Results 221 to 230 of about 87,899,976 (281)
Emerging roles of ATR beyond DNA damage repair: orchestrating transcriptional reprogramming during epithelial-to-mesenchymal transition. [PDF]
Mestre-Farrera A, Hu Z, Yang J.
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Targeting Oxidative Stress in Insulin-Resistant Postmenopausal Women: Effects of Resveratrol and Vitamin C on Oxidative Damage and Antioxidant Defenses in a Randomized Clinical Trial. [PDF]
Reyes-Muñoz E +9 more
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Resisting attack by repairing the damage
Science, 2022Removing membrane pores may help cancer cells survive T cell ...
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Resistance of normal endothelium to damage by thrombin
British Journal of Haematology, 1982We examined the effect of locally infused thrombin on rabbit neck veins, using autologous [111In]indium‐labelled platelets as a marker of platelet deposition. Purified thrombin at concentrations which clotted the blood in isolated veins did not lead to the deposition of labelled platelets on the vessel wall.
D P, Thomas +3 more
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Damage-resistant DNA synthesis in Eukaryotes
Mutation Research/DNA Repair Reports, 1988The molecular basis of sensitivity of ionizing radiation and other damaging agents is not clearly defined in eukaryotes. While a large number of mutants have been described only a few have been demonstrated to have a defect in the repair of damage to DNA.
Lavin, Martin F., Schroeder, Alice L.
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Damage-Resistant Brittle Coatings
Advanced Engineering Materials, 2000Laminate structures consisting of hard, brittle coatings andsoft, tough substrates are important in a wide variety of engi-neering applications (cutting tools, electronic multilayers, la-minated windscreens), biological structures (teeth and dentalcrowns, shells, bones), and traditional pottery (ceramicglazes).
Lawn, BR +7 more
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Damage-resistant LiNbO3 waveguides
Journal of Applied Physics, 1984The photorefractive effect (‘‘optical damage’’) severely limits the application of LiNbO3 in visible wavelengths. We have found that proton exchanged LiNbO3, in which up to 70% of the Li ions are replaced by protons, exhibit no measurable index change with average intensities of visible light up to 5 kW/cm2 or peak pulse intensities of ∼5×108 W/cm2 in ...
J. Jackel +5 more
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Plasma damage and contact resistance
1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105), 2002The die size has been shrunk dramatically in the past few years and the requirements for transistor performance have also increased. Therefore, the silicon substrate damage during the plasma etch has become an important issue in current ULSI fabrication.
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