Results 211 to 220 of about 10,924 (257)
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AN APPROACH OF SHADOW MASK FOR DEEP-HOLES PATTERNING

International Journal of Computational Engineering Science, 2003
This paper presents a method to pattern metal in deep holes. We do this by etching holes through a separate wafer to form a shadow mask and then depositing metal by electron-beam evaporation or sputtering through the holes on this shadow mask on to the device wafer.
M. Tang   +3 more
openaire   +1 more source

Efficient visibility masking for crowd rendering with shadows

SIGGRAPH Asia 2012 Posters, 2012
Virtual real-time applications such as games and simulations frequently require rendering of large number of agents. Various GPU accelerated eye space culling and level of detail management techniques are being used to achieve efficient rendering of massive virtual crowds. However effective light space rendering is important for shadow mapping.
Serdar Kocdemir, Veysi Isler
openaire   +1 more source

A shadow mask for sputtered films

Review of Scientific Instruments, 1974
Use of a magnet to clamp a magnetic metal mask to the substrate during sputtering resulted in good edge definition in thin film patterns.
openaire   +1 more source

Experimental vibration analysis of the shadow mask

Optics and Lasers in Engineering, 1998
In this paper, the natural frequencies and mode shapes of the shadow mask in a multimedia monitor were measured by the modal testing technique and the amplitude fluctuation (AF) electronic speckle pattern interferometry (ESPI) method. Based on the obtained experimental results, it is advisable to investigate and optimize the assembly conditions of the ...
Wei-Chung Wang, Ying-Huang Tsai
openaire   +1 more source

A shadow-mask evaporated pyroMEMS igniter

Journal of Micromechanics and Microengineering, 2011
A reliable pyroMEMS igniter was successfully demonstrated based on shadow-mask evaporation of metal directly onto solid propellant drops. In this way, intimate contact between the fuel and the igniter was guaranteed. No visible degradation of the fuel was observed after the evaporation. A preliminary process-parameter study was carried out.
de Koninck, D., Briand, D., de Rooij, N.
openaire   +1 more source

Mask and shadow: for large orchestra

2014
Mask and Shadow pour orchestre explore le concept esthétique d'imperfection en composition musicale. Cette thèse se présente en deux parties: La partition complète et l'analyse. La méthode originale par laquelle ce concept est mis en marche dans cette composition musicale comporte deux éléments: D'abord le concept d'imperfection est subdivisé en ...
openaire   +1 more source

Polarization Guided Mask-Free Shadow Removal

Proceedings of the AAAI Conference on Artificial Intelligence
Shadow is a phenomenon that degenerates image quality and decreases the performance of downstream vision algorithms. Despite the fact that current image shadow removal methods have achieved promising progress, many of them require an externally obtained shadow mask as a necessary part of the input data, which not only introduces additional workload but
Chu Zhou, Chao Xu, Boxin Shi
openaire   +1 more source

Printed shadow masks for organic transistors

Applied Physics Letters, 2007
We have manufactured organic field-effect transistors by using shadow masks that are patterned by a screen printing system. The 50-nm-thick pentacene layer is sublimed as a channel in the vacuum system through the shadow mask on the base film with a multilayer patterned by ink-jet.
Yoshiaki Noguchi   +2 more
openaire   +1 more source

Shadow-masked growth and its applications

SPIE Proceedings, 1993
In this paper we will review the shadow masked growth technique and its applications. The technique enables us to change the layer thicknesses over a substrate by the variation in dimensions of windows in the shadow mask. One of the major application areas is the realization of photonic integrated circuits where materials with a different bandgap have ...
Piet M. A. Demeester   +7 more
openaire   +1 more source

Shadowing 3D mask effects in EUV

SPIE Proceedings, 2012
A new method to evaluate the shadowing effect of 3-dimensional mask has been developed and implemented for extreme UV technology. The method is composed of several key ingredients. The illuminator(source) is divided into very small domains to account for the partial coherence nature of the illumination employed by the microchip industry.
openaire   +1 more source

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