Results 41 to 50 of about 71,691 (287)

Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology [PDF]

, 2016
The effect of treatment by reactive ion etching in an argon atmosphere, and hydrogen plasma etching in a glow discharge plasma on the surface of the diamond films was investigated.
Gaydaychuk, Alexander Valerievich, Linnik, Stepan Andreevich, Okhotnikov, Vitaly Vladimirovich   +2 more
core   +1 more source

Electrochemical Evaluation of Compressed Selective Laser Melted AlSi7Mg and AlSi10Mg Alloys in Chloride Environment

Advanced Engineering Materials, EarlyView.
The corrosion performance of AlSi7Mg and AlSi10Mg alloys produced through selective laser melting (SLM) was examined under compressive stress in a chloride environment. Electrochemical analyses, including open‐circuit potential (OCP), potentiodynamic polarization (CPP), and electrochemical impedance spectroscopy (EIS), were complemented by scanning ...
Femi John Akinfolarin, Samson Dare Oguntuyi, Peter Apata Olubambi   +2 more
wiley   +1 more source

High temperature reactive ion etching of iridium thin films with aluminum mask in CF4/O2/Ar plasma

AIP Advances, 2016
Reactive ion etching (RIE) technology for iridium with CF4/O2/Ar gas mixtures and aluminum mask at high temperatures up to 350 °C was developed. The influence of various process parameters such as gas mixing ratio and substrate temperature on the etch ...
Chia-Pin Yeh, Marco Lisker, Bodo Kalkofen, Edmund P. Burte   +3 more
doaj   +1 more source

Silicone engineered anisotropic lithography for ultrahigh-density OLEDs

Nature Communications, 2022
Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of OLEDs. Here, the authors report that silicone-incorporated organic light-emitting semiconductors can achieve anisotropic lithography
Hyukmin Kweon, Keun-Yeong Choi, Han Wool Park, Ryungyu Lee, Ukjin Jeong, Min Jung Kim, Hyunmin Hong, Borina Ha, Sein Lee, Jang-Yeon Kwon, Kwun-Bum Chung, Moon Sung Kang, Hojin Lee, Do Hwan Kim   +13 more
doaj   +1 more source

The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control [PDF]

, 1994
Very deep trenches (up to 200 µm) with high aspect ratios (up to 10) in silicon and polymers are etched using a fluorine-based plasma (SF6/O2/CHF3). Isotropic, positively and negatively (i.e.
de Boer, Meint J., Elwenspoek, Michael Curt, Jansen, Henricus V., Legtenberg, R., Legtenberg, Rob   +4 more
core   +4 more sources

Tailored Hierarchical Porous Copper Architectures via Three Dimensional Printing and Pressure‐less Sintering for Next‐Generation Lithium‐Metal Batteries

Advanced Engineering Materials, EarlyView.
A hierarchical porous copper current collector is fabricated via three‐dimensional printing combined with pressureless sintering to stabilize lithium metal anodes. The interconnected architecture lowers local current density, guides uniform Li deposition within pores, and suppresses dendrite growth.
Alok Kumar Mishra, Mukul Shukla
wiley   +1 more source

Atomic Depth Image Transfer of Large-Area Optical Quartz Materials Based on Pulsed Ion Beam

Micromachines
The high-efficiency preparation of large-area microstructures of optical materials and precision graphic etching technology is one of the most important application directions in the atomic and near-atomic-scale manufacturing industry.
Shuyang Ran, Kefan Wen, Lingbo Xie, Xingyu Zhou, Ye Tian, Shuo Qiao, Feng Shi, Xing Peng   +7 more
doaj   +1 more source

Metal mask free dry-etching process for integrated optical devices applying highly photostabilized resist. [PDF]

, 2006
Photostabilization is a widely used post lithographic resist treatment process, which allows to harden the resist profile in order to maintain critical dimensions and to increase selectivity in subsequent process steps such as reactive ion etching.
Driessen, A., Sengo, G., Wolferen, H., Wörhoff, K.   +3 more
core   +1 more source

Fabrication of photonic band-gap crystals [PDF]

, 1995
We describe the fabrication of three-dimensional photonic crystals using a reproducible and reliable procedure consisting of electron beam lithography followed by a sequence of dry etching steps.
Cheng, C. C., Scherer, A.
core   +1 more source

Near‐Field Electrospinning Micro‐Printhead Achieves Precise Control of Nanofiber Deposition

Advanced Engineering Materials, EarlyView.
A micro‐printhead for near‐field electrospinning enables reproducible deposition of polymer nanofibers with diameters below 50 nm. Systematic parameter studies uncover the mechanisms linking operating conditions to fiber morphology, paving the way for precise and low‐cost nanoscale 3D manufacturing.As a high‐resolution, cost‐effective, and rapid ...
Han Xu, Dario Mager, Jan G. Korvink
wiley   +1 more source