Results 21 to 30 of about 71,691 (287)

Reactive Ion Etching Process of Micro Mechanical Pendulum

MATEC Web of Conferences, 2017
This paper describes the reactive ion etching (RIE) technique of micro mechanical pendulum chip. Micro mechanical pendulum chip processed by the RIE has excellent performances and surface of the chip is smoother than the chip by wet etching.
Zhang Wei, Duan Xiaoyan, Qiao Jin, Yue Ping   +3 more
doaj   +1 more source

Residual-free reactive ion etching of gold layers

AIP Advances, 2018
Metal contacts on semiconductors devices are normally defined by lift-off process, because no well-defined etch processes exist for some rare metals.
Gerhard Franz, Wolfhard Oberhausen, Ralf Meyer, Markus-Christian Amann   +3 more
doaj   +1 more source

Thermally assisted ion beam etching of polytetrafluoroethylene, a new technique for high aspect ratio etching of MEMS [PDF]

, 1996
In micromechanics, the etching of high aspect ratio structures in polymers is a prime technology. Normally, oxygen-based reactive ion etching or the LIGA technique are used to achieve this goal.
Berenschot, Erwin, Burger, Gert-Jan, Elwenspoek, Miko, Gardeniers, Han, Jansen, Henri   +4 more
core   +3 more sources

Double heterostructure lasers with facets formed by a hybrid wet and reactive-ion-etching technique [PDF]

, 1985
Double heterostructure lasers were fabricated in which one of the laser facets was produced by a hybrid wet and reactive-ion-etching technique. This technique is suitable for GaAs/GaAlAs heterostructure lasers and utilizes the selectivity of the plasma ...
Margalit, S., Salzman, J., Venkatesan, T., Yariv, A.   +3 more
core   +1 more source

Freestanding nanostructures via reactive ion beam angled etching

APL Photonics, 2017
Freestanding nanostructures play an important role in optical and mechanical devices for classical and quantum applications. Here, we use reactive ion beam angled etching to fabricate optical resonators in bulk ...
Haig A. Atikian, Pawel Latawiec, Michael J. Burek, Young-Ik Sohn, Srujan Meesala, Normand Gravel, Ammar B. Kouki, Marko Lončar   +7 more
doaj   +1 more source

A large-size and polarization-independent two dimensional grating fabricated by scanned reactive-ion-beam etching

Nanophotonics, 2022
Scanned reactive-ion-beam etching method was proposed to transfer two-dimensional mask patterns into quartz substrate, which would produce a larger-size and polarization-independent two-dimensional grating.
Zhang Wei, Li Wenhao, Zhang Tong, Zheng Zhongming, Chi Zhendong, Jiang Yanxiu, Wu Na   +6 more
doaj   +1 more source

Ga^+ beam lithography for nanoscale silicon reactive ion etching [PDF]

, 2010
By using a dry etch chemistry which relies on the highly preferential etching of silicon, over that of gallium (Ga), we show resist-free fabrication of precision, high aspect ratio nanostructures and microstructures in silicon using a focused ion beam ...
Chhim, B., Henry, M. D., Scherer, A., Shearn, M. J.   +3 more
core   +1 more source

Dry etching of monocrystalline silicon using a laser-induced reactive micro plasma

Applied Surface Science Advances, 2021
Dry etching is a prevalent technique for pattern transfer and material removal in microelectronics, optics and photonics due to its high precision material removal with low surface and subsurface damage.
Robert Heinke, Martin Ehrhardt, Pierre Lorenz, Klaus Zimmer   +3 more
doaj   +1 more source

Three-Dimensional Simulation of DRIE Process Based on the Narrow Band Level Set and Monte Carlo Method

Micromachines, 2018
A three-dimensional topography simulation of deep reactive ion etching (DRIE) is developed based on the narrow band level set method for surface evolution and Monte Carlo method for flux distribution.
Jia-Cheng Yu, Zai-Fa Zhou, Jia-Le Su, Chang-Feng Xia, Xin-Wei Zhang, Zong-Ze Wu, Qing-An Huang   +6 more
doaj   +1 more source

The preparation of V2CTx by facile hydrothermal-assisted etching processing and its performance in lithium-ion battery

Journal of Materials Research and Technology, 2020
In this study, high-purity V2CTx MXene was successfully synthesized by etching V2AlC with fluoride and hydrochloric acid mixed solution using a hydrothermal-assisted method. This method is more concise and effective and has a low level of danger.
Libo Wang, Darong Liu, Weiwei Lian, Qianku Hu, Xuqing Liu, Aiguo Zhou   +5 more
doaj   +1 more source