Results 141 to 150 of about 22,919 (266)

Study on Data Preprocessing for Machine Learning Based on Semiconductor Manufacturing Processes. [PDF]

Sensors (Basel)
Park HJ, Koo YS, Yang HY, Han YS, Nam CS.   +4 more
europepmc   +1 more source

The Evolution of Aerosol Jet Printing, A Review: Enhancing Material Versatility and Improvements for Next‐Generation Applications

Advanced Materials Technologies, EarlyView.
Aerosol Jet Printing (AJP) has emerged as a versatile additive manufacturing technique for high‐resolution, conformal, and multi‐material printing. This review highlights advances in printable materials, substrate compatibility, post‐processing, characterization, and process innovations, while critically discussing current challenges and future ...
Chandrachur Chatterjee, Rocco Lupoi, Michael J. Gibbons   +2 more
wiley   +1 more source

Advances in core technologies for semiconductor manufacturing: applications and challenges of atomic layer etching, neutral beam etching and atomic layer deposition. [PDF]

Nanoscale Adv
Lee TY, Chen PT, Huang CC, Chen HC, Chen LY, Lee PT, Chen FC, Horng RH, Kuo HC.   +8 more
europepmc   +1 more source

High‐Performance Piezoelectric Nanogenerators Based on Wurtzite BeO Nanowire Arrays

Advanced Materials Technologies, EarlyView.
This study demonstrates high‐performance piezoelectric nanogenerators based on 1D BeO nanowire arrays. The BeO nanowires exhibit a high piezoelectric coefficient (∼15.8 pm V−1) and deliver an output voltage of ∼26.1 V and power density of ∼0.32 µW cm−2.
Yoonseo Jang, Jihyeon Park, Seoyeah Oh, Jonghyun Bae, Prakash R. Sultane, Christopher W. Bielawski, Jiwon Kim, Jungwoo Oh   +7 more
wiley   +1 more source

Parameter free AEWMA control chart for dispersion in semiconductor manufacturing. [PDF]

Sci Rep
Zaagan AA, Khan I, Alzahrani ARR, Ahmad B.   +3 more
europepmc   +1 more source

Chemical use in the semiconductor manufacturing industry. [PDF]

Int J Occup Environ Health, 2018
Kim S, Yoon C, Ham S, Park J, Kwon O, Park D, Choi S, Kim S, Ha K, Kim W.   +9 more
europepmc   +1 more source

Surface‐Plasmon‐Coupled Blue InGaN/GaN Micro‐LEDs with Oxide–Metal–Oxide Capping Layer Compatible to Chip Fabrication Process

Advanced Optical Materials, EarlyView.
A sidewall‐integrated oxide–metal–oxide architecture is demonstrated to overcome efficiency degradation in ultra‐small InGaN/GaN micro‐LEDs. Conformal Al2O3 passivation combined with plasmonic Ag nanoparticles enables localized surface plasmon–exciton coupling, converting surface‐related nonradiative losses into radiative emission.
Pil‐Kyu Jang, Lee‐Woon Jang, Ohbin Kwon, Yeong‐Hoon Cho, Sangbum Kim, Sang‐Ik Lee, Seungjae Baek, Jiwon Park, Myeongjun Choi, Jaeseung Kim, Taehwan Kim, Sung‐Un Kim, Min‐Seok Lee, Yong‐Ho Ra, Ki Hoon Nam, Seung Min Kwak, Alexander Y. Polyakov, In‐Hwan Lee   +17 more
wiley   +1 more source

Mono‐ and Bilayer MoS2 Photodetectors: High‐Performance Broadband AC Readout With Color‐Selective Noise Suppression

Advanced Optical Materials, EarlyView.
Mono‐ and bilayer MoS2 photodetectors enable wavelength‐selective AC photoresponse and optically driven capacitance modulation under visible illumination. Green excitation produces the strongest cumulative capacitive response, consistent with trap‐mediated charge accumulation at mono/bilayer and metal–MoS2 interfaces.
Pegah Zandi, Mengqi Fang, Arindam Phani, Muhammad Toyabur Rahman, Eui‐Hyeok Yang, Seonghwan Kim   +5 more
wiley   +1 more source

A Novel Out-of-Control Action Plan (OCAP) for Optimizing Efficiency and Quality in the Wafer Probing Process for Semiconductor Manufacturing. [PDF]

Sensors (Basel)
Yeo W, Chang YC, Chen LC, Chang KH.
europepmc   +1 more source

Comprehensive Evaluation of Hazardous Chemical Exposure Control System at a Semiconductor Manufacturing Company in South Korea. [PDF]

Int J Environ Res Public Health, 2018
Choi S, Yoon C, Kim S, Kim W, Ha K, Jeong J, Kim J, Shin J, Park D.   +8 more
europepmc   +1 more source