Results 61 to 70 of about 106,837 (225)

Etching technique of high aspect ratio silicon trenches based on CMOS-MEMS process

Dianzi Jishu Yingyong, 2018
Etching technique of deep silicon trenches with high aspect ratio is critical in improving integration and accuracy of Micro-Electro-Mechanical Systems(MEMS)sensor array and reducing the cost of it.
Zhang Haihua, Lv Yufei, Lu Zhongxuan
doaj   +1 more source

Single-Step CMOS Compatible Fabrication of High Aspect Ratio Microchannels Embedded in Silicon

Proceedings, 2017
This paper presents a new method for the CMOS compatible fabrication of microchannels integrated into a silicon substrate. In a single-step DRIE process (Deep Reactive Ion Etching) a network of microchannels with High Aspect Ratio (HAR) up to 10, can be ...
Marta Kluba, Aslihan Arslan, Ronald Stoute, James Muganda, Ronald Dekker   +4 more
doaj   +1 more source

End-point determination of aluminum reactive ion etching by discharge impedance monitoring [PDF]

, 1979
Katsumi Ukai, Kunio Hanazawa
openalex   +1 more source

Response to ‘‘Comment on ‘Low-temperature reactive ion etching and microwave plasma etching of silicon’ ’’ [Appl. Phys. Lett. 5 3, 1665 (1988)] [PDF]

, 1988
S. Tachi, Kazunori Tsujimoto, Sadayuki Okudaira   +2 more
openalex   +1 more source

Comment on ‘‘Low-temperature reactive ion etching and microwave plasma etching of silicon’’ [Appl. Phys. Lett. 5 2, 616 (1988)] [PDF]

, 1988
Jacques Pelletier
openalex   +1 more source

The Fabrication of THz Emitting Mesas by Reactive Ion-Beam Etching of Superconducting Bi2212 with Multilayer Masks

, 2011
Generation of powerful THz radiation from intrinsic Josephson Junctions (IJJs) of Bi2Sr2CaCu2O8+δ (Bi2212) may require mesas with large lateral dimensions. However, there are difficulties in fabrication of perfect rectangular mesas. The lateral angles of
H. Koseoglu, F. Turkoglu, Y. Simsek, L. Ozyuzer   +3 more
semanticscholar   +1 more source

UV-Nanoimprint and Deep Reactive Ion Etching of High Efficiency Silicon Metalenses: High Throughput at Low Cost with Excellent Resolution and Repeatability. [PDF]

Nanomaterials (Basel), 2023
Dirdal CA, Milenko K, Summanwar A, Dullo FT, Thrane PCV, Rasoga O, Avram AM, Dinescu A, Baracu AM.   +8 more
europepmc   +1 more source

Effects of reactive ion etching on chemical vapor deposition [PDF]

, 1987
C. Y. Wong, Philip E. Batson
openalex   +1 more source

Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF₄/H₂ Plasma Reactive-Ion Etching. [PDF]

ACS Omega, 2022
Ghezzi F, Pedroni M, Kovač J, Causa F, Cremona A, Anderle M, Caniello R, Pietralunga SM, Vassallo E.   +8 more
europepmc   +1 more source

Gallium arsenide and aluminum gallium arsenide reactive ion etching in boron trichloride/argon mixtures [PDF]

, 1987
Axel Scherer, H. G. Craighead, E. D. Beebe   +2 more
openalex   +1 more source