Results 11 to 20 of about 71,691 (287)

Stochastic antireflection structures on silicon fabricated by reactive ion etching [PDF]

EPJ Web of Conferences, 2023
Stochastic Si nanostructures for antireflection (AR) fabricated by reactive ion etching (RIE) are presented for use in different spectral ranges. The lithography-free fabrication enables its application on highly curved surfaces. ALD-coatings of Al2O3 of
Schmelz David, Käsebier Thomas, Zeitner Uwe   +2 more
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Use of Laser Interferometry to Determine the End Time of the Plasma-Chemical Etching of p-GaN and AlGaN Layers of the p-GaN/AlGaN/GaN Heterostructure with Two-Dimensional Electron Gas

Доклады Белорусского государственного университета информатики и радиоэлектроники, 2022
Regularities of the reflected signal intensity changing in time, recorded by the detector of the laser interferometer with the operating frequency of 670 nm during the inductively coupled plasma reactive ion etching in a Cl2/N2/O2 atmosphere of GaN, p ...
A. D. Yunik, A. H. Shydlouski
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Advanced Etching Techniques of LiNbO₃ Nanodevices

Nanomaterials, 2023
Single LiNbO3 (LNO) crystals are widely utilized in surface acoustic wave devices, optoelectronic devices, and novel ferroelectric memory devices due to their remarkable electro-optic and piezoelectric properties, and high saturation and remnant ...
Bowen Shen, Di Hu, Cuihua Dai, Xiaoyang Yu, Xiaojun Tan, Jie Sun, Jun Jiang, Anquan Jiang   +7 more
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Exploring Strategies to Contact 3D Nano-Pillars

Nanomaterials, 2020
This contribution explores different strategies to electrically contact vertical pillars with diameters less than 100 nm. Two process strategies have been defined, the first based on Atomic Force Microscope (AFM) indentation and the second based on ...
Esteve Amat, Alberto del Moral, Marta Fernández-Regúlez, Laura Evangelio, Matteo Lorenzoni, Ahmed Gharbi, Guido Rademaker, Marie-Line Pourteau, Raluca Tiron, Joan Bausells, Francesc Perez-Murano   +10 more
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Optimization of etching processes for the fabrication of smooth silicon carbide membranes for applications in quantum technology

Micro and Nano Engineering, 2022
Recently, it has been demonstrated that Silicon Carbide (SiC) membranes can be used in quantum sensing and MEMS applications. One of the important steps for the production of such membranes is the removal of the substrate material in order to form ...
Mahsa Mokhtarzadeh, Maria Carulla, Roksolana Kozak, Christian David   +3 more
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Effect of Plasma Etching Depth on Subsurface Defects in Quartz Crystal Elements

Crystals, 2023
After the plasma etching of quartz crystal, the crystal lattice underwent changes in response to the length of plasma etching time. The lattice arrangement of quartz crystal was the most orderly after plasma etching for 1000 nm, and with the increase in ...
Qingzhi Li, Yubin Zhang, Zhaohua Shi, Weihua Li, Xin Ye   +4 more
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Low-temperature smoothing method of scalloped DRIE trench by post-dry etching process based on SF6 plasma

Micro and Nano Systems Letters, 2020
Deep reactive-ion etching (DRIE) is commonly used for high aspect ratio silicon micromachining. However, scalloping, which is the result of the alternating Bosch process of DRIE, can cause many problems in the subsequent process and degrade device ...
Jin Soo Park, Dong-Hyun Kang, Seung Min Kwak, Tae Song Kim, Jung Ho Park, Tae Geun Kim, Seung-Hyub Baek, Byung Chul Lee   +7 more
doaj   +1 more source

Figuring of optical aluminium devices by reactive ion beam etching [PDF]

EPJ Web of Conferences, 2019
Ion beam figuring (IBF) is an established method in high-end surface manufacturing. However, the direct processing of desired materials as standard Al alloys (e.g.
Bauer Jens, Ulitschka Melanie, Frost Frank, Arnold Thomas   +3 more
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Plasma removal of Parylene C [PDF]

, 2008
Parylene C, an emerging material in microelectromechanical systems, is of particular interest in biomedical and lab-on-a-chip applications where stable, chemically inert surfaces are desired.
Li, Po-Ying, Meng, Ellis, Tai, Yu-Chong
core   +1 more source

Reactive ion beam etching – based finishing of optical aluminium surfaces [PDF]

EPJ Web of Conferences, 2019
Reactively driven low-energy ion beam machining is a widely used finishing technique for optical aluminium surfaces. Direct RIBE machining with oxygen or nitrogen process gas permits figure error correction of diversely shaped aluminium optics while ...
Ulitschka Melanie, Bauer Jens, Frost Frank, Arnold Thomas   +3 more
doaj   +1 more source