and an IAI anode for durability, emitting 470 nm light for ChR2 activation, enabling high‐resolution, minimally invasive stimulation ...
Somin Lee +8 more
wiley +1 more source
Hyperthermal neutral beam etching [PDF]
, 1995 A pulsed beam of hyperthermal fluorine atoms with an average translational energy of 4.8 eV has been used to demonstrate anisotropic etching of Si.
Giapis, Konstantinos P. +2 more
core +1 more source
Electric Pulse Regulated MXene Based Nanozymes for Integrative Bioelectricity Immuno‐Cancer Therapy
Advanced Functional Materials, EarlyView.MXenzyme‐mediated bioelectricity cancer therapy (MXenzyme‐BECT) enhances cancer cell death through irreversible depolarization, ion channel disruption, ROS generation, and immunogenic cell death. Computational simulations reveal the electrical mechanisms by which MXenzyme acts on single cells and support to predict treatment parameters. Next‐generation
Sanghee Lee +6 more
wiley +1 more source
Crystal structure induced residue formation on 4H-SiC by reactive ion etching
AIP Advances, 2016 The (000 1 ¯ ) C face of 4H-SiC wafer was etched by reactive ion etching in SF6/O2 plasma. The effect of etching
Yi-hong Liu +5 more
doaj +1 more source
Dry etching of metallization [PDF]
The production dry etch processes are reviewed from the perspective of microelectronic fabrication applications. The major dry etch processes used in the fabrication of microelectronic devices can be divided into two categories - plasma processes in ...
Bollinger, D.
core +1 more source
Fabrication of Polymeric Multimode Waveguides for Application in the Local Area Network and Optical Interconnects. [PDF]
, 2000 We report the fabrication of multimode polymeric waveguides using spin coating, photolithography, and reactive ion etching. Different layer structures have been used, e.g., a UV curable resin is used as a core layer and PMMA as a lower and upper cladding.
Driessen, A. +4 more
core +1 more source
Advanced Functional Materials, EarlyView.By using (meso)porous N‐doped carbon nanospheres with tailored intraparticle porosity and constant particle size as conductive carbon in PVMPT‐based organic battery electrodes, the complete volume of the carbon is accessible for the immobilization of PVMPT, resulting in high accessible specific capacities while maintaining a good rate capability and ...
Niklas Ortlieb +6 more
wiley +1 more source
Journal of Materials Research and Technology, 2020 In this study, high-purity V2CTx MXene was successfully synthesized by etching V2AlC with fluoride and hydrochloric acid mixed solution using a hydrothermal-assisted method. This method is more concise and effective and has a low level of danger.
Libo Wang +5 more
doaj