Results 41 to 50 of about 73,664 (313)

Metal mask free dry-etching process for integrated optical devices applying highly photostabilized resist. [PDF]

, 2006
Photostabilization is a widely used post lithographic resist treatment process, which allows to harden the resist profile in order to maintain critical dimensions and to increase selectivity in subsequent process steps such as reactive ion etching.
Driessen, A., Sengo, G., Wolferen, H., Wörhoff, K.   +3 more
core   +1 more source

Bimetallic (NiFe) and Trimetallic (NiFeCr) Nanoalloys from Metal Oxides Using a Microwave Hydrogen Plasma

Advanced Engineering Materials, EarlyView.
Bimetallic (NiFe) and trimetallic (NiFeCr) nanoalloys (NAs) are synthesized using corresponding oxide mixtures using microwave hydrogen plasma within a few milliseconds. The process simultaneously 1) reduces metal oxides to metals; 2) downsizes the particles from micrometers to nanometers; and 3) blends the metals to form NAs.
Sachin Kumar, Mohammad Kazemi, Zichang Xiong, Thomas Cameron, Julian Held, Uwe Kortshagen   +5 more
wiley   +1 more source

Phosphorus oxide gate dielectric for black phosphorus field effect transistors

, 2018
The environmental stability of the layered semiconductor black phosphorus (bP) remains a challenge. Passivation of the bP surface with phosphorus oxide, POx, grown by a reactive ion etch with oxygen plasma is known to improve photoluminescence efficiency
Botton, G. A., Caporali, M., Dickerson, W., Fakih, I., Heun, S., Korinek, A., Peruzzini, M., Serrano-Ruiz, M., Szkopek, T., Tayari, V.   +9 more
core   +1 more source

Electronic cooling of a submicron-sized metallic beam [PDF]

, 2008
We demonstrate electronic cooling of a suspended AuPd island using superconductor-insulator-normal metal tunnel junctions. This was achieved by developing a simple fabrication method for reliably releasing narrow submicron sized metal beams.
A. O. Niskanen, J. P. Pekola, J. S. Tsai, J. T. Muhonen, L. Sainiemi, M. Meschke, S. Franssila, Watanabe T., Yu. A. Pashkin   +8 more
core   +2 more sources

Quantum Emitters in Hexagonal Boron Nitride: Principles, Engineering and Applications

Advanced Functional Materials, EarlyView.
Quantum emitters in hexagonal boron nitride have emerged as a promising candidate for quantum information science. This review examines the fundamentals of these quantum emitters, including their level structures, defect engineering, and their possible chemical structures.
Thi Ngoc Anh Mai, Md Shakhawath Hossain, Nhat Minh Nguyen, Yongliang Chen, Chaohao Chen, Xiaoxue Xu, Quang Thang Trinh, Toan Dinh, Toan Trong Tran   +8 more
wiley   +1 more source

Two-step Fabrication of Large Area SiO2/Si Membranes

Medžiagotyra, 2012
Two-step fabrication technique of SiO2/Si membrane combining the deep local etching of double side polished and thermally oxidized silicon <100> wafer in tetramethylammonium hydroxide (TMAH) water solution and SF6/O2 reactive ion etching is ...
Viktoras GRIGALIŪNAS, Brigita ABAKEVIČIENĖ, Ignas GRYBAS, Angelė GUDONYTĖ, Vitoldas KOPUSTINSKAS, Darius VIRŽONIS, Ramūnas NAUJOKAITIS, Sigitas TAMULEVIČIUS   +7 more
doaj   +1 more source

Cu‐Based MOF/TiO2 Composite Nanomaterials for Photocatalytic Hydrogen Generation and the Role of Copper

Advanced Functional Materials, EarlyView.
HKUST‐1/TiO2 composite materials show a very high photocatalytic hydrogen evolution rate which increases as a function of the irradiation time until reaching a plateau and even surpasses the performance of the 1%Pt/TiO2 material after three photocatalytic cycles.
Alisha Khan, Marie Le Pivert, Alireza Ranjbari, Diana Dragoe, Daniel Bahena‐Uribe, Christophe Colbeau‐Justin, Christian Herrero, Dorota Rutkowska‐Zbik, Johnny Deschamps, Hynd Remita   +9 more
wiley   +1 more source

Silicone engineered anisotropic lithography for ultrahigh-density OLEDs

Nature Communications, 2022
Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of OLEDs. Here, the authors report that silicone-incorporated organic light-emitting semiconductors can achieve anisotropic lithography
Hyukmin Kweon, Keun-Yeong Choi, Han Wool Park, Ryungyu Lee, Ukjin Jeong, Min Jung Kim, Hyunmin Hong, Borina Ha, Sein Lee, Jang-Yeon Kwon, Kwun-Bum Chung, Moon Sung Kang, Hojin Lee, Do Hwan Kim   +13 more
doaj   +1 more source

Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures [PDF]

, 2002
This paper presents guidelines for the deep reactive ion etching (DRIE) of silicon MEMS structures, employing SF/sub 6//O/sub 2/-based high-density plasmas at cryogenic temperatures.
Boer, Meint J. de, Elwenspoek, Miko, Gardeniers, J.G.E. (Han), Gilde, Melis-Jan, Jansen, Henri V., Roelofs, Gerard, Sasserath, Jay N.   +6 more
core   +2 more sources

Copper‐based Materials for Photo and Electrocatalytic Process: Advancing Renewable Energy and Environmental Applications

Advanced Functional Materials, EarlyView.
Cu‐based catalysts as a cornerstone in advancing sustainable energy technologies are fully reviewed in this manuscript, highlighting their potential in photo‐ and electrocatalysis. It includes metallic copper, copper oxides, copper sulfides, copper halide perovskites, copper‐based metal–organic frameworks (MOFs), and covalent organic frameworks (COFs),
Jéssica C. de Almeida, Yanjie Wang, Thais A. Rodrigues, Paulo H. H. Nunes, Vagner R. de Mendonça, Paulo H. E. Falsetti, Leticia V. Savazi, Tao He, Alexandra V. Bardakova, Aida V. Rudakova, Jie Tian, Alexei V. Emeline, Osmando F. Lopes, Antonio Otavio T. Patrocínio, Jia Hong Pan, Caue Ribeiro, Detlef W. Bahnemann   +16 more
wiley   +1 more source