Results 91 to 100 of about 73,664 (313)
Electrically Tunable On‐Chip Topological Photonics with Integrated Carbon Nanotubes
This work demonstrates electrically tunable on‐chip topological THz devices by integrating 2D carbon nanotube (CNT) sheets with valley‐Hall photonic crystals, enabling broadband transmission modulation (71% modulation depth) and tunable narrowband filtering (0.54 GHz shift) through electrically induced thermal tuning. This advancement paves the way for
Jifan Yin +7 more
wiley +1 more source
Crystal structure induced residue formation on 4H-SiC by reactive ion etching
The (000 1 ¯ ) C face of 4H-SiC wafer was etched by reactive ion etching in SF6/O2 plasma. The effect of etching
Yi-hong Liu +5 more
doaj +1 more source
Dry etching of metallization [PDF]
The production dry etch processes are reviewed from the perspective of microelectronic fabrication applications. The major dry etch processes used in the fabrication of microelectronic devices can be divided into two categories - plasma processes in ...
Bollinger, D.
core +1 more source
This study explores the benefits of metasurfaces made from functional materials, highlighting their ability to be adapted and improved for various high‐frequency applications, including communications and sensing. It first demonstrates the potential of these functional material‐based metasurfaces to advance the field of sub‐THz perceptive networks ...
Yat‐Sing To +5 more
wiley +1 more source
Ice Lithography: Recent Progress Opens a New Frontier of Opportunities
This review focuses on recent advancements in ice lithography, including breakthroughs in compatible precursors and substrates, processes and applications, hardware, and digital methods. Moreover, it offers a roadmap to uncover innovation opportunities for ice lithography in fields such as biological, nanoengineering and microsystems, biophysics and ...
Bingdong Chang +9 more
wiley +1 more source
Free‐standing plasmonic gold‐based fractal antennas are fabricated by 3D nanoprinting, employing focused electron beam induced deposition and an optimized purification method to remove carbon while conserving structural fidelity. Simulation and experiment show broadband plasmonic activity, including customizable polarizability, thereby paving the way ...
Verena Reisecker +6 more
wiley +1 more source
The fabrication of semiconductor devices with three-dimensional architectures imposes unprecedented demands on advanced plasma dry etching processes. These include the simultaneous requirements of high throughput, high material selectivity, and precise ...
Shigeyuki Takagi +4 more
doaj +1 more source
InP nanocrystals on silicon for optoelectronic applications
One of the solutions enabling performance progress, which can overcome the downsizing limit in silicon technology, is the integration of different functional optoelectronic devices within a single chip. Silicon with its indirect band gap has poor optical
Helm, Manfred +10 more
core +1 more source
Peptide Sequencing With Single Acid Resolution Using a Sub‐Nanometer Diameter Pore
To sequence a single molecule of Aβ1−42–sodium dodecyl sulfate (SDS), the aggregate is forced through a sub‐nanopore 0.4 nm in diameter spanning a 4.0 nm thick membrane. The figure is a visual molecular dynamics (VMD) snapshot depicting the translocation of Aβ1−42–SDS through the pore; only the peptide, the SDS, the Na+ (yellow/green) and Cl− (cyan ...
Apurba Paul +8 more
wiley +1 more source
This work reveals a fundamental trade‐off between plasmonic and dielectric metasurfaces for molecular sensing. A clear performance crossover is identified: dielectric metasurfaces excel in air, while plasmonic metasurfaces dominate in lossy solvents. These results establish design rules for infrared metasurface sensors and enable optimized performance ...
Tao Jiang +8 more
wiley +1 more source

