Patterning of wave guides in LiNbO3 using ion beam etching and reactive ion beam etching [PDF]
, 2002 Danielle Hines, K. Williams
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Reactive Ion Beam Etching of GaN and AlGaN/GaN for Nanostructure Fabrication Using Methane-Based Gas Mixtures [PDF]
, 2002 Makoto Endo +3 more
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The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O2/He Plasmas for Thermopile Devices. [PDF]
Materials (Basel), 2020 Zhou N +13 more
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Reactive Ion Etching of Tantalum in CBrF3 Plasma.
, 1991 Akira Ozawa, M. Oda, Hideo Yoshihara
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Reactive ion etching of Si/SiO2 by CHF3/CH4/O2 gas mixture
, 1993 Usha Raghuram
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Reactive ion etching of an ovonic threshold switch (OTS) material using hydrogen-based plasmas for non-volatile phase change memories. [PDF]
RSC Adv, 2020 Kim DS +8 more
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High-aspect-ratio nanophotonic components fabricated by Cl2 reactive ion beam etching
, 1999 W. J. Zubrzycki +2 more
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Enhanced voltage-current characteristics of GaN nanowires treated by a selective reactive ion etching [PDF]
, 2006 Da-Bin Jeon +6 more
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Investigation of Deep Trench Process for Trench-gate IGBT
Kongzhi Yu Xinxi Jishu, 2013 Deep trench plasma etch process which is suitable for trench-gate IGBT has been developed based on Lam 4420 reactive ion etching (RIE) tool and Cl2. An undercut-free 6 μm-deep trench with round bottom corners and around 3°sidewall slope is obtained by ...
LUO Haihui +3 more
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