Results 131 to 140 of about 22,919 (266)

Mass-Produced and High-Performance Nanowell Biosensor Fabricated via Semiconductor Manufacturing for Rapid and Accurate COVID-19 Diagnosis in the Clinical Field. [PDF]

Adv Sci (Weinh)
Park YM, Rezaei Z, Bae NH, Rho D, Kim DS, Go E, Seo Y, Lee SJ, Seo WC, Lee LP, Lee H, Shin SR.   +11 more
europepmc   +1 more source

Tunable‐Threshold UV Dosimetry With Programmable Luminescent Tags via Oxygen‐Mediated Room‐Temperature Phosphorescence

Advanced Materials Technologies, EarlyView.
A fully organic UV threshold dosimeter is developed by exploiting the oxygen‐sensitive room‐temperature phosphorescence of a purely organic emitter in a polymer matrix. Upon reaching a specific cumulative UV dose, photochemical oxygen depletion triggers a sharp, high‐contrast emission.
Tim Achenbach, Paul‐Anton Will, Karl Sebastian Schellhammer, Sebastian Reineke   +3 more
wiley   +1 more source

Semiconductor manufacturing wastewater challenges and the potential solutions via printed electronics. [PDF]

iScience
Sandhu S, Zumeit A, Tian Z, Vinciguerra V, Dahiya R.   +4 more
europepmc   +1 more source

Shaping Carbon Nitrides for Advanced Macrostructures

Advanced Materials Technologies, EarlyView.
This review examines how carbon nitride can be shaped through a range of printing and interfacial assembly methods. By bringing together additive manufacturing and liquid–liquid structuring concepts, carbon nitride is moving beyond its traditional powder‐based photocatalyst form toward digitally designed robust macroscale architectures with high design
Simona Baluchová, Baris Kumru
wiley   +1 more source

Practical Guidance on Selecting Analytical Methods for PFAS in Semiconductor Manufacturing Wastewater. [PDF]

ACS Meas Sci Au
Droz B, Heron CG, Kim-Fu ML, Reardon PN, Roig-Paul M, Field JA.   +5 more
europepmc   +1 more source

Controlling Film Formation in Inkjet‐printed MAPbBr3 Through Graphene Incorporation for Enhanced Photodetection

Advanced Materials Technologies, EarlyView.
This work highlights the impact of incorporating graphene nanoflakes into precursor inks of MAPbBr3 for inkjet‐printed optoelectronic device applications. A substantial modification of the crystallization dynamics is reported despite miniscule concentrations.
Kenneth Lobo, Javier Bartolomé, María Vila, Giovanni Vescio, Raúl I. Sánchez‐Alarcón, Junaid Khan, Júlia Marí Guaita, Francisco Palacio Bonet, Juan P. Martínez‐Pastor, Sergi Hernández, Blas Garrido, Carmen Coya, Albert Cirera   +12 more
wiley   +1 more source

Retraction of "N₂/H₂ Plasma-Enhanced Atomic Layer Deposition for SiO₂ Gap Filling: Implications for Nanoelectronics in Semiconductor Manufacturing". [PDF]

ACS Appl Nano Mater
Okasha S, Munson D, Yoshikawa J.
europepmc   +1 more source

Flexible Pressure Sensor With Co‐Optimized Sensitivity and Linearity Based on Gradient Toroidal Microstructures

Advanced Materials Technologies, EarlyView.
A flexible piezoresistive pressure sensor with gradient toroidal CNT/PDMS microstructures is reported. The hierarchical geometry enables sequential electrode contact, achieving a sensitivity of 256.20 kPa−1 and linear response (R2 = 0.99) over 0–1000 kPa.
Rongmei Wang, Ruolin Liu, Ming Lei, Yifan Liu, Fengming Hu, Bing Ji, Chao Peng, Jianyi Luo, Bingpu Zhou   +8 more
wiley   +1 more source

12-Spin-Qubit Arrays Fabricated on a 300 mm Semiconductor Manufacturing Line. [PDF]

Nano Lett
George HC, Mądzik MT, Henry EM, Wagner AJ, Islam MM, Borjans F, Connors EJ, Corrigan J, Curry M, Harper MK, Keith D, Lampert L, Luthi F, Mohiyaddin FA, Murcia S, Nair R, Nahm R, Nethwewala A, Neyens S, Patra B, Raharjo RD, Rogan C, Savytskyy R, Watson TF, Ziegler J, Zietz OK, Pellerano S, Pillarisetty R, Bishop NC, Bojarski SA, Roberts J, Clarke JS.   +31 more
europepmc   +1 more source

Photolithographic Patterning of Colloidal Quantum Dots Enabled by Plasma‐Induced Ligand Polymerization

Advanced Materials Technologies, EarlyView.
Plasma‐induced ligand polymerization on colloidal quantum dots (QDs) renders them resistant to organic solvents, enabling conventional photoresist‐based photolithography. This approach achieves microscale patterning with feature sizes down to 3 µm, preserving the optical properties of the QDs and offering a simple and scalable route for QD‐based ...
Boram Kim, Jaehyeon Kim, Heeyeop Chae
wiley   +1 more source