Results 31 to 40 of about 71,691 (287)
Hyperthermal neutral beam etching [PDF]
, 1995 A pulsed beam of hyperthermal fluorine atoms with an average translational energy of 4.8 eV has been used to demonstrate anisotropic etching of Si.
Giapis, Konstantinos P. +2 more
core +1 more source
Recent Progress of Black Silicon: From Fabrications to Applications
Nanomaterials, 2020 Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on.
Zheng Fan +9 more
doaj +1 more source
Design of experiment for the optimisation of deep reactive ion etching of silicon inserts for micro-fabrication [PDF]
, 2012 The following paper describes a design of experiments investigation of the deep reactive of pillar structures on a silicon wafer. The etched wafers would subsequently be used as masters for the fabrication of nickel mould inserts for microinjection ...
Alcock, Jeffrey R. +2 more
core +1 more source
The Influence of Etching Method on the Occurrence of Defect Levels in III-V and II-VI Materials
NanomaterialsThe influence of the etching method on the occurrence of defect levels in InAs/InAsSb type-II superlattice (T2SLs) and MCT photodiode is presented. For both analyzed detectors, the etching process was performed by two methods: wet chemical etching and ...
Kinga Majkowycz +5 more
doaj +1 more source
Nanostructuring lithium niobate substrates by focused ion beam milling
, 2005 We report on two novel ways for patterning Lithium Niobate (LN) at submicronic scale by means of focused ion beam (FIB) bombardment. The first method consists of direct FIB milling on LiNbO3 and the second one is a combination of FIB milling on a ...
A. Sabac +11 more
core +4 more sources
Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures [PDF]
, 2002 This paper presents guidelines for the deep reactive ion etching (DRIE) of silicon MEMS structures, employing SF/sub 6//O/sub 2/-based high-density plasmas at cryogenic temperatures.
Boer, Meint J. de +6 more
core +2 more sources
Advanced Engineering Materials, EarlyView.Powder metal processing provides scalable advantages in nanoporous (np) metal development. Mechanical alloying is used to produce unique precursors for hybrid nanopore formation by oxide reduction and dealloying. As demonstrated in np Ag, this approach improves process efficiency while promoting smaller ligaments and larger pores, both of which are ...
Mark A. Atwater, Oliver A. Fowler
wiley +1 more source
Tuning Metasurface Dimensions by Soft Nanoimprint Lithography and Reactive Ion Etching
Advanced Photonics Research, 2022 Metasurfaces are ultrathin and flat layers of subwavelength nanostructures composed of metallic or high‐refractive‐index materials. They can alter lightwave properties effectively and show significant application potential in various nanophotonic ...
Xinyi Cao +6 more
doaj +1 more source
Planar Solid‐State Nanopores Toward Scalable Nanofluidic Integration Based on CMOS Technology
Advanced Engineering Materials, EarlyView.We present a scalable silicon‐based fabrication strategy for planar solid‐state nanopores to enable their integration with complex nanofluidic systems. Prototype devices demonstrate normal voltage‐current characteristics, good noise performance, and appreciable streaming currents. Our CMOS‐compatible fabrication process offers precise geometric control
Ngan Hoang Pham +7 more
wiley +1 more source
Two-step Fabrication of Large Area SiO2/Si Membranes
Medžiagotyra, 2012 Two-step fabrication technique of SiO2/Si membrane combining the deep local etching of double side polished and thermally oxidized silicon <100> wafer in tetramethylammonium hydroxide (TMAH) water solution and SF6/O2 reactive ion etching is ...
Viktoras GRIGALIŪNAS +7 more
doaj +1 more source